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    Mounting method
    1.
    发明授权
    Mounting method 失效
    安装方法

    公开(公告)号：US5687947A

    公开(公告)日：1997-11-18

    申请号：US422932

    申请日：1995-04-17

    申请人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma ,  Hiroshi Chiba ,  Shinkichi Ohkawa

    发明人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma ,  Hiroshi Chiba ,  Shinkichi Ohkawa

    IPC分类号： G03F7/20 ,  G12B5/00 ,  F16M13/00

    CPC分类号： G03F7/707 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70883 ,  G12B5/00

    摘要： A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container is disclosed. The method is particularly applicable to an SOR X-ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument is hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given latitude only in the x direction. By this arrangement, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.

    摘要翻译： 公开了一种在真空容器中支撑或安装用于支撑掩模和晶片的精密仪器的方法。 该方法特别适用于SOR X射线曝光装置，其中掩模和晶片被设置在期望的减压水平，并且包含在同步加速器辐射中的诸如X射线的曝光能量通过掩模投射到晶片上 以将掩模的图案打印到晶片上。 在x方向垂直的x-y-z坐标系中，将精密仪器挂在至少两个x方向间隔的点上，与真空容器的内壁相连。 在其中一个支撑点上，精密仪器具有x，y和z方向运动的纬度，而在另一个支撑点，精密仪器是固定的，或仅在x方向上被赋予纬度。 通过这种布置，当真空容器因内部和外部压力之间的差异而变形时，可以正确地支撑精密仪器。

    Movable stage mechanism
    2.
    发明授权
    Movable stage mechanism 失效
    活动舞台机制

    公开(公告)号：US4993696A

    公开(公告)日：1991-02-19

    申请号：US125566

    申请日：1987-11-25

    申请人： Motomu Furukawa ,  Makoto Higomura ,  Masaru Ohtsuka ,  Hironori Yamamoto ,  Shinkichi Ohkawa ,  Koichi Matsushita ,  Yasuo Kawai ,  Takao Kariya ,  Haruyuki Kusunoki ,  Toshihiko Yamaura

    发明人： Motomu Furukawa ,  Makoto Higomura ,  Masaru Ohtsuka ,  Hironori Yamamoto ,  Shinkichi Ohkawa ,  Koichi Matsushita ,  Yasuo Kawai ,  Takao Kariya ,  Haruyuki Kusunoki ,  Toshihiko Yamaura

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70766 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70991

    摘要： A stage device usable, e.g., in an X-ray exposure apparatus, for moving a semiconductor wafer placed in a vacuum ambience and held by a wafer chuck, is disclosed. In the stage device, the wafer chuck holds the wafer so that the surface of the wafer onto which a circuit pattern is to be transferred is placed in a vertical plane, and the wafer chuck is moved vertically and horizontally for step-and-repeat exposure of the wafer. The device includes a guide mechanism, locking mechanism and a constant-tension spring mechanism, to thereby ensure high-accuracy movement of the wafer chuck in the vertical direction as well as high-precision positioning of the wafer. Further, in the stage device, a drive source producing a drive to move the wafer chuck is disposed in a vacuum ambience while, on the other hand, the supply of operating fluids to air bearing assemblies, for guiding the movement of the wafer chuck, is achieved by use of metal pipes coupled by rotary joints. The wafer chuck is resiliently supported by one of the air bearing assemblies, such that the wafer chuck can be moved in the vacuum ambience very accurately and without difficulties.

    摘要翻译： 公开了一种用于移动放置在真空环境中并由晶片卡盘保持的半导体晶片的X射线曝光设备中的舞台装置。 在平台装置中，晶片卡盘保持晶片，使得将要传输电路图案的晶片的表面放置在垂直平面中，并且晶片卡盘垂直和水平移动以进行步进和重复曝光 的晶片。 该装置包括引导机构，锁定机构和恒定张力弹簧机构，从而确保晶片卡盘在垂直方向上的高精度移动以及晶片的高精度定位。 此外，在平台装置中，在真空环境中设置产生移动晶片卡盘的驱动器的驱动源，而另一方面，向空气轴承组件供应工作流体，用于引导晶片卡盘的运动， 通过使用通过旋转接头联接的金属管实现。 晶片卡盘由空气轴承组件中的一个弹性地支撑，使得晶片卡盘可以非常准确且无困难地在真空环境中移动。