公开(公告)号：US20100075488A1

公开(公告)日：2010-03-25

申请号：US12560073

申请日：2009-09-15

申请人： Richard O. Collins ,  Nyi O. Myo ,  Kevin J. Bautista ,  John S. Webb ,  Errol C. Sanchez ,  Yi-Chiau Huang ,  Kailash Kiran Patalay ,  Zhi Yuan Zhou ,  Wilson Yu

发明人： Richard O. Collins ,  Nyi O. Myo ,  Kevin J. Bautista ,  John S. Webb ,  Errol C. Sanchez ,  Yi-Chiau Huang ,  Kailash Kiran Patalay ,  Zhi Yuan Zhou ,  Wilson Yu

IPC分类号： H01L21/20 ,  C23C16/458

CPC分类号： H01L21/67115 ,  C23C16/45551 ,  H01L21/68742 ,  H01L21/68792

摘要： An apparatus for processing a substrate, comprising a processing chamber and a substrate support and lift pin assembly disposed within the chamber. The substrate support and lift pin assembly are coupled to a lift mechanism that controls positioning of the substrate support and the lift pins and provides rotation for the substrate support. The lift mechanism includes at least one sensor capable of generating a signal when clearance between the substrate support and the lift pins allows rotation of the substrate support to begin. The substrate support capable of concurrent axial motion and rotation may be used in a processing chamber comprising multiple processing zones separated by edge rings. Substrates may be subjected to successive or cyclical processes by moving between the multiple processing zones.

摘要翻译： 一种用于处理衬底的装置，包括处理室和设置在腔室内的衬底支撑件和提升销组件。 基板支撑和提升销组件联接到升降机构，该提升机构控制基板支撑件和升降销的定位并提供用于基板支撑件的旋转。 提升机构包括至少一个传感器，当传感器支架和提升销之间的间隙允许基板支撑件的旋转开始时能产生信号。 能够同时进行轴向运动和旋转的基板支撑件可用于包括由边缘环分开的多个处理区域的处理室。 可以通过在多个处理区之间移动来对衬底进行连续或循环过程。

公开(公告)号：US09890455B2

公开(公告)日：2018-02-13

申请号：US13250906

申请日：2011-09-30

申请人： Nyi O. Myo ,  John S. Webb ,  Masato Ishii ,  Xuebin Li ,  Zhiyuan Ye ,  Ali Zojaji

发明人： Nyi O. Myo ,  John S. Webb ,  Masato Ishii ,  Xuebin Li ,  Zhiyuan Ye ,  Ali Zojaji

IPC分类号： C23C16/455 ,  C23C16/458 ,  H01L21/687 ,  H01L21/673

CPC分类号： C23C16/45591 ,  C23C16/45502 ,  C23C16/4584 ,  C23C16/4585 ,  H01L21/67386 ,  H01L21/687 ,  H01L21/68792

摘要： Embodiments of the present invention generally relates to apparatus for use in film depositions. The apparatus generally include pre-heat rings adapted to be positioned in a processing chamber. In one embodiment, a pre-heat ring includes a ring having an inner edge and an outer edge. The outer edge has a constant radius. The inner edge is oblong-shaped and may have a first portion having a constant radius measured from a center of a circle defined by an outer circumference of the ring. A second portion may have a constant radius measured from a location other than the center of the outer circumference. In another embodiment, a processing chamber includes a pre-heat ring positioned around the periphery of a substrate support. The pre-heat ring includes an inner edge having a first portion, a second portion, and one or more linear portions positioned between the first portion and the second portion.

公开(公告)号：US20120103263A1

公开(公告)日：2012-05-03

申请号：US13250906

申请日：2011-09-30

申请人： NYI O. MYO ,  John S. Webb ,  Masato Ishii ,  Xuebin Li ,  Zhiyuan Ye ,  Ali Zojaji

发明人： NYI O. MYO ,  John S. Webb ,  Masato Ishii ,  Xuebin Li ,  Zhiyuan Ye ,  Ali Zojaji

IPC分类号： C23C16/455 ,  C23C16/458

CPC分类号： C23C16/45591 ,  C23C16/45502 ,  C23C16/4584 ,  C23C16/4585 ,  H01L21/67386 ,  H01L21/687 ,  H01L21/68792

摘要： Embodiments of the present invention generally relates to apparatus for use in film depositions. The apparatus generally include pre-heat rings adapted to be positioned in a processing chamber. In one embodiment, a pre-heat ring includes a ring having an inner edge and an outer edge. The outer edge has a constant radius. The inner edge is oblong-shaped and may have a first portion having a constant radius measured from a center of a circle defined by an outer circumference of the ring. A second portion may have a constant radius measured from a location other than the center of the outer circumference. In another embodiment, a processing chamber includes a pre-heat ring positioned around the periphery of a substrate support. The pre-heat ring includes an inner edge having a first portion, a second portion, and one or more linear portions positioned between the first portion and the second portion.

摘要翻译： 本发明的实施例一般涉及用于膜沉积的装置。 该设备通常包括适于定位在处理室中的预热环。 在一个实施例中，预热环包括具有内边缘和外边缘的环。 外边缘具有恒定的半径。 内边缘是长圆形的，并且可以具有从由环的外圆周限定的圆的中心测量的具有恒定半径的第一部分。 第二部分可以具有从除了外圆周的中心之外的位置测量的恒定的半径。 在另一个实施例中，处理室包括围绕衬底支撑件的周边定位的预热环。 预热环包括具有第一部分，第二部分和位于第一部分和第二部分之间的一个或多个直线部分的内边缘。