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Patent Agency Ranking
公开(公告)号：US09346078B2
公开(公告)日：2016-05-24
申请号：US13966242
申请日：2013-08-13
Applicant: Samsung Display Co., LTD.
Inventor： Yoon-Chan Oh , Choon-Ho Lee
CPC classification number: B05C21/005 , C23C14/042 , H01L51/0011
Abstract: A mask frame assembly for thin film deposition includes a mask frame having an opening, and a mask configured to be coupled to the mask frame and including a first surface for facing a deposition substrate, a second surface opposite the first surface, and a deformation prevention part having varying thicknesses.
Abstract translation: 用于薄膜沉积的掩模框架组件包括具有开口的掩模框架和被配置为联接到掩模框架并且包括用于面对沉积基板的第一表面，与第一表面相对的第二表面的掩模和防变形 具有不同厚度的部件。
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公开(公告)号：US20140150721A1
公开(公告)日：2014-06-05
申请号：US13966242
申请日：2013-08-13
Applicant: Samsung Display Co., LTD.
Inventor： Yoon-Chan Oh , Choon-Ho Lee
IPC: B05C21/00
CPC classification number: B05C21/005 , C23C14/042 , H01L51/0011
Abstract: A mask frame assembly for thin film deposition includes a mask frame having an opening, and a mask configured to be coupled to the mask frame and including a first surface for facing a deposition substrate, a second surface opposite the first surface, and a deformation prevention part having varying thicknesses.
Abstract translation: 用于薄膜沉积的掩模框架组件包括具有开口的掩模框架和被配置为联接到掩模框架并且包括用于面对沉积基板的第一表面，与第一表面相对的第二表面的掩模和防变形 具有不同厚度的部件。
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公开(公告)号：US20150014888A1
公开(公告)日：2015-01-15
申请号：US14291833
申请日：2014-05-30
Applicant: Samsung Display Co., Ltd.
Inventor： Yoon-Chan Oh , Choong-Ho Lee
CPC classification number: B23K26/38 , B23K26/10 , B23K26/361 , B23K26/362 , B23K37/0408 , G03F7/12 , G03F7/70733 , G03F7/70783 , H01L51/56
Abstract: A method of forming a pattern on a mask sheet using a laser beam includes determining a target scan line with respect to the mask sheet, which corresponds to a position of the pattern on a final mask sheet, determining a correction scan line with respect to the mask sheet, along which the laser beam is scanned to form the pattern of the final mask sheet, applying a counter force to the mask sheet, fixing the mask sheet onto a mask frame while the counter force is applied to the mask sheet, scanning the laser beam along the correction scan line, and releasing the counter force which is applied to the mask sheet.
Abstract translation: 使用激光束在掩模片上形成图案的方法包括确定相对于掩模片的目标扫描线，其对应于最终掩模片上的图案的位置，确定相对于该掩模片的校正扫描线 掩模片，沿着激光束扫描以形成最终掩模片的图案，向掩模片施加反作用力，将掩模片固定到掩模框上，同时将反力施加到掩模片上，扫描 激光束沿着校正扫描线，并且释放施加到掩模片的反作用力。
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公开(公告)号：US09953828B2
公开(公告)日：2018-04-24
申请号：US13918352
申请日：2013-06-14
Applicant: Samsung Display Co., Ltd.
Inventor： Yoon-Chan Oh , Choong-Ho Lee , Da-Hee Jeong
CPC classification number: H01L21/02104 , B05C21/005 , C23C14/042
Abstract: A frame and a mask assembly having the same. The frame supports both ends of each unit mask, each unit mask applying a tensile force in a first direction. The frame includes a frame main body part forming an opening exposing the unit mask, and a first through hole formed by passing through the frame main body part.
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公开(公告)号：US09604314B2
公开(公告)日：2017-03-28
申请号：US14291833
申请日：2014-05-30
Applicant: Samsung Display Co., Ltd.
Inventor： Yoon-Chan Oh , Choong-Ho Lee
CPC classification number: B23K26/38 , B23K26/10 , B23K26/361 , B23K26/362 , B23K37/0408 , G03F7/12 , G03F7/70733 , G03F7/70783 , H01L51/56
Abstract: A method of forming a pattern on a mask sheet using a laser beam includes determining a target scan line with respect to the mask sheet, which corresponds to a position of the pattern on a final mask sheet, determining a correction scan line with respect to the mask sheet, along which the laser beam is scanned to form the pattern of the final mask sheet, applying a counter force to the mask sheet, fixing the mask sheet onto a mask frame while the counter force is applied to the mask sheet, scanning the laser beam along the correction scan line, and releasing the counter force which is applied to the mask sheet.
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