公开(公告)号：US20180108546A1

公开(公告)日：2018-04-19

申请号：US15785993

申请日：2017-10-17

Applicant: SEMES CO., LTD.

Inventor： Soon-Cheon Cho ,  Bongkyu Shin ,  Byeol Han ,  Hyun Joong Kim

IPC: H01L21/67 ,  B08B7/00 ,  G03F1/82 ,  B08B3/10 ,  H01J37/32 ,  H01L21/3065

CPC classification number: H01L21/67051 ,  B08B3/10 ,  B08B7/0057 ,  G03F1/82 ,  H01J37/32495 ,  H01J37/32623 ,  H01L21/3065 ,  H01L21/67086 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831

Abstract: Disclosed are an apparatus and a method for cleaning a component of a substrate dry processing apparatus. The method for cleaning a component of a substrate dry processing apparatus includes dipping the component in a cleaning solution received in a cleaning bath, generating radicals from the cleaning solution, and cleaning the component with the radicals. The component is cleaned with hydrogen radicals (H2*) and hydroxyl radicals (OH*) generated from ozone water. Accordingly, it is possible to rapidly remove carbon (C) and fluorine (F) deposited on the component.