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公开(公告)号：US11294276B2
公开(公告)日：2022-04-05
申请号：US15695847
申请日：2017-09-05
Applicant: Kioxia Corporation
Inventor： Shingo Kanamitsu
Abstract: A template manufacturing method includes preparing a structure including a first substrate and a stacked body that is provided on the first substrate, the stacked body including a first lower layer including a first material, a first upper layer provided on the first lower layer including a second material different from the first material, and a first cover layer provided on a first cover region of the first upper layer and including a third material different from the second material. The method further includes forming a first resist layer on a portion of the first cover layer and on a first portion of the first upper layer, and exposing a second portion of the upper layer. The method yet further includes removing the second portion of the first upper layer using the first cover layer and the first resist layer as a mask.
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公开(公告)号：US20220187704A1
公开(公告)日：2022-06-16
申请号：US17688275
申请日：2022-03-07
Applicant: KIOXIA CORPORATION
Inventor： Shingo Kanamitsu
Abstract: A template manufacturing method includes preparing a structure including a first substrate and a stacked body that is provided on the first substrate, the stacked body including a first lower layer including a first material, a first upper layer provided on the first lower layer including a second material different from the first material, and a first cover layer provided on a first cover region of the first upper layer and including a third material different from the second material. The method further includes forming a first resist layer on a portion of the first cover layer and on a first portion of the first upper layer, and exposing a second portion of the upper layer. The method yet further includes removing the second portion of the first upper layer using the first cover layer and the first resist layer as a mask.
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公开(公告)号：US11796910B2
公开(公告)日：2023-10-24
申请号：US17467016
申请日：2021-09-03
Applicant: Kioxia Corporation
Inventor： Kosuke Takai , Shingo Kanamitsu , Noriko Sakurai
IPC: G03F7/00 , B21D22/02 , H01J37/317
CPC classification number: G03F7/0002 , B21D22/02 , H01J37/3174
Abstract: A template according to the present embodiment is a template used in a lithography process of a semiconductor manufacturing process. A first substrate includes a first face, a second face protruded from a portion of the first face, and a lateral face being a lateral face positioned between the second face and the first face and inclined with respect to the second face at a connection portion to the second face. A first material film is provided at least on the lateral face.
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公开(公告)号：US11762286B2
公开(公告)日：2023-09-19
申请号：US17688275
申请日：2022-03-07
Applicant: KIOXIA CORPORATION
Inventor： Shingo Kanamitsu
CPC classification number: G03F7/0002 , B29C33/301 , B29C33/424 , B29C43/146 , B29C59/16 , G03F7/0035 , G03F7/0043
Abstract: A template manufacturing method includes preparing a structure including a first substrate and a stacked body that is provided on the first substrate, the stacked body including a first lower layer including a first material, a first upper layer provided on the first lower layer including a second material different from the first material, and a first cover layer provided on a first cover region of the first upper layer and including a third material different from the second material. The method further includes forming a first resist layer on a portion of the first cover layer and on a first portion of the first upper layer, and exposing a second portion of the upper layer. The method yet further includes removing the second portion of the first upper layer using the first cover layer and the first resist layer as a mask.
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