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Patent Agency Ranking
1.发明授权Photoresist film and manufacturing method for organic light emitting display device using the same 有权光致抗蚀剂膜及使用其的有机发光显示装置的制造方法公开(公告)号：US09108451B2
公开(公告)日：2015-08-18
申请号：US13657988
申请日：2012-10-23
Applicant: LG Display Co., Ltd.
Inventor： Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
CPC classification number: G03F7/094 , B41M5/46 , B41M2205/06 , B41M2205/38 , H01L51/0013 , H01L51/56
Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
Abstract translation: 公开了一种光致抗蚀剂膜，其包括在支撑膜上的光热转换层和在光 - 热转换层上的热响应性聚合物层，其中光致抗蚀剂膜容易通过温度从转印基板脱离 因为光致抗蚀剂膜包括热敏聚合物。
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公开(公告)号：US11329189B2
公开(公告)日：2022-05-10
申请号：US16692134
申请日：2019-11-22
Applicant: LG Display Co., Ltd.
Inventor： Hye Li Min , So Mang Kim
Abstract: The present disclosure relates to a light emitting diode that includes a charge control layer disposed between a charge transfer layer and one electrode and including polysiloxane-based material chemically bonded to a surface of the charge transfer layer and a light emitting device having the same. The charge control layer is configured to remove a surface defect of the charge transfer layer, to transport charges stably, and to reflect a part of light passing through the charge transfer layer, and thereby enhancing out-coupling efficiency. In addition, the charge control layer regulates a charge flow from the electrode to the charge transfer layer, so that charges may be injected into an emitting material layer in a balanced manner.
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3.发明授权公开(公告)号：US09625818B2
公开(公告)日：2017-04-18
申请号：US14808621
申请日：2015-07-24
Applicant: LG Display Co., Ltd.
Inventor： Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
CPC classification number: G03F7/094 , B41M5/46 , B41M2205/06 , B41M2205/38 , H01L51/0013 , H01L51/56
Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
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4.发明申请Photoresist Film and Manufacturing Method for Organic Light Emitting Display Device Using the Same 审中-公开光致抗蚀剂薄膜及使用其的有机发光显示装置的制造方法公开(公告)号：US20150331320A1
公开(公告)日：2015-11-19
申请号：US14808621
申请日：2015-07-24
Applicant: LG Display Co., Ltd.
Inventor： Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
IPC: G03F7/09
CPC classification number: G03F7/094 , B41M5/46 , B41M2205/06 , B41M2205/38 , H01L51/0013 , H01L51/56
Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
Abstract translation: 公开了一种光致抗蚀剂膜，其包括在支撑膜上的光热转换层和在光 - 热转换层上的热响应性聚合物层，其中光致抗蚀剂膜容易通过温度从转印基板脱离 因为光致抗蚀剂膜包括热敏聚合物。
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5.发明申请Photoresist Film and Manufacturing Method for Organic Light Emitting Display Device Using the Same 有权光致抗蚀剂薄膜及使用其的有机发光显示装置的制造方法公开(公告)号：US20140057379A1
公开(公告)日：2014-02-27
申请号：US13657988
申请日：2012-10-23
Applicant: LG DISPLAY CO., LTD.
Inventor： Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
CPC classification number: G03F7/094 , B41M5/46 , B41M2205/06 , B41M2205/38 , H01L51/0013 , H01L51/56
Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
Abstract translation: 公开了一种光致抗蚀剂膜，其包括在支撑膜上的光热转换层和在光 - 热转换层上的热响应性聚合物层，其中光致抗蚀剂膜容易通过温度从转印基板脱离 因为光致抗蚀剂膜包括热敏聚合物。
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