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    APPARATUS AND METHOD FOR ETCHING THE SURFACE OF A SEMICONDUCTOR SUBSTRATE
    1.
    发明申请
    APPARATUS AND METHOD FOR ETCHING THE SURFACE OF A SEMICONDUCTOR SUBSTRATE 有权
    用于蚀刻半导体衬底表面的装置和方法

    公开(公告)号：US20090227114A1

    公开(公告)日：2009-09-10

    申请号：US12042584

    申请日：2008-03-05

    申请人： Jorge Ramirez ,  Hector Joel Castaneda ,  Melissa A. Tiongco

    发明人： Jorge Ramirez ,  Hector Joel Castaneda ,  Melissa A. Tiongco

    IPC分类号： H01L21/306

    CPC分类号： H01L31/02363 ,  H01L21/67086 ,  Y02E10/50

    摘要： A process for etching the surfaces of semiconductor substrates utilizes a texturing tank which introduces a process fluid through a circulating system. The process fluid is heated to a desired temperature and maintained at a desired concentration prior to entering a processing area where laminar flow is produced to more quickly and uniformly roughen the surface of semiconductor substrates. The texturing tank permits removal of bubbles and eliminates temperature stratification in the processing area.

    摘要翻译： 用于蚀刻半导体衬底的表面的工艺利用了通过循环系统引入工艺流体的纹理槽。 将工艺流体加热到期望的温度并在进入生产层流的加工区域之前保持所需的浓度以更快速且均匀地粗糙化半导体衬底的表面。 纹理槽允许去除气泡并消除处理区域中的温度分层。

    Apparatus and method for etching the surface of a semiconductor substrate
    2.
    发明授权
    Apparatus and method for etching the surface of a semiconductor substrate 有权
    用于蚀刻半导体衬底的表面的设备和方法

    公开(公告)号：US08894803B2

    公开(公告)日：2014-11-25

    申请号：US12042584

    申请日：2008-03-05

    申请人： Jorge Ramirez ,  Hector Joel Castaneda ,  Melissa A. Tiongco

    发明人： Jorge Ramirez ,  Hector Joel Castaneda ,  Melissa A. Tiongco

    IPC分类号： H01L21/306 ,  H01L31/0236 ,  H01L21/67

    CPC分类号： H01L31/02363 ,  H01L21/67086 ,  Y02E10/50

    摘要： A process for etching the surfaces of semiconductor substrates utilizes a texturing tank which introduces a process fluid through a circulating system. The process fluid is heated to a desired temperature and maintained at a desired concentration prior to entering a processing area where laminar flow is produced to more quickly and uniformly roughen the surface of semiconductor substrates. The texturing tank permits removal of bubbles and eliminates temperature stratification in the processing area.

    摘要翻译： 用于蚀刻半导体衬底的表面的工艺利用了通过循环系统引入工艺流体的纹理槽。 将工艺流体加热到期望的温度并在进入生产层流的加工区域之前保持所需的浓度以更快速且均匀地粗糙化半导体衬底的表面。 纹理槽允许去除气泡并消除处理区域中的温度分层。

    System and method for reducing deionized water consumption
    3.
    发明授权
    System and method for reducing deionized water consumption 有权
    减少去离子水消耗的系统和方法

    公开(公告)号：US07258801B2

    公开(公告)日：2007-08-21

    申请号：US10940249

    申请日：2004-09-13

    申请人： Jorge Ramirez ,  Hector Joel Castaneda ,  Jose Luis Tlaxca

    发明人： Jorge Ramirez ,  Hector Joel Castaneda ,  Jose Luis Tlaxca

    IPC分类号： C02F1/02 ,  C02F1/72

    CPC分类号： F24D17/0078 ,  C02F1/02 ,  C02F1/20 ,  C02F1/78 ,  C02F2103/04 ,  C02F2209/05 ,  C02F2209/42 ,  F24D17/0073 ,  Y10S210/90

    摘要： A system and method are provided for reducing DI water consumption by delivering the DI water at an elevated processing temperature when demanded. The DI water is passed through a heater for heating the DI water to a processing temperature in a single pass. The DI water is circulated through a recirculation loop, including the heater, until demanded. The DI water is monitored for contaminants and bubbles or voids. Detected contaminants or voids are discharged through vents of the system. Turbulence or biocides can be introduced into the recirculated DI water for inhibiting biological contamination.

    摘要翻译： 提供了一种系统和方法，用于通过在需要时在升高的处理温度下输送去离子水来减少去离子水消耗。 去离子水通过加热器，将去离子水加热至单程中的加工温度。 去离子水循环通过循环回路，包括加热器，直到需要。 监测去离子水的污染物和气泡或空隙。 检测到的污染物或空隙通过系统的通风口排出。 可将湍流或杀生物剂引入再循环的去离子水中以抑制生物污染。

    Compact dental hygiene kit
    4.
    发明授权
    Compact dental hygiene kit 失效
    紧凑型牙科卫生用品

    公开(公告)号：US06325076B1

    公开(公告)日：2001-12-04

    申请号：US09344891

    申请日：1999-06-25

    申请人： Jorge Ramirez

    发明人： Jorge Ramirez

    IPC分类号： A45D4418

    CPC分类号： A46B5/0095 ,  A45D44/18 ,  A46B7/046 ,  A46B11/002 ,  A46B17/04 ,  A46B2200/1066

    摘要： A compact dental hygiene kit comprising a toothbrush with a foreshortened handle comprising a cap-like fastening means for attachment to the fastening means about the dispensing opening of a tooth paste reservoir, such that the reservoir becomes part of the handle for the toothbrush.

    摘要翻译： 一种紧凑的牙科卫生用具，其包括具有缩短手柄的牙刷，其包括盖状紧固装置，用于附接到围绕牙膏储存器的分配开口的紧固装置，使得储液器成为牙刷手柄的一部分。

    System and method for reducing deionized water consumption
    7.
    发明申请
    System and method for reducing deionized water consumption 有权
    减少去离子水消耗的系统和方法

    公开(公告)号：US20060054566A1

    公开(公告)日：2006-03-16

    申请号：US10940249

    申请日：2004-09-13

    申请人： Jorge Ramirez ,  Hector Castaneda ,  Jose Tlaxca

    发明人： Jorge Ramirez ,  Hector Castaneda ,  Jose Tlaxca

    IPC分类号： C02F1/00

    CPC分类号： F24D17/0078 ,  C02F1/02 ,  C02F1/20 ,  C02F1/78 ,  C02F2103/04 ,  C02F2209/05 ,  C02F2209/42 ,  F24D17/0073 ,  Y10S210/90

    摘要： A system and method are provided for reducing DI water consumption by delivering the DI water at an elevated processing temperature when demanded. The DI water is passed through a heater for heating the DI water to a processing temperature in a single pass. The DI water is circulated through a recirculation loop, including the heater, until demanded. The DI water is monitored for contaminants and bubbles or voids. Detected contaminants or voids are discharged through vents of the system. Turbulence or biocides can be introduced into the recirculated DI water for inhibiting biological contamination.

    摘要翻译： 提供了一种系统和方法，用于通过在需要时在升高的处理温度下输送去离子水来减少去离子水消耗。 去离子水通过加热器，将去离子水加热至单程中的加工温度。 去离子水循环通过循环回路，包括加热器，直到需要。 监测去离子水的污染物和气泡或空隙。 检测到的污染物或空隙通过系统的通风口排出。 可将湍流或杀生物剂引入再循环的去离子水中以抑制生物污染。

    Separator for liquids and/or multiphase fluids
    8.
    发明授权
    Separator for liquids and/or multiphase fluids 失效
    液体和/或多相流体分离器

    公开(公告)号：US07413669B2

    公开(公告)日：2008-08-19

    申请号：US11059810

    申请日：2005-02-15

    申请人： Jose Rafael Gonzalez ,  Jorge Ramirez

    发明人： Jose Rafael Gonzalez ,  Jorge Ramirez

    IPC分类号： B01D21/26 ,  B01D17/038

    CPC分类号： B04C5/04 ,  B04C5/081 ,  C02F1/38 ,  C02F2101/32

    摘要： A separator including a conical member having a base; a substantially cylindrical member extending from the base; a separator inlet for introducing liquid to be separated into the conical member in a substantially tangential direction with respect to a sidewall of the conical member; a heavy phase outlet communicated with an apex portion of the conical member; and a light phase outlet communicated with the cylindrical member.

    摘要翻译： 一种分离器，包括具有基座的锥形构件; 从所述基座延伸的大致圆柱形的构件; 分离器入口，用于将相对于所述锥形构件的侧壁沿大致切线方向分离的液体引入所述锥形构件; 与所述锥形构件的顶点部分连通的重相出口; 以及与所述圆柱形构件连通的轻相出口。

    Separator for liquids and/or multiphase fluids
    9.
    发明申请
    Separator for liquids and/or multiphase fluids 失效
    液体和/或多相流体分离器

    公开(公告)号：US20050218088A1

    公开(公告)日：2005-10-06

    申请号：US11059810

    申请日：2005-02-15

    申请人： Jose Gonzalez ,  Jorge Ramirez

    发明人： Jose Gonzalez ,  Jorge Ramirez

    IPC分类号： B04C5/04 ,  B04C5/081 ,  C02F1/38

    CPC分类号： B04C5/04 ,  B04C5/081 ,  C02F1/38 ,  C02F2101/32

    摘要： A separator including a conical member having a base; a substantially cylindrical member extending from the base; a separator inlet for introducing liquid to be separated into the conical member in a substantially tangential direction with respect to a sidewall of the conical member; a heavy phase outlet communicated with an apex portion of the conical member; and a light phase outlet communicated with the cylindrical member.

    摘要翻译： 一种分离器，包括具有基座的锥形构件; 从所述基座延伸的大致圆柱形的构件; 分离器入口，用于将相对于所述锥形构件的侧壁沿大致切线方向分离的液体引入所述锥形构件; 与所述锥形构件的顶点部分连通的重相出口; 以及与所述圆柱形构件连通的轻相出口。