Laser welding device and laser welding method

    公开(公告)号:US11999008B2

    公开(公告)日:2024-06-04

    申请号:US16984261

    申请日:2020-08-04

    Abstract: A laser welding device (10) for welding a weld part (35) with laser light (L) includes: a laser emitting head (20) overlapping the laser light (L) and a measurement light (S) coaxially with each other and applying the laser light (L) and the measurement light (S) to the weld part (35), the measurement light (S) having a wavelength different from a wavelength of the laser light (L); a first parallel plane plate and a second parallel plane plate, changing an irradiation position of the measurement light (S) such that the irradiation position orbitally move around a center of rotation that moves on a predetermined welding path in a radius of rotation that is smaller than ½ of a spot diameter of the laser light (L); a measuring instrument (14) repeatedly measuring a weld penetration depth of the weld part (35) based on the measurement light (S) that is emitted from the laser emitting head (20) and is reflected on the weld part (35) while the measurement light (S) is being orbitally moved; and a determiner (17) determining the weld penetration depth of the weld part (35) using a plurality of measured values of the weld penetration depth, the plurality of measured values being measured by the measuring instrument (14) within a fixed time period while shifting a start time point of the fixed time period.

    Laser processing apparatus, laser processing method, and correction data generation method

    公开(公告)号:US11648629B2

    公开(公告)日:2023-05-16

    申请号:US16853742

    申请日:2020-04-20

    CPC classification number: B23K26/50 B23K26/0643 B23K26/0648 G01B11/22

    Abstract: A laser processing apparatus is used which includes: a laser oscillator that oscillates a processing laser beam at a processing point to be processed on a surface of a workpiece; an optical interferometer that emits a measurement beam to the processing point and generates an optical interference intensity signal based on interference generated due to an optical path difference between the measurement beam reflected at the processing point and a reference beam; a first mirror that changes traveling directions of the processing laser beam and the measurement beam; a second mirror that changes an incident angle of the measurement beam onto the first mirror; a lens that focuses the processing laser beam and the measurement beam on the processing point; a memory that stores corrected processing data; a control unit that controls the laser oscillator, the first mirror, and the second mirror based on the corrected processing data; and a measurement processing unit that derives a depth of a keyhole generated at the processing point by the processing laser beam, based on the optical interference intensity signal.

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