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    Method and apparatus for processing dielectric materials using microwave energy
    1.
    发明授权
    Method and apparatus for processing dielectric materials using microwave energy 有权

    公开(公告)号：US10940635B2

    公开(公告)日：2021-03-09

    申请号：US16101370

    申请日：2018-08-10

    Applicant: MKS Instruments, Inc.

    Inventor： Xing Chen ,  David Lam ,  Kevin W. Wenzel ,  Ilya Pokidov

    IPC: B29C49/64 ,  B29B13/02 ,  B29C35/08 ,  H05B6/70 ,  B29B13/08 ,  H05B6/64 ,  B29K67/00 ,  B29L31/00

    Abstract: Methods and systems are provided for heating a dielectric preform material. An exemplary method includes inserting the preform material into a microwave cavity along a longitudinal axis of the microwave cavity and supplying the microwave cavity with microwave power having a frequency that corresponds to an axial wavelength along the longitudinal axis of the microwave cavity. The axial wavelength is greater than a length of the preform material along the longitudinal axis. The method includes heating the preform material within the microwave cavity by the microwave power and determining temperatures of the preform material at one or more locations on a surface of the preform material. The method further includes adjusting, based on the temperatures of the preform material, the microwave frequency to achieve substantially uniform heating at least on a sidewall of the preform material along the longitudinal axis.

    Method and system for controlling radio frequency power
    3.
    发明授权
    Method and system for controlling radio frequency power 有权
    控制射频功率的方法和系统

    公开(公告)号：US08912835B2

    公开(公告)日：2014-12-16

    申请号：US14151321

    申请日：2014-01-09

    Applicant: MKS Instruments, Inc.

    Inventor： Siddarth Nagarkatti ,  Feng Tian ,  David Lam ,  Abdul Rashid ,  Souheil Benzerrouk ,  Ilya Bystryak ,  David Menzer ,  Jack J. Schuss ,  Jesse E. Ambrosina

    IPC: H03K3/00 ,  H03K5/01

    CPC classification number: H03K5/01 ,  H03F3/189 ,  H03F3/217 ,  H03F2200/105 ,  H03F2200/375 ,  H03F2200/387 ,  H03G3/3047

    Abstract: A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.

    Abstract translation: 一种用于控制脉冲功率的方法，包括从功率放大器测量第一功率脉冲以获得数据。 该方法还包括产生第一信号以调整输出功率的第二脉冲，第一信号与数据相关，以最小化功率设定点与第二脉冲的基本稳定部分之间的功率差。 该方法还包括产生第二信号以调整传递功率的第二脉冲，第二信号与数据相关，以最小化第二脉冲的峰值与第二脉冲的基本上稳定的部分之间的幅度差异。

    Method and Apparatus for Processing Dielectric Materials Using Microwave Energy
    9.
    发明申请
    Method and Apparatus for Processing Dielectric Materials Using Microwave Energy 审中-公开

    公开(公告)号：US20170173846A1

    公开(公告)日：2017-06-22

    申请号：US14978091

    申请日：2015-12-22

    Applicant: MKS Instruments, Inc.

    Inventor： Xing Chen ,  David Lam ,  Kevin W. Wenzel ,  Ilya Pokidov

    IPC: B29C49/64

    CPC classification number: B29C49/64 ,  B29B13/024 ,  B29C35/0805 ,  B29C49/6418 ,  B29C2035/0855 ,  B29K2067/003 ,  B29L2031/712 ,  H05B6/707

    Abstract: Methods and systems are provided for heating a dielectric preform material. An exemplary method includes inserting the preform material into a microwave cavity along a longitudinal axis of the microwave cavity and supplying the microwave cavity with microwave power having a frequency that corresponds to an axial wavelength along the longitudinal axis of the microwave cavity. The axial wavelength is greater than a length of the preform material along the longitudinal axis. The method includes heating the preform material within the microwave cavity by the microwave power and determining temperatures of the preform material at one or more locations on a surface of the preform material. The method further includes adjusting, based on the temperatures of the preform material, the microwave frequency to achieve substantially uniform heating at least on a sidewall of the preform material along the longitudinal axis.

    Toroidal plasma Abatement Apparatus and Method
    10.
    发明申请
    Toroidal plasma Abatement Apparatus and Method 有权
    环形等离子体消除装置及方法

    公开(公告)号：US20140262746A1

    公开(公告)日：2014-09-18

    申请号：US14212398

    申请日：2014-03-14

    Applicant: MKS Instruments, Inc.

    Inventor： Xing Chen ,  IIya Pokidov ,  Arthur Tian ,  Ken Tran ,  David Lam ,  Kevin W. Wenzel

    IPC: B01D53/76

    CPC classification number: H01J37/32449 ,  B01D53/323 ,  B01D53/76 ,  B01D2257/2064 ,  H01J37/32339 ,  H01J37/32357 ,  H01J37/32458 ,  H01J37/32651 ,  H01J37/32669 ,  H01J37/32844 ,  H01J37/32935 ,  H01J2237/3321 ,  H01J2237/334 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2245/121 ,  Y02C20/30

    Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.

    Abstract translation: 提供了一种用于减少气体的装置。 该装置包括具有多个入口和出口以及至少一个室壁的环形等离子体室。 一个或多个磁芯相对于环形等离子体室设置。 等离子体室限制环形等离子体。 第二气体入口位于第一气体入口和气体出口之间的距离气体出口距离d处的环形等离子体室上，使得第一气体入口和第二气体入口之间的环形等离子体通道体积基本上 由惰性气体填充，基于要减少的气体的期望停留时间的距离d。

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