公开(公告)号：US20170140977A1

公开(公告)日：2017-05-18

申请号：US15353454

申请日：2016-11-16

Applicant: SEMES CO., LTD. ,  INDUSTRY ACADEMY COOPERATION FOUNDATION OF SEJONG UNIVERSITY

Inventor： Chong-Min Ryu ,  Won-Jun Lee ,  Seung-Ho Seo

IPC: H01L21/687 ,  C23C16/32 ,  B08B3/08 ,  B08B3/02 ,  B08B3/10 ,  C23C16/458 ,  H01L21/67

CPC classification number: B08B3/08 ,  B08B3/02 ,  B08B3/10 ,  C23C16/325 ,  C23C16/458 ,  H01L21/67051 ,  H01L21/68728 ,  H01L21/68757

Abstract: A chuck pin, method for manufacturing a chuck pin, and an apparatus for treating substrate. The substrate treating apparatus includes a container having a treating space in its inner side, a supporting unit supporting the substrate inside of the treating space, and a liquid supply unit providing a solution to the supported substrate of the supporting unit. The supporting unit is placed in a supporting plate where the substrate is placed and in the above supporting plate, and includes a chuck pin supporting a side part of the substrate. The chuck pin is formed on a body and on the above surface of the body, and includes a first coating film provided as a silicon carbide material.

公开(公告)号：US10991603B2

公开(公告)日：2021-04-27

申请号：US16556025

申请日：2019-08-29

Applicant: SEMES CO., LTD.

Inventor： Oh Jin Kwon ,  Chong-Min Ryu ,  Young Ho Choo

IPC: H01L21/67 ,  H01L21/02

Abstract: A method for treating a substrate includes a mixing step of preparing an ozone treatment fluid containing an ozone gas and a substrate treating step of treating a surface of the substrate using the ozone treatment fluid. In the substrate treating step, light is irradiated to the substrate by a lamp.