公开(公告)号：US20160282727A1

公开(公告)日：2016-09-29

申请号：US15178522

申请日：2016-06-09

申请人： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MElJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertu MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Helmar VAN SANTEN

发明人： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MElJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertu MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Helmar VAN SANTEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：US20110116061A1

公开(公告)日：2011-05-19

申请号：US13012303

申请日：2011-01-24

申请人： Aleksey Yurievich KOLESNYCHENKO ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Felix Godfried Peter PEETERS ,  Bob STREEFKERK ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Helmar VAN SANTEN

发明人： Aleksey Yurievich KOLESNYCHENKO ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Felix Godfried Peter PEETERS ,  Bob STREEFKERK ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Helmar VAN SANTEN

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。

公开(公告)号：US20100084565A1

公开(公告)日：2010-04-08

申请号：US12574211

申请日：2009-10-06

申请人： Helmar VAN SANTEN ,  Aleksey Yurievich Kolesnychenko ,  Yvonne Wendela Kruijt-Stegeman

发明人： Helmar VAN SANTEN ,  Aleksey Yurievich Kolesnychenko ,  Yvonne Wendela Kruijt-Stegeman

IPC分类号： G01T1/24 ,  B29C59/00

CPC分类号： B29C43/021 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/52 ,  B29C2035/0827 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.

摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持压印模板，衬底台和光学编码器的模板保持器，所述光学编码器具有辐射输出，第一衍射光栅和检测器，所述辐射输出被布置成照亮 第二衍射光栅和检测器，定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。

公开(公告)号：US20100182576A1

公开(公告)日：2010-07-22

申请号：US12727456

申请日：2010-03-19

申请人： Helmar VAN SANTEN ,  Aleksey Kolesnychenko

发明人： Helmar VAN SANTEN ,  Aleksey Kolesnychenko

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

摘要翻译： 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。