FRP MOLDING SYSTEM AND METHOD
    4.
    发明申请

    公开(公告)号:US20230123571A1

    公开(公告)日:2023-04-20

    申请号:US17910399

    申请日:2020-08-31

    IPC分类号: B29C70/34 B29C43/14 B29C43/34

    摘要: An FRP material has a circular arc part, and a member fixed to the circular arc part. The FRP forming system has a portion-pressing device, a member positioning mechanism, and a transport device configured to form the FRP material as a single body of a circular arc-shaped FRP part. The FRP material may comprise a single layer prepreg or a plurality of prepregs that have been layered. The portion-pressing device has upper and lower molds sandwiching a portion of the FRP material in a radial direction orthogonal to the circular arc part, and compresses intermittently a portion of the FRP part. The member positioning mechanism locates the position of the member relatively to the upper or lower mold. The transport device moves the portion of the FRP material that is compressed by the portion-pressing device. The portion-pressing and the transport are repeated to form the FRP part.

    Template manufacturing method and template base member

    公开(公告)号:US11294276B2

    公开(公告)日:2022-04-05

    申请号:US15695847

    申请日:2017-09-05

    发明人: Shingo Kanamitsu

    摘要: A template manufacturing method includes preparing a structure including a first substrate and a stacked body that is provided on the first substrate, the stacked body including a first lower layer including a first material, a first upper layer provided on the first lower layer including a second material different from the first material, and a first cover layer provided on a first cover region of the first upper layer and including a third material different from the second material. The method further includes forming a first resist layer on a portion of the first cover layer and on a first portion of the first upper layer, and exposing a second portion of the upper layer. The method yet further includes removing the second portion of the first upper layer using the first cover layer and the first resist layer as a mask.

    Flexible mask modulation for controlling atmosphere between mask and substrate and methods of using the same

    公开(公告)号:US11198235B2

    公开(公告)日:2021-12-14

    申请号:US16059140

    申请日:2018-08-09

    摘要: An apparatus may include a substrate holder configured to hold a substrate. The substrate holder may include a first chucking region having a first area and an adjacent region extending from the chucking region. The apparatus may also include a superstrate holder configured to hold a superstrate. The superstrate holder may include a second chucking region having a second area. The second area may be larger than the first area and the superstrate holder faces the substrate holder forming a first gap between the adjacent region surface and the superstrate and a second gap between the substrate and the superstrate. The apparatus may also include a gas supply system between the first gap and the second gap. The superstrate holder may alter a shape of the held superstrate to decrease the first gap and increase the second gap.