公开(公告)号：US11754388B2

公开(公告)日：2023-09-12

申请号：US17140302

申请日：2021-01-04

Applicant: JEOL Ltd.

Inventor： Yukinori Aida

IPC: H01J37/20 ,  H01J37/30 ,  H01J37/317 ,  G01B11/06

CPC classification number: G01B11/0608 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3174 ,  H01J2237/032 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/202

Abstract: A height measuring device includes a light source that emits light in a direction oblique to a top surface of a specimen, a slit that shapes the light from the light source to form a slit image on the specimen, an imaging element that detects reflected light reflected by the specimen, and an arithmetic unit. The arithmetic unit: identifies a slit image of the reflected light reflected by the top surface of the specimen from among a plurality of slit images based on respective positions of the plurality of slit images on a detection surface of the imaging element; and determines the height of the top surface of the specimen based on the position of the slit image of the reflected light reflected by the top surface of the specimen on the detection surface.

公开(公告)号：US09818574B2

公开(公告)日：2017-11-14

申请号：US15150090

申请日：2016-05-09

Applicant: Kingstone Semiconductor Limited Company

Inventor： Jiong Chen ,  Junhua Hong ,  Jin Zhang ,  Jeff Boeker

IPC: H01J49/00 ,  H01J37/147 ,  H01J49/06 ,  H01J37/317 ,  H01J37/30

CPC classification number: H01J37/147 ,  H01J37/3007 ,  H01J37/3171 ,  H01J49/06 ,  H01J2237/10 ,  H01J2237/15

Abstract: A beam current transmission system and method are disclosed. The beam current transmission system comprises an extraction device, a mass analyzer, a divergent element, a collimation element and a speed change and turning element, wherein an analysis plane of the mass analyzer is perpendicular to a convergent plane of the extracted beam, and after entering an entrance, the beam is converged on a convergent point in a plane perpendicular to the analysis plane, and then is diverged from the convergent point and transmitted to the divergent element from an exit; the collimation element is used for parallelizing the beam in a transmission plane of the beam; and the speed change and turning element is used for enabling the beam to change speed so as to achieve a target energy while the beam is deflected so that the transmission direction of the beam changes by a first pre-set angle. Through the coordinated cooperation among a plurality of beam current optical elements, a relatively wider distribution can be formed in a vertical plane, so the invention is suitable to the processing of a wafer with a large size and also ensure better injection uniformity on the premise of avoiding energy contamination.

公开(公告)号：US09536701B2

公开(公告)日：2017-01-03

申请号：US14799856

申请日：2015-07-15

Applicant: JEOL Ltd.

Inventor： Yorinobu Iwasawa

IPC: G01F23/00 ,  H01J37/244 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/2445

Abstract: A radiation analyzer includes a primary ray source that generates primary rays, an optical system applies the primary rays emitted from the primary ray source to a sample, an energy-dispersive radiation detector that detects radiation that has been generated from the sample when the primary rays have been applied to the sample, and a support that supports the radiation detector so that the tilt of the center axis (C) of the radiation detector with respect to the optical axis (Z) of the optical system can be changed.

Abstract translation: 辐射分析仪包括产生一次射线的一次射线源，一个光学系统将从一次射线源射出的一次射线施加到一个样本上，一个能量分散辐射探测器，用于检测从原始射线 已经被应用于样品，以及支撑体，其支撑放射线检测器，使得可以改变辐射检测器相对于光学系统的光轴（Z）的中心轴线（C）的倾斜。

公开(公告)号：US09502213B2

公开(公告)日：2016-11-22

申请号：US14831225

申请日：2015-08-20

Applicant: Nissin Ion Equipment Co., Ltd.

Inventor： Sami K. Hahto ,  Tetsuro Yamamoto

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3171 ,  H01J37/3007 ,  H01J2237/047 ,  H01J2237/04756 ,  H01J2237/10 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/24542 ,  H01J2237/30472

Abstract: In one aspect, an ion implantation system is disclosed, which comprises a deceleration system configured to receive an ion beam and decelerate the ion beam at a deceleration ratio of at least 2, and an electrostatic bend disposed downstream of the deceleration system for causing a deflection of the ion beam. The electrostatic bend includes three tandem electrode pairs for receiving the decelerated beam, where each electrode pair has an inner and an outer electrode spaced apart to allow passage of the ion beam therethrough. Each of the electrodes of the end electrode pair is held at an electric potential less than an electric potential at which any of the electrodes of the middle electrode pair is held and the electrodes of the first electrode pair are held at a lower electric potential relative to the electrodes of the middle electrode pair.

Abstract translation: 一方面，公开了一种离子注入系统，其包括减速系统，该减速系统被配置为接收离子束并且以至少为2的减速比使离子束减速，以及设置在减速系统下游的静电弯曲件，用于引起偏转 的离子束。 静电弯曲包括用于接收减速梁的三个串联电极对，其中每个电极对具有间隔开的内电极和外电极，以允许离子束通过其中。 端电极对的每个电极被保持在比中间电极对的电极被保持的电位小的电位，并且第一电极对的电极相对于第一电极对的电位保持在较低的电位 中间电极对的电极。

公开(公告)号：US20160268929A1

公开(公告)日：2016-09-15

申请号：US14657234

申请日：2015-03-13

Applicant: Ho Seob KIM ,  Byeng Jin KIM ,  Do Jin SEONG

Inventor： Ho Seob KIM ,  Byeng Jin KIM ,  Do Jin SEONG

IPC: H02N2/02 ,  H01J37/10 ,  H01J37/26 ,  H01J37/20

CPC classification number: H01J37/261 ,  H01J37/10 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/20207 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01J2237/20264 ,  H01J2237/2602 ,  H02N2/006 ,  H02N2/026

Abstract: Disclosed herein is a micro stage using a piezoelectric element that can be reliably operated even in a vacuum environment. In a particle column requiring a high precision, for example, a microelectronic column, the micro stage can be used as a stage with micro or nano degree precision for alignment of parts of the column, or for moving a sample, and so on.

Abstract translation: 这里公开了使用即使在真空环境中也可靠地运行的压电元件的微型平台。 在需要高精度的微粒子柱（例如微电子柱）中，微型载物台可以用作具有微量级或纳米级精度的阶段，用于校准塔的部分或用于移动样品等。

公开(公告)号：US09324540B2

公开(公告)日：2016-04-26

申请号：US14407117

申请日：2013-04-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Ichiro Tachibana ,  Naomasa Suzuki

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/21 ,  H01J37/28 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2602 ,  H01J2237/281

Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces. A charged particle beam device includes: an electron source configured to generate a primary electron beam; an objective lens configured to focus the primary electron beam; a deflector configured to deflect the primary electron beam; a detector configured to detect a secondary electron or a reflection electron generated from a sample by irradiation of the primary electron beam; an electrode having a hole through which the primary electron beam passes; a voltage control power supply configured to apply a negative voltage to the electrode; and a retarding voltage control power supply configured to generate an electric field, which decelerates the primary electron beam, on the sample by applying the negative voltage to the sample, wherein the charged particle beam device performs focus adjustment while an offset between the voltage applied to the electrode and the voltage applied to the sample is being kept constant.

Abstract translation: 当通过组合并控制用于观察深孔等的延迟和升压来进行能量选择来检测信号电子时，聚焦调整的唯一方式是使用物镜的磁场变化。 然而，由于磁场变化的响应性差，吞吐量降低。 带电粒子束装置包括：电子源，被配置为产生一次电子束; 配置成聚焦一次电子束的物镜; 偏转器，被配置为偏转所述一次电子束; 检测器，被配置为通过一次电子束的照射来检测从样品产生的二次电子或反射电子; 具有一次电子束通过的孔的电极; 电压控制电源，被配置为向所述电极施加负电压; 以及延迟电压控制电源，被配置为通过向样本施加负电压来产生使样品上的一次电子束减速的电场，其中带电粒子束装置执行焦点调整，同时施加到 施加到样品的电极和电压保持恒定。

公开(公告)号：US20160020067A1

公开(公告)日：2016-01-21

申请号：US14799856

申请日：2015-07-15

Applicant: JEOL Ltd.

Inventor： Yorinobu Iwasawa

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/2445

Abstract: A radiation analyzer includes a primary ray source that generates primary rays, an optical system applies the primary rays emitted from the primary ray source to a sample, an energy-dispersive radiation detector that detects radiation that has been generated from the sample when the primary rays have been applied to the sample, and a support that supports the radiation detector so that the tilt of the center axis (C) of the radiation detector with respect to the optical axis (Z) of the optical system can be changed.

Abstract translation: 辐射分析仪包括产生一次射线的一次射线源，一个光学系统将从一次射线源射出的一次射线施加到一个样本上，一个能量分散辐射探测器，用于检测从原始射线 已经被应用于样品，以及支撑体，其支撑放射线检测器，使得可以改变辐射检测器相对于光学系统的光轴（Z）的中心轴线（C）的倾斜。

公开(公告)号：US20150332888A1

公开(公告)日：2015-11-19

申请号：US14653138

申请日：2014-02-14

Applicant: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC

Inventor： Bryan W. REED ,  William J. DEHOPE ,  Glenn HUETE ,  Thomas B. LAGRANGE ,  Richard M. SHUTTLESWORTH

IPC: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21 ,  H01J37/22 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/06333 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/2626 ,  H01J2237/2802

Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses each being of a programmable pulse duration, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has a plurality of plates. A control system having a digital sequencer controls the laser and a plurality of switching components, synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to enable programmable pulse durations and programmable inter-pulse spacings.

Abstract translation: 公开了一种具有激光驱动光电阴极和任意波形发生器（AWG）激光系统（“激光”）的电子显微镜。 激光器产生一系列时间成形的激光脉冲，每个激光脉冲具有可编程脉冲持续时间，并将激光脉冲引导到激光驱动的光电阴极以产生一系列电子脉冲。 图像传感器与偏转器子系统一起使用。 偏转器子系统布置在目标的下游，但是在图像传感器的上游，并且具有多个板。 具有数字定序器的控制系统控制激光器和与激光器同步的多个开关部件，以独立地控制每个偏转板的激励。 这允许每个电子脉冲被引导到图像传感器的不同部分，以及使能可编程脉冲持续时间和可编程脉冲间隔。

公开(公告)号：US08507857B2

公开(公告)日：2013-08-13

申请号：US12653013

申请日：2009-12-07

Applicant: Keisuke Itou ,  Toshimichi Iwai

Inventor： Keisuke Itou ,  Toshimichi Iwai

IPC: G21K7/00

CPC classification number: H01J37/28 ,  G01B15/00 ,  H01J37/20 ,  H01J37/266 ,  H01J2237/0041 ,  H01J2237/10

Abstract: A charged particle beam inspection apparatus includes: an electron gun emitting an electron beam; first and second condenser lenses used to focus the electron beam; a beam control panel disposed between the first and second condenser lenses; and a control unit performing stabilizing processing in which excitation currents respectively supplied to the first condenser lens and the second condenser lens are set to have predetermined values, thereby the current amount of the electron beam passing through an opening of the beam control panel is regulated so that the electron beam to be emitted onto the sample has a larger current amount than that at a measurement, and then the electron beam is emitted onto the sample for a predetermined time period. After the stabilizing processing, the control unit sets the values of the excitation currents back to values for the measurement in order to measure dimensions of the sample, the excitation currents respectively supplied to the first and second condenser lenses.

Abstract translation: 带电粒子束检查装置包括：发射电子束的电子枪; 用于聚焦电子束的第一和第二聚光透镜; 设置在第一和第二聚光透镜之间的光束控制面板; 以及执行稳定处理的控制单元，其中分别提供给第一聚光透镜和第二聚光透镜的激励电流被设置为具有预定值，从而将通过光束控制面板的开口的电子束的电流量调节为 要发射到样品上的电子束具有比测量时更大的电流量，然后电子束在样品上发射预定时间段。 在稳定处理之后，控制单元将激励电流的值设置为测量值，以便测量样品的尺寸，分别提供给第一和第二聚光透镜的激励电流。

公开(公告)号：US5136167A

公开(公告)日：1992-08-04

申请号：US638241

申请日：1991-01-07

Applicant: Guenther O. Langner ,  Paul F. Petric

Inventor： Guenther O. Langner ,  Paul F. Petric

IPC: G03F7/20 ,  H01J37/147 ,  H01J37/30 ,  H01L21/027 ,  H01L21/30

CPC classification number: H01J37/1472 ,  H01J37/3007 ,  H01J2237/10 ,  H01J2237/3175

Abstract: A charged particle beam deflection system provides a three or more level charged particle beam deflection arrangement and is therefore capable of extremely high speed and positional accuracy. The system preferably employs a major/minor magnetic deflection arrangement as well as orthogonal electrostatic deflectors at a level of speed and positional accuracy and which minimizes the need for dynamic correction to achieve high linearity and positioning accuracy at extremely low aberration levels. The system can also be made relatively noise insensitive by providing one or more split deflectors which are also useful in providing increased speed and adjustment of radial and azimuthal telecentricity. The use of a transfer lens allows the cluster and subfield deflectors to be optimally placed to exploit different forms of LAD to obtain telecentricity at all levels of the deflection hierarchy. The use of such lens assisted deflection allows the electron optical system and drivers therefor to be minimized in number or enabled noise to be reduced and adjustments of telecentricity to be made without increase of complexity over the prior art. By employing the deflection arrangement of the present invention in electron beam lithography apparatus, the throughput of such apparatus can be greatly improved.

Abstract translation: 带电粒子束偏转系统提供三级或更多级带电粒子束偏转装置，因此能够极高的速度和位置精度。 该系统优选地采用主/次磁偏转装置以及正交静电偏转器，其速度和位置精度水平，并且最小化动态校正的需要，以在极低的像差水平下实现高线性度和定位精度。 还可以通过提供一个或多个分流偏转器使系统相对噪声不敏感，这也可用于提供增加的速度和径向和方位远心度的调节。 使用转移透镜允许群集和子场偏转器被最佳地放置以利用不同形式的LAD以在偏转层级的所有水平处获得远心。 使用这种透镜辅助偏转允许使电子光学系统和驱动器在数量上最小化，或者使得噪声降低，并且在不增加现有技术的复杂性的情况下进行远心度的调节。 通过在电子束光刻装置中采用本发明的偏转装置，可以大大提高这种装置的生产量。