公开(公告)号：US10981184B2

公开(公告)日：2021-04-20

申请号：US15935111

申请日：2018-03-26

Applicant: SEMES CO., LTD.

Inventor： Soon Cheon Cho ,  Bongkyu Shin ,  Hyun Joong Kim

IPC: B05B5/025 ,  B05C5/02 ,  B05B17/04 ,  B05B5/08 ,  B05B7/22 ,  B05B5/00 ,  B05D1/04 ,  B05D3/00 ,  B05D3/14

Abstract: Disclosed are a coating apparatus and a coating method. The coating apparatus includes a chamber, a support located in an interior space of the chamber and configured to support a substrate which is to be coated, an ejection nozzle configured to eject a coating material toward the support, and an electric field forming unit configured to form an electric field in a movement path of the coating material to provide kinetic energy for the coating material.

公开(公告)号：US20180108546A1

公开(公告)日：2018-04-19

申请号：US15785993

申请日：2017-10-17

Applicant: SEMES CO., LTD.

Inventor： Soon-Cheon Cho ,  Bongkyu Shin ,  Byeol Han ,  Hyun Joong Kim

IPC: H01L21/67 ,  B08B7/00 ,  G03F1/82 ,  B08B3/10 ,  H01J37/32 ,  H01L21/3065

CPC classification number: H01L21/67051 ,  B08B3/10 ,  B08B7/0057 ,  G03F1/82 ,  H01J37/32495 ,  H01J37/32623 ,  H01L21/3065 ,  H01L21/67086 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831

Abstract: Disclosed are an apparatus and a method for cleaning a component of a substrate dry processing apparatus. The method for cleaning a component of a substrate dry processing apparatus includes dipping the component in a cleaning solution received in a cleaning bath, generating radicals from the cleaning solution, and cleaning the component with the radicals. The component is cleaned with hydrogen radicals (H2*) and hydroxyl radicals (OH*) generated from ozone water. Accordingly, it is possible to rapidly remove carbon (C) and fluorine (F) deposited on the component.