公开(公告)号：US20160159672A1

公开(公告)日：2016-06-09

申请号：US14906441

申请日：2014-07-22

申请人： KURITA WATER INDUSTRIES LTD.

发明人： Ikunori YOKOI ,  Takeo FUKUI ,  Yoichi TANAKA

IPC分类号： C02F9/00 ,  C02F1/44

CPC分类号： C02F9/00 ,  B01D61/022 ,  B01D61/025 ,  B01D61/142 ,  B01D61/145 ,  B01D61/147 ,  B01D61/58 ,  B01D65/02 ,  B01D2311/2623 ,  B01D2311/2692 ,  B01D2317/04 ,  B08B3/14 ,  B08B9/027 ,  B08B9/032 ,  C02F1/20 ,  C02F1/32 ,  C02F1/325 ,  C02F1/42 ,  C02F1/441 ,  C02F1/444 ,  C02F2103/04 ,  C02F2301/043 ,  C02F2303/04 ,  C02F2303/16

摘要： Contaminants present inside an ultrapure water production system are prevented from being fed into a feed pipe connected to a water use point and, after sterilization cleaning, the system is prevented from being contaminated by contaminants captured on a microparticle removal membrane during sterilization cleaning. Ultrapure water having high quality is thereby fed to a water use point within a short period of time. An ultrapure water production system is provided with a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, a first microparticle removal membrane device, and a second microparticle removal membrane device. Parts of sterilization water and flush water are fed into the first microparticle removal membrane device and discharged from a feedwater-side potion to a concentrated-water-side portion without permeating through a microparticle removal membrane thereof, and the remaining part of the water is passed through the second microparticle removal membrane device.

摘要翻译： 存在于超纯水生产系统内的污染物被防止进入连接到使用点的进料管中，并且在灭菌清洁之后，防止在灭菌清洁期间系统被捕获在微粒去除膜上的污染物污染。 因此，优质的超纯水在短时间内供给到使用点。 超纯水生产系统设置有罐，泵，热交换器，紫外线装置，离子交换装置，第一微粒除去膜装置和第二微粒除去膜装置。 灭菌水和冲洗水的一部分被供给到第一微粒去除膜装置中，并且从给水侧部分排出到浓缩水侧部分而不渗透通过其除去微粒膜，并且剩余部分的水通过 通过第二微粒去除膜装置。

公开(公告)号：US20170253499A1

公开(公告)日：2017-09-07

申请号：US15598938

申请日：2017-05-18

申请人： KURITA WATER INDUSTRIES LTD.

发明人： Takeo FUKUI ,  Yoichi MIYAZAKI

IPC分类号： C02F1/32 ,  B01D15/36

CPC分类号： C02F1/325 ,  B01D15/363 ,  B01J31/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/444 ,  C02F1/722 ,  C02F1/725 ,  C02F9/00 ,  C02F2001/422 ,  C02F2103/04 ,  C02F2201/32 ,  C02F2303/18 ,  C02F2305/10

摘要： Provided are a method and an apparatus for producing pure water in which water that has been subjected to an ultraviolet oxidation treatment performed with an ultraviolet oxidation device is brought into contact with a platinum-group metal catalyst, the method and apparatus eliminating the likelihood of the catalyst being degraded and enabling decomposition of hydrogen peroxide to be performed for a prolonged period of time in a consistent manner. Water-to-be-treated is subjected to an ultraviolet oxidation treatment performed with an ultraviolet oxidation device and subsequently subjected to a hydrogen peroxide removal treatment performed with a hydrogen peroxide removal device including a platinum-group metal catalyst. The TOC concentration in water fed to the ultraviolet oxidation device is 5 ppb or less. An anion exchange resin tower is installed in a stage following the ultraviolet oxidation device.

公开(公告)号：US20160221841A1

公开(公告)日：2016-08-04

申请号：US15021157

申请日：2014-10-30

申请人： KURITA WATER INDUSTRIES LTD.

发明人： Takeo FUKUI ,  Yoichi MIYAZAKI

IPC分类号： C02F1/32 ,  C02F1/42 ,  B01D15/36

CPC分类号： C02F1/325 ,  B01D15/363 ,  B01J31/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/444 ,  C02F1/722 ,  C02F1/725 ,  C02F9/00 ,  C02F2001/422 ,  C02F2103/04 ,  C02F2201/32 ,  C02F2303/18 ,  C02F2305/10

摘要： Provided is a method and apparatus for producing pure water in which water that has been subjected to an ultraviolet oxidation treatment performed with an ultraviolet oxidation device is brought into contact with a platinum-group metal catalyst, the method and apparatus eliminating the likelihood of the catalyst being degraded and enabling decomposition of hydrogen peroxide to be performed for a prolonged period of time in a consistent manner. Water-to-be-treated is subjected to an ultraviolet oxidation treatment performed with an ultraviolet oxidation device 2 and subsequently subjected to a hydrogen peroxide removal treatment performed with a hydrogen peroxide removal device 4 including a platinum-group metal catalyst, wherein the TOC concentration in water fed to the ultraviolet oxidation device 2 is 5 ppb or less. An anion exchange resin tower 3 is installed in a stage following the ultraviolet oxidation device 2.

摘要翻译： 提供一种生产纯水的方法和装置，其中用紫外线氧化装置进行紫外线氧化处理的水与铂族金属催化剂接触，该方法和装置消除了催化剂的可能性 降解并且能够以一致的方式使过氧化氢分解长时间进行。 对待处理的水进行紫外线氧化装置2的紫外线氧化处理，然后用包含铂族金属催化剂的过氧化氢去除装置4进行过氧化氢去除处理，其中TOC浓度 在供给到紫外线氧化装置2的水中为5ppb以下。 阴离子交换树脂塔3安装在紫外线氧化装置2之后的阶段。

公开(公告)号：US20180044205A1

公开(公告)日：2018-02-15

申请号：US15552434

申请日：2016-02-22

申请人： KURITA WATER INDUSTRIES LTD. ,  ASAHI KASEI KABUSHIKI KAISHA

发明人： Takahiro KAWAKATSU ,  Hideaki IINO ,  Takeo FUKUI ,  Masayuki KANEDA ,  Daisuke SATO

IPC分类号： C02F1/44 ,  B01D61/14 ,  B01J47/12 ,  B01J41/13 ,  C08J5/22 ,  B01D71/72 ,  B01D69/02

CPC分类号： C02F1/444 ,  B01D61/14 ,  B01D61/142 ,  B01D61/145 ,  B01D61/147 ,  B01D61/16 ,  B01D61/18 ,  B01D69/02 ,  B01D71/72 ,  B01D2311/2623 ,  B01D2311/2634 ,  B01D2325/16 ,  B01D2325/42 ,  B01J41/07 ,  B01J41/13 ,  B01J47/12 ,  C02F2103/04 ,  C08J5/2256 ,  C08J5/2275 ,  C08J2329/12 ,  C08J2365/00

摘要： In a subsystem or water-feed path located upsteam of a use point in an ultrapure water production/supply process, fine particles having a particle diameter of 50 nm or less, in particular 10 nm or less are highly removed. A device for removing fine particles in water has a membrane filtration device including a microfiltration membrane or an ultrafiltration membrane having a weak cationic functional group. The microfiltration membrane or the ultrafiltration membrane having a weak cationic functional group is preferred to have a polyketone film with the weak cationic functional group. Negatively-charged particles in water are adsorbed by the weak cationic functional group and can thus be removed.

公开(公告)号：US20160220958A1

公开(公告)日：2016-08-04

申请号：US15021178

申请日：2014-09-30

申请人： KURITA WATER INDUSTRIES LTD.

发明人： Takeo FUKUI ,  Hiroshi MORITA ,  Yoichi TANAKA ,  Hideaki IINO ,  Satoshi YAMADA

IPC分类号： B01D61/58 ,  B01D61/02 ,  C02F1/44 ,  B01D61/14

CPC分类号： B01D61/58 ,  B01D61/025 ,  B01D61/04 ,  B01D61/142 ,  B01D61/145 ,  B01D61/147 ,  B01D2311/04 ,  B01D2311/06 ,  B01D2311/2619 ,  B01D2311/2623 ,  B01D2311/2634 ,  B01D2311/2657 ,  B01D2317/025 ,  B01D2317/04 ,  C02F1/441 ,  C02F1/444 ,  C02F2103/04 ,  C02F2209/105 ,  C02F2301/08

摘要： Provided is an ultrapure water production apparatus capable of producing high-quality ultrapure water from which microparticles have been removed at a high level. An ultrapure water production apparatus comprising a subsystem that produces ultrapure water from primary pure water, the subsystem including a membrane unit disposed at the end of the subsystem, wherein the membrane unit is constituted by a plurality of membrane devices arranged in series, the first of the membrane devices being a UF membrane device, an MF membrane device, or an RO membrane device, the last of the membrane devices being a UF membrane device or an MF membrane that is not modified with an ion-exchange group.

摘要翻译： 本发明提供一种超高纯水制造装置，其能够高精度地制造高质量的超纯水。 一种超纯水生产设备，包括从初级纯水产生超纯水的子系统，子系统包括设置在子系统端部的膜单元，其中膜单元由串联布置的多个膜装置构成，第一 膜装置是UF膜装置，MF膜装置或RO膜装置，最后的膜装置是不用离子交换基团改性的UF膜装置或MF膜。