公开(公告)号：US20210293999A1

公开(公告)日：2021-09-23

申请号：US16897024

申请日：2020-06-09

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Sang Wook HAN ,  Seung Woo JEON ,  Sung Wook MOON ,  Yong Su KIM ,  Hyang Tag LIM ,  Ho Joong JUNG ,  Young Wook CHO

IPC: G02B3/00 ,  C09K11/65

Abstract: An inverted nanocone structure of the present disclosure includes a first surface, a second surface spaced apart from the first surface by a predetermined distance and having a greater area than the first surface, and a body having an inverted cone shape between the first surface and the second surface, wherein at least one activated point defect center is provided in the body.

公开(公告)号：US20230307214A1

公开(公告)日：2023-09-28

申请号：US18114295

申请日：2023-02-27

Applicant: Korea Institute of Science and Technology ,  KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Ho Joong JUNG ,  Sang Wook HAN ,  Hyung Jun HEO ,  Hansuek LEE ,  Min Kyo SEO ,  Hyeon HWANG

IPC: H01J37/32 ,  G03F7/20 ,  B08B3/08

CPC classification number: H01J37/32825 ,  H01J37/32449 ,  G03F7/2026 ,  B08B3/08 ,  H01J2237/182 ,  H01J2237/3343 ,  H01J2237/3321 ,  H01J37/3266 ,  H01J2237/022

Abstract: The present invention relates to a method for etching lithium niobate, the method including a process of etching lithium niobate using a mask pattern as a physical dry etching method using Ar plasma produced in a chamber through Ar gas, wherein in the process of etching lithium niobate, a process pressure of the chamber is maintained at 1 mTorr to 20 mTorr, and a method for forming a lithium niobate pattern using the same.