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公开(公告)号:US20230089188A1
公开(公告)日:2023-03-23
申请号:US17941526
申请日:2022-09-09
申请人: SEMES CO., LTD.
发明人: Moon Soon CHOI , Chae Young LIM , Do Gyeong HA , Gu Yeol AN
IPC分类号: B05B9/04
摘要: The inventive concept provides a liquid storage unit. The liquid storage unit includes a tank housing defining a storing space therein; a liquid outlet pipe penetrating into the tank housing and having an outlet formed thereon; and a liquid inlet pipe penetrating into the tank housing and having an inlet formed thereon, and wherein a first guide surface is provided between the outlet and the inlet.
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公开(公告)号:US20230131576A1
公开(公告)日:2023-04-27
申请号:US17969155
申请日:2022-10-19
申请人: SEMES CO., LTD.
发明人: Do Gyeong HA , Tae Suk YUN , Moon Soon CHOI , Gu Yeol AN , Chae Young LIM , Bu Young JUNG
IPC分类号: H01L21/67
摘要: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a liquid supply unit configured to supply a treating liquid onto the substrate supported on the support unit, and wherein the liquid supply unit comprises: a tank configured to have an accommodation space for storing the treating liquid therein; a circulation line configured to circulate the treating liquid stored in the accommodation space; a supplementary line configured to supply the treating liquid to the accommodation space, and at which a valve is installed; a heater installed at the circulation line, and for heating the treating liquid; and a controller is configured to control the valve and the heater.
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公开(公告)号:US20230173438A1
公开(公告)日:2023-06-08
申请号:US17952446
申请日:2022-09-26
申请人: SEMES CO., LTD.
发明人: Gu Yeol AN , Do Gyeong HA , Moon Soon CHOI , Bu Young JUNG , Kyung Hun LEE , Chae Young LIM
CPC分类号: B01F25/104 , B01F23/49 , B01F25/46 , B01F23/452 , B01F2101/24
摘要: An apparatus for processing a substrate includes a mixing nozzle having a mixing space that is shaped as an inverted cone, the mixing nozzle including a first inlet, a second inlet and an outlet installed at the mixing space; a first chemical supply unit connected to the first inlet; a second chemical supply unit connected to the second inlet; and a supply tank connected to the outlet, wherein the first chemical supply unit is configured to supply a first chemical solution to the mixing space through the first inlet, the second chemical supply unit is configured to supply a second chemical solution to the mixing space through the second inlet, and the supply tank is supplied with, through the outlet, a solution mixture that is formed of the first chemical solution and the second chemical solution after being mixed in the mixing space.
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