公开(公告)号：US20140262746A1

公开(公告)日：2014-09-18

申请号：US14212398

申请日：2014-03-14

Applicant: MKS Instruments, Inc.

Inventor： Xing Chen ,  IIya Pokidov ,  Arthur Tian ,  Ken Tran ,  David Lam ,  Kevin W. Wenzel

IPC: B01D53/76

CPC classification number: H01J37/32449 ,  B01D53/323 ,  B01D53/76 ,  B01D2257/2064 ,  H01J37/32339 ,  H01J37/32357 ,  H01J37/32458 ,  H01J37/32651 ,  H01J37/32669 ,  H01J37/32844 ,  H01J37/32935 ,  H01J2237/3321 ,  H01J2237/334 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2245/121 ,  Y02C20/30

Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.

Abstract translation: 提供了一种用于减少气体的装置。 该装置包括具有多个入口和出口以及至少一个室壁的环形等离子体室。 一个或多个磁芯相对于环形等离子体室设置。 等离子体室限制环形等离子体。 第二气体入口位于第一气体入口和气体出口之间的距离气体出口距离d处的环形等离子体室上，使得第一气体入口和第二气体入口之间的环形等离子体通道体积基本上 由惰性气体填充，基于要减少的气体的期望停留时间的距离d。

公开(公告)号：US20150318148A1

公开(公告)日：2015-11-05

申请号：US14645837

申请日：2015-03-12

Applicant: MKS Instruments, Inc.

Inventor： Xing Chen ,  Chengxiang Ji ,  Erin Madden ,  IIya Pokidov ,  Kevin W. Wenzel

IPC: H01J37/32

CPC classification number: H01J37/32229 ,  H01J37/32201 ,  H01J37/32311 ,  H01J37/32522 ,  H05H1/46 ,  H05H2001/4622

Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.