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公开(公告)号：US20230033534A1
公开(公告)日：2023-02-02
申请号：US17876527
申请日：2022-07-28
Applicant: SEMES CO., LTD.
Inventor： JUN YOUNG CHOI , KYU HWAN CHANG , CHUL GOO KIM , JUNG BONG CHOI , YOUNG IL LEE
Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath for liquid treating a plurality of substrates and having an accommodation space for accommodating a treating liquid; and a posture changing member for changing a posture of a substrate which is immersed in the treating liquid from a vertical posture to a horizontal posture.
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公开(公告)号：US20220157645A1
公开(公告)日：2022-05-19
申请号：US17531626
申请日：2021-11-19
Applicant: SEMES CO., LTD.
Inventor： SOO HAN SONG , CHUL GOO KIM , JUNG BONG CHOI , CHEOL-YONG SHIN , JAE-YOUL KIM
IPC: H01L21/687 , H01L21/67
Abstract: Provided is a support unit for supporting a substrate, the support unit including: a heating member configured to transmit thermal energy to a supported substrate; a reflective plate disposed under the heating member and configured to reflect thermal energy generated by the heating member to the substrate; a cooling plate disposed under the reflective plate and formed with a cooling flow path in which a cooling fluid flows; and a gas supply line configured to supply gas to a space between the reflective plate and the cooling plate.
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公开(公告)号：US20220181168A1
公开(公告)日：2022-06-09
申请号：US17543761
申请日：2021-12-07
Applicant: SEMES CO., LTD.
Inventor： KANG SEOP YUN , CHUL GOO KIM , JUNG BONG CHOI , SOO HAN SONG
IPC: H01L21/67 , H01L21/687
Abstract: The inventive concept provides a substrate support unit comprising a chuck supporting and rotating a substrate; and a lamp unit provided below the substrate to heat the substrate, wherein the lamp unit comprises a first lamp having a reflective layer on the surface thereof, to block and/or reflect a light which is emitted from the first lamp but not directed to the substrate to direct the light to the substrate.
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