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公开(公告)号：US11969823B2
公开(公告)日：2024-04-30
申请号：US17214708
申请日：2021-03-26
Inventor： Jun Yokoyama , Yohei Takechi
IPC: B23K26/082 , B23K26/03 , B23K26/064
CPC classification number: B23K26/082 , B23K26/032 , B23K26/064
Abstract: A laser processing apparatus sets a processing section passing through a target position on a processing surface, sets a measurement section centered on the target position in the processing section, sets a plurality of data acquisition positions that are trajectories perpendicular to a processing direction in the measurement section. The laser processing apparatus acquires pieces of measurement data indicating shapes of keyholes at the respective data acquisition positions during processing of the processing section, and projects the pieces of measurement data in the processing direction to be superimposed on each other to create projection data. The laser processing apparatus obtains the second instruction value in a direction perpendicular to the processing direction at the target position on the basis of the projection data. Therefore, it is possible to provide a laser processing apparatus and a laser processing method capable of accurately measuring a depth of a keyhole.
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公开(公告)号：US20210060695A1
公开(公告)日：2021-03-04
申请号：US16941446
申请日：2020-07-28
Inventor： Jun Yokoyama , Yohei Takechi
IPC: B23K26/042 , B23K26/03 , B23K26/06 , G01B11/22 , G01B11/00 , G01B11/27 , G01B9/02 , G02B27/14 , G02B27/10 , G02B19/00
Abstract: A laser processing apparatus emits processing light, measurement light, processing guide light, and measurement guide light with which a surface of a workpiece is irradiated. Respective wavelengths of the processing guide light and the measurement guide light are set to wavelengths at which a deviation amount between an irradiation position of the processing guide light and an irradiation position of the measurement guide light due to a chromatic aberration of magnification of a lens, and a deviation amount between an irradiation position of the processing light and an irradiation position of the measurement light due to the chromatic aberration of magnification of the lens are equal to each other. Therefore, positioning of spot positions of a plurality of laser lights having different output differences can be realized with high accuracy and high speed.
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3.发明授权公开(公告)号：US11648629B2
公开(公告)日：2023-05-16
申请号：US16853742
申请日：2020-04-20
Inventor： Yohei Takechi , Jun Yokoyama , Takashi Urashima
CPC classification number: B23K26/50 , B23K26/0643 , B23K26/0648 , G01B11/22
Abstract: A laser processing apparatus is used which includes: a laser oscillator that oscillates a processing laser beam at a processing point to be processed on a surface of a workpiece; an optical interferometer that emits a measurement beam to the processing point and generates an optical interference intensity signal based on interference generated due to an optical path difference between the measurement beam reflected at the processing point and a reference beam; a first mirror that changes traveling directions of the processing laser beam and the measurement beam; a second mirror that changes an incident angle of the measurement beam onto the first mirror; a lens that focuses the processing laser beam and the measurement beam on the processing point; a memory that stores corrected processing data; a control unit that controls the laser oscillator, the first mirror, and the second mirror based on the corrected processing data; and a measurement processing unit that derives a depth of a keyhole generated at the processing point by the processing laser beam, based on the optical interference intensity signal.
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Patent Agency Ranking
公开(公告)号：US11408722B2
公开(公告)日：2022-08-09
申请号：US17241125
申请日：2021-04-27
Inventor： Yohei Takechi , Jun Yokoyama
IPC: G01B9/02 , G01B9/02001 , G01B9/02091 , G01B9/02004
Abstract: OCT measuring device in the present exemplary embodiment includes: wavelength sweep light source that emits light of which a wavelength is swept; optical interferometer that divides the light into measurement light and reference light, emits measurement light toward measurement surface of measuring target object, and generates an optical interference intensity signal indicating an intensity of interference between measurement light reflected from measurement surface and reference light; electro-optic element which is a phase modulator arranged in a light path of optical interferometer; measurement processor which is a signal generator that derives a position of measurement surface and generates a phase amount indicator signal that indicates a phase amount of phase modulator based on the optical interference intensity signal; and electro-optic element controller which is a phase amount controller that controls the phase amount given to the light that is transmitted through phase modulator.
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5.发明授权公开(公告)号：US11975403B2
公开(公告)日：2024-05-07
申请号：US16995153
申请日：2020-08-17
Inventor： Yohei Takechi , Jun Yokoyama
IPC: B23K26/06 , B23K26/082 , B23K26/21 , B23K26/70
CPC classification number: B23K26/0643 , B23K26/0648 , B23K26/0665 , B23K26/082 , B23K26/705 , B23K26/21
Abstract: Laser processing apparatus includes movable mirror for changing paths of laser light for processing and measurement light, and stage for changing an incident angle of measuring light. Furthermore, laser processing apparatus includes lens for condensing laser light for processing and measurement light on processing point, controller for controlling laser oscillator, movable mirror, and stage based on corrected data for processing, and measurement processor for measuring a depth of keyhole generated at processing point. The corrected data for processing is data corrected so as to a deviation of an arrival position of at least one of laser light for processing and measurement light caused by chromatic aberration of lens on the surface of workpiece. With this configuration, an accurate depth of keyhole can be measured.
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公开(公告)号：US11648624B2
公开(公告)日：2023-05-16
申请号：US16941446
申请日：2020-07-28
Inventor： Jun Yokoyama , Yohei Takechi
IPC: B23K26/042 , B23K26/03 , B23K26/06 , G01B11/22 , G01B11/00 , G01B11/27 , G01B9/02 , G02B27/14 , G02B27/10 , G02B19/00
CPC classification number: B23K26/042 , B23K26/032 , B23K26/0608 , B23K26/0643 , B23K26/0648 , B23K26/0665 , G01B9/02 , G01B11/002 , G01B11/22 , G01B11/272 , G02B19/0009 , G02B19/0047 , G02B27/1006 , G02B27/141
Abstract: A laser processing apparatus emits processing light, measurement light, processing guide light, and measurement guide light with which a surface of a workpiece is irradiated. Respective wavelengths of the processing guide light and the measurement guide light are set to wavelengths at which a deviation amount between an irradiation position of the processing guide light and an irradiation position of the measurement guide light due to a chromatic aberration of magnification of a lens, and a deviation amount between an irradiation position of the processing light and an irradiation position of the measurement light due to the chromatic aberration of magnification of the lens are equal to each other. Therefore, positioning of spot positions of a plurality of laser lights having different output differences can be realized with high accuracy and high speed.
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公开(公告)号：US09977229B2
公开(公告)日：2018-05-22
申请号：US14859208
申请日：2015-09-18
Inventor： Hirotoshi Oikaze , Yasuhiro Kabetani , Yohei Takechi , Tomotaka Furuta
CPC classification number: G02B21/002 , G01B9/02002 , G01B9/02007 , G01B9/02009 , G01B9/02048 , G01B9/02057 , G01B9/0209 , G01B9/04 , G02B21/0016 , G02B21/14 , G02B21/26 , G02B26/007
Abstract: In an inner layer measurement method, first irradiation light and second irradiation light having a peak wavelength longer than that of the first irradiation light are formed by changing at least one of a position where light emitted from a lamp is transmitted through a short pass filter and a position where light emitted from a lamp is transmitted through a long pass filter. Then, a first XY sectional surface of a semitransparent body is measured by irradiating the first XY sectional surface with the first irradiation light. A second XY sectional surface positioned on a layer deeper than the first XY sectional surface is measured by irradiating the second XY sectional surface with the second irradiation light. Each of the short pass filter and the long pass filter can transmit the light and has properties of changing a cutoff wavelength according to the position where the light is transmitted.
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公开(公告)号：US09500861B2
公开(公告)日：2016-11-22
申请号：US14889136
申请日：2015-04-07
Inventor： Yohei Takechi , Hirotoshi Oikaze , Yasuhiro Kabetani , Tomotaka Furuta
Abstract: A protective member protects an objective lens. The protective member includes an insertion opening through which an objective lens is configured to be inserted and a main body configured to cover the inserted objective lens. The main body includes a side wall portion connected to the insertion opening and a bottom portion connected to the side wall portion as well as facing the insertion opening, and covers the inserted objective lens with the side wall portion and the bottom portion. The protective member further includes a liquid disposed inside the main body, a sealing film body for sealing the insertion opening and a window arranged in the bottom portion of the main body, through which light transmits. The protective member can simplify the work.
Abstract translation: 保护构件保护物镜。 保护构件包括插入孔，物镜构成为插入孔，主体构造成覆盖插入的物镜。 主体包括连接到插入口的侧壁部分和连接到侧壁部分的底部以及面向插入开口，并且用侧壁部分和底部部分覆盖插入的物镜。 保护构件还包括设置在主体内部的液体，用于密封插入口的密封膜体和布置在主体的底部中的窗口，光通过该窗口透射。 保护构件可以简化工作。
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