公开(公告)号：US10773281B2

公开(公告)日：2020-09-15

申请号：US15721188

申请日：2017-09-29

Applicant: SEMES CO., LTD.

Inventor： Ki-Moon Kang ,  Anton Koriakin ,  In Il Jung ,  Hae-Won Choi

IPC: C11D7/50 ,  B08B7/00 ,  H01L21/67 ,  C11D11/00 ,  H01L21/311 ,  C07C31/02

Abstract: Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The substrate cleaning composite includes an etching compound that provides a component for treating a substrate, and a solvent that dissolves the etching compound, wherein the substrate cleaning composite is an anhydrous composite that does not include water.