公开(公告)号：US20150179398A1

公开(公告)日：2015-06-25

申请号：US14581728

申请日：2014-12-23

Applicant: Mapper Lithography IP B.V.

Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Carel Ferdinand Daudey

IPC: H01J37/22 ,  H01J37/20

CPC classification number: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2443 ,  H01J2237/24507

Abstract: The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.

Abstract translation: 本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元， 调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述 目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光 元件到所述传感器。