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    Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
    1.
    发明授权
    Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus 有权

    公开(公告)号：US09613782B2

    公开(公告)日：2017-04-04

    申请号：US14400815

    申请日：2013-05-14

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Paul IJmert Scheffers

    IPC: H01J37/00 ,  H01J37/304 ,  B82Y10/00 ,  H01J37/317 ,  B82Y40/00 ,  G01B11/14

    Abstract: The invention relates to a method for determining a beamlet position in a charged particle multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a conversion element for converting charged particle energy into light and a light sensitive detector. The conversion element is provided with a sensor surface area provided with a 2D-pattern of beamlet blocking and non-blocking regions. The method comprises taking a plurality of measurements and determining the position of the beamlet with respect to the 2D-pattern on the basis of a 2D-image created by means of the measurements. Each measurement comprises exposing a feature onto a portion of the 2D-pattern with a beamlet, wherein the feature position differs for each measurement, receiving light transmitted through the non-blocking regions, converting the received light into a light intensity value, and assigning the light intensity value to the position at which the measurement was taken.

    METHOD FOR DETERMINING A BEAMLET POSITION AND METHOD FOR DETERMINING A DISTANCE BETWEEN TWO BEAMLETS IN A MULTI-BEAMLET EXPOSURE APPARATUS
    3.
    发明申请
    METHOD FOR DETERMINING A BEAMLET POSITION AND METHOD FOR DETERMINING A DISTANCE BETWEEN TWO BEAMLETS IN A MULTI-BEAMLET EXPOSURE APPARATUS 有权
    用于确定光束位置的方法和用于确定多光束曝光装置中的两束光束之间的距离的方法

    公开(公告)号：US20150155136A1

    公开(公告)日：2015-06-04

    申请号：US14400815

    申请日：2013-05-14

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Paul IJmert Scheffers

    IPC: H01J37/304 ,  G01B11/14 ,  H01J37/317

    CPC classification number: H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/065 ,  H01J2237/24514 ,  H01J2237/24578 ,  H01J2237/3175 ,  H01J2237/31774

    Abstract: The invention relates to a method for determining a beamlet position in a charged particle multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a conversion element for converting charged particle energy into light and a light sensitive detector. The conversion element is provided with a sensor surface area provided with a 2D-pattern of beamlet blocking and non-blocking regions. The method comprises taking a plurality of measurements and determining the position of the beamlet with respect to the 2D-pattern on the basis of a 2D-image created by means of the measurements. Each measurement comprises exposing a feature onto a portion of the 2D-pattern with a beamlet, wherein the feature position differs for each measurement, receiving light transmitted through the non-blocking regions, converting the received light into a light intensity value, and assigning the light intensity value to the position at which the measurement was taken.

    Abstract translation: 本发明涉及一种用于确定带电粒子多子束曝光装置中的子束位置的方法。 该装置设置有传感器，其包括用于将带电粒子能量转换成光的转换元件和光敏检测器。 转换元件设置有设置有子束阻挡和非阻挡区域的2D图案的传感器表面区域。 该方法包括采取多个测量并基于通过测量产生的2D图像来确定子束相对于2D图案的位置。 每个测量包括用子束将特征曝光到2D图案的一部分上，其中对于每个测量，特征位置不同，接收透过非阻挡区域的光，将接收的光转换成光强度值， 光强值到测量位置。

    Charged particle lithography system with sensor assembly
    6.
    发明授权
    Charged particle lithography system with sensor assembly 有权
    带传感器组件的带电粒子光刻系统

    公开(公告)号：US09153415B2

    公开(公告)日：2015-10-06

    申请号：US14581728

    申请日：2014-12-23

    Applicant: Mapper Lithography IP B.V.

    Inventor： Paul IJmert Scheffers

    IPC: G21K5/10 ,  G21K5/00 ,  G21K4/00 ,  H01J37/22 ,  H01J37/20

    CPC classification number: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2443 ,  H01J2237/24507

    Abstract: The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.

    Abstract translation: 本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元， 调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述 目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光 元件到所述传感器。

    CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH SENSOR ASSEMBLY
    7.
    发明申请
    CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH SENSOR ASSEMBLY 有权
    带有传感器组件的充电颗粒平移系统

    公开(公告)号：US20150179398A1

    公开(公告)日：2015-06-25

    申请号：US14581728

    申请日：2014-12-23

    Applicant: Mapper Lithography IP B.V.

    Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Carel Ferdinand Daudey

    IPC: H01J37/22 ,  H01J37/20

    CPC classification number: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2443 ,  H01J2237/24507

    Abstract: The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.

    Abstract translation: 本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元， 调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述 目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光 元件到所述传感器。

    CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM MEASUREMENT SENSOR
    8.
    发明申请
    CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM MEASUREMENT SENSOR 有权
    带有对准传感器和光束测量传感器的带电粒子光刻系统

    公开(公告)号：US20150109601A1

    公开(公告)日：2015-04-23

    申请号：US14383569

    申请日：2013-03-08

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Erwin Slot ,  Vincent Sylvester Kuiper ,  Niels Vergeer

    IPC: G03F7/20

    CPC classification number: G03F7/707 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/3045

    Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.

    Abstract translation: 一种用于将图案转印到基板表面的多子束带电粒子光束光刻系统。 该系统包括用于将多个带电粒子子束（7）投影到衬底的表面上的投影系统（311） 相对于投影系统可移动的卡盘（313）; 用于确定一个或多个带电粒子子束的一个或多个特征的小波束测量传感器（即505,511），所述小束测量传感器具有用于接收一个或多个带电粒子子束的表面（501） 以及用于测量位置标记（610,620,635）的位置的位置标记测量系统，所述位置标记测量系统包括对准传感器（361,362）。 卡盘包括用于支撑基板的基板支撑部分，用于容纳小梁测量传感器的表面的小梁测量传感器部分（460）和用于容纳位置标记的位置标记部分（470）。

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