Abstract:
Contaminants present inside an ultrapure water production system are prevented from being fed into a feed pipe connected to a water use point and, after sterilization cleaning, the system is prevented from being contaminated by contaminants captured on a microparticle removal membrane during sterilization cleaning. Ultrapure water having high quality is thereby fed to a water use point within a short period of time. An ultrapure water production system is provided with a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, a first microparticle removal membrane device, and a second microparticle removal membrane device. Parts of sterilization water and flush water are fed into the first microparticle removal membrane device and discharged from a feedwater-side potion to a concentrated-water-side portion without permeating through a microparticle removal membrane thereof, and the remaining part of the water is passed through the second microparticle removal membrane device.
Abstract:
A purification method for an aqueous hydrogen peroxide solution includes subjecting the aqueous hydrogen peroxide solution to a reverse osmosis membrane separation treatment with a high-pressure reverse osmosis membrane separation device. The high-pressure reverse osmosis membrane has a denser skin layer on the membrane surface and is therefore lower in an amount of membrane permeate water per unit operating pressure but higher in the rejection rate of TOC and boron, as compared with a low-pressure or ultralow-pressure reverse osmosis membrane. The high-pressure reverse osmosis membrane permeate water is preferably further subjected to an ion exchange treatment with an ion exchange device including two or more columns packed with gel-type strong ion exchange resins.
Abstract:
A purification method for an aqueous hydrogen peroxide solution, includes passing the aqueous hydrogen peroxide solution through a first H-form strong cation exchange resin column 1, a salt-form strong anion exchange resin column 2 and a second H-form strong cation exchange resin column 3. An H-form strong cation exchange resin having crosslinking of 6% or less, an H-form strong cation exchange resin having crosslinking of 9% or more, or an H-form strong cation exchange resin produced by steps (a) and (b) is used as an H-form strong cation exchange resin packed in the second H-form strong cation exchange resin column 3: (a) copolymerizing a monovinyl aromatic monomer with a crosslinkable aromatic monomer having a non-polymerizable impurity content of 3% by weight or less therein using a predetermined amount of a specified radical polymerization initiator at a predetermined polymerization temperature to obtain a crosslinked copolymer; and (b) sulfonating the crosslinked copolymer.