公开(公告)号：US11968772B2

公开(公告)日：2024-04-23

申请号：US16862279

申请日：2020-04-29

Applicant: KLA Corporation

Inventor： Zefram Marks ,  Larissa Juschkin ,  Daniel C. Wack

IPC: H05H13/04 ,  G01N21/88 ,  G02B26/08 ,  G02F1/11 ,  H05H7/04 ,  H05H7/00

CPC classification number: H05H13/04 ,  G01N21/8806 ,  G02B26/085 ,  G02F1/11 ,  H05H7/04 ,  G01N2021/8887 ,  H05H2007/002 ,  H05H2007/005

Abstract: An optical characterization system is disclosed. The optical characterization system may comprise a synchrotron source, an optical characterization sub-system, and a sensor configured to receive a projected image from a set of imaging optics. The optical characterization sub-system may include at least the set of illumination optics, a set of imaging optics, and a diffractive optical element, a temporal modulator or an optical waveguide configured to match an etendue of a light beam output by the synchrotron source to the set of illumination optics. A method of matching the etendue of a light beam is also disclosed.

公开(公告)号：US20200383200A1

公开(公告)日：2020-12-03

申请号：US16862279

申请日：2020-04-29

Applicant: KLA Corporation

Inventor： Zefram Marks ,  Larissa Juschkin ,  Daniel C. Wack

IPC: H05H13/04 ,  H05H7/04 ,  G02F1/11 ,  G02B26/08

Abstract: An optical characterization system is disclosed. The optical characterization system may comprise a synchrotron source, an optical characterization sub-system, and a sensor configured to receive a projected image from a set of imaging optics. The optical characterization sub-system may include at least the set of illumination optics, a set of imaging optics, and a diffractive optical element, a temporal modulator or an optical waveguide configured to match an etendue of a light beam output by the synchrotron source to the set of illumination optics. A method of matching the etendue of a light beam is also disclosed.

公开(公告)号：US20210132506A1

公开(公告)日：2021-05-06

申请号：US16829486

申请日：2020-03-25

Applicant: KLA Corporation

Inventor： Zefram Marks ,  Gildardo Delgado ,  Karl Olof Johansson ,  Brady Clark

IPC: G03F7/20 ,  C10M105/72

Abstract: A system includes optics for ultraviolet light or electrons. The optics are situated in a chamber and include a surface to control a path of photons or electrons. The system also includes a lubricated component that is distinct from the surface and is situated in the chamber. The lubricated component is lubricated with a lubricant that includes an ionic liquid having a cation and an anion, wherein at least one of the cation or the anion is organic.

公开(公告)号：US20220196572A1

公开(公告)日：2022-06-23

申请号：US17352361

申请日：2021-06-21

Applicant: KLA Corporation

Inventor： Zefram Marks ,  Dmitry Skvortsov ,  Zhengyu Guo ,  Zhengcheng Lin ,  Nicolas Steven Juliano ,  Rui-Fang Shi

IPC: G01N21/956 ,  G01N21/45 ,  G01B11/06

Abstract: A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed in the vacuum chamber, to collect EUV light from the photomask to inspect the photomask for defects and an optical height sensor, at least partially disposed in the vacuum chamber, to measure heights on a surface of the photomask. The system further includes a stage controller to translate the stage horizontally and vertically in accordance with a focal map for the photomask produced using the measured heights on the surface of the photomask.