Abstract:
A semiconductor device includes: a processing core having a plurality of sub cores, a plurality of power rails spanning from a first sub core to a second sub core of the plurality of sub cores, the plurality of power rails configured to provide an operating voltage to each of the first sub core and the second sub core, and a plurality of cells defining a boundary between the first sub core and the second sub core, each of the cells providing a discontinuity in a respective power rail, wherein the discontinuity includes a break in the respective power rail in more than one layer of the semiconductor device.
Abstract:
A method includes detecting channels between macros in an integrated circuit. Each channel is associated with a region between two macros such that a shortest distance of the region satisfies a threshold value. The method also includes automatically adding at least one power line within at least one channel to satisfy a power integrity issue within the at least one channel. The power integrity issue is satisfied when two power lines having opposite polarity are coupled to provide power to a device within the at least one channel.
Abstract:
A system and method to select a gate to be modified as a test isolation gate is disclosed. In a particular embodiment, a circuit includes a combinational logic portion including a logic path including a test isolation gate between a starting element and an ending element. The logic path includes at least a first gate element between the starting element and the test isolation gate. The logic path also includes at least a second gate element between the test isolation gate and the ending element. The starting element and the ending element are coupled to be tested via a scan chain test process during a test mode. In the test mode, an output of the second gate element is fixed at a constant logic level.
Abstract:
A system includes a processing core built on a semiconductor substrate, the processing core having a first sub core and a second sub core, each of the first and second sub cores configured to perform a processing function, and a plurality of power rails traversing a dimension of the processing core and spanning from the first sub core to the second sub core, each of the power rails being configured to provide an operating voltage to the first and second sub cores, and wherein a boundary between the first sub core and the second sub core is irregularly shaped, and wherein each of the first and second sub cores corresponds to a respective power domain.
Abstract:
A system includes a processing core built on a semiconductor substrate, the processing core having a first sub core and a second sub core, each of the first and second sub cores configured to perform a processing function, and a plurality of power rails traversing a dimension of the processing core and spanning from the first sub core to the second sub core, each of the power rails being configured to provide an operating voltage to the first and second sub cores, and wherein a boundary between the first sub core and the second sub core is irregularly shaped, and wherein each of the first and second sub cores corresponds to a respective power domain.
Abstract:
A semiconductor device includes: a processing core having a plurality of sub cores, a plurality of power rails spanning from a first sub core to a second sub core of the plurality of sub cores, the plurality of power rails configured to provide an operating voltage to each of the first sub core and the second sub core, and a plurality of cells defining a boundary between the first sub core and the second sub core, each of the cells providing a discontinuity in a respective power rail, wherein the discontinuity includes a break in the respective power rail in more than one layer of the semiconductor device.