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公开(公告)号：US20230201865A1
公开(公告)日：2023-06-29
申请号：US18145928
申请日：2022-12-23
Applicant: SEMES CO., LTD.
Inventor： Jong Won MOON , Kyung Hun LEE , Eun Hyeok CHOI , Young Jin KIM
CPC classification number: B05C11/1039 , B05C5/02
Abstract: Provided is a home port in which a nozzle supplying a treating liquid to a substrate waits. The home port includes a drain cup, a housing provided to cover the drain cup and having an exhaust space exhausting a fume generated from the treating liquid, and an insertion body placed between an upper wall of the housing and the drain cup in the housing. A first exhaust passage guiding the fume to the exhaust space is formed between the insertion body and the drain cup, and a second exhaust passage guiding the fume to the exhaust space is formed between the insertion body and the housing.
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2.发明公开公开(公告)号：US20230173438A1
公开(公告)日：2023-06-08
申请号：US17952446
申请日：2022-09-26
Applicant: SEMES CO., LTD.
Inventor： Gu Yeol AN , Do Gyeong HA , Moon Soon CHOI , Bu Young JUNG , Kyung Hun LEE , Chae Young LIM
CPC classification number: B01F25/104 , B01F23/49 , B01F25/46 , B01F23/452 , B01F2101/24
Abstract: An apparatus for processing a substrate includes a mixing nozzle having a mixing space that is shaped as an inverted cone, the mixing nozzle including a first inlet, a second inlet and an outlet installed at the mixing space; a first chemical supply unit connected to the first inlet; a second chemical supply unit connected to the second inlet; and a supply tank connected to the outlet, wherein the first chemical supply unit is configured to supply a first chemical solution to the mixing space through the first inlet, the second chemical supply unit is configured to supply a second chemical solution to the mixing space through the second inlet, and the supply tank is supplied with, through the outlet, a solution mixture that is formed of the first chemical solution and the second chemical solution after being mixed in the mixing space.
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