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公开(公告)号:US20210134769A1
公开(公告)日:2021-05-06
申请号:US17088427
申请日:2020-11-03
Applicant: Samsung Display Co., Ltd.
Inventor: Bum Soo KAM , Eui Kang HEO
IPC: H01L25/075 , H01L23/00 , H01L25/16 , H01L33/62
Abstract: A display device includes a substrate, a first electrode, and a second electrode spaced from each other on the substrate, a first insulating layer on the first electrode, a first light emitting element between the first electrode and the second electrode, a second light emitting element on the first insulating layer and spaced from the first light emitting element, and a second insulating layer on the first insulating layer and covering at least a portion of the second light emitting element, wherein the first insulating layer includes at least one first opening penetrating the first insulating layer to expose a portion of the first electrode, the second insulating layer includes at least one second opening penetrating the second insulating layer to expose a portion of the first insulating layer, the at least one first opening and the at least one second opening do not overlap each other.
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公开(公告)号:US20170168346A1
公开(公告)日:2017-06-15
申请号:US15195858
申请日:2016-06-28
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Bum Soo KAM , Hoon KANG , Chong Sup CHANG
IPC: G02F1/1333 , G02F1/1339 , G02F1/1341 , G02F1/1368 , G02F1/1335
CPC classification number: G02F1/133377 , G02F1/133345 , G02F1/133512 , G02F1/133707 , G02F1/1339 , G02F1/1341 , G02F1/136209 , G02F1/1368 , G02F2001/134345 , G02F2201/123 , G02F2202/02
Abstract: A display device according to an exemplary embodiment includes: a substrate; a thin film transistor provided above the substrate; a pixel electrode connected with the thin film transistor; an insulating layer provided between the thin film transistor and the pixel electrode; a trench provided in a portion of the insulating layer; a light blocking member provided in in the trench; a roof layer provided above the pixel electrode to be separated from the pixel electrode, interposing a plurality of microcavities therebetween; a liquid crystal layer provided in the microcavities; and encapsulation layer covering the microcavities.
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公开(公告)号:US20170069843A1
公开(公告)日:2017-03-09
申请号:US15092967
申请日:2016-04-07
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hoon KANG , Bum Soo KAM , Chong Sup CHANG , Woo Seok JEON
CPC classification number: H01L51/0011 , C23C14/042 , H01L27/3211 , H01L51/5012 , H01L51/56
Abstract: A method of fabricating a deposition mask, the method including forming a photoresist pattern on a base member, the photoresist pattern having a plurality of inversely tapered photo patterns and a photo opening defined by the photo patterns; forming a mask material layer in the photo opening and on the photo patterns; removing the photo patterns and the mask material layer formed on the photo patterns, leaving the mask material layer formed in the photo opening; and removing the base member.
Abstract translation: 一种制造沉积掩模的方法,所述方法包括在基底构件上形成光致抗蚀剂图案,光致抗蚀剂图案具有多个反向渐变的照片图案和由照片图案限定的照片开口; 在照片开口和照片图案上形成掩模材料层; 去除形成在照片图案上的照片图案和掩模材料层,留下形成在照片开口中的掩模材料层; 并移除基座部件。
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公开(公告)号:US20170261787A1
公开(公告)日:2017-09-14
申请号:US15444704
申请日:2017-02-28
Applicant: Samsung Display Co., Ltd
Inventor: Chong Sup CHANG , Bum Soo KAM , Tae Wook KANG , Hoon KANG
IPC: G02F1/1341 , G02F1/1343 , G02F1/1337 , G02F1/1368 , G02F1/1333
CPC classification number: G02F1/1341 , G02F1/133377 , G02F1/1337 , G02F1/13439 , G02F1/1368 , G02F2201/123
Abstract: A liquid crystal display according to an exemplary embodiment includes: a substrate; a thin film transistor disposed on the substrate; a pixel electrode connected to the thin film transistor; a roof layer overlapping the pixel electrode; and a liquid crystal layer disposed in a plurality of microcavities between the pixel electrode and the roof layer. The roof layer includes two partitions disposed at respective sides of a microcavity selected from the plurality of microcavities and facing each other and a first inlet part and a second inlet part facing each other in a direction crossing a direction in which the two partitions face each other. A distance between the two partitions is shorter in the first inlet part than in a center part of the microcavity, and the distance between the two partitions is shorter in the second inlet part than in the center part of the microcavity.
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公开(公告)号:US20170097543A1
公开(公告)日:2017-04-06
申请号:US15078426
申请日:2016-03-23
Applicant: Samsung Display Co., Ltd.
Inventor: Hoon KANG , Bum Soo KAM , Sung Won DOH , Chong Sup CHANG
IPC: G02F1/1335 , H01L27/12
CPC classification number: G02F1/133528 , G02F1/133502 , G02F1/133512 , G02F1/133536 , G02F2001/133548 , G02F2001/133562 , G02F2202/36 , H01L27/124 , H01L27/1262
Abstract: A thin film transistor substrate, a display device including the same, and a method of manufacturing a thin film transistor substrate. The thin film transistor substrate includes: a base plate including a first area and a second area; a nano uneven pattern formed on one side of the base plate in the first area; a wire grid pattern formed on the ne side of the base plate in the second area; a gate electrode disposed on and overlapping the wire grid pattern; and one of a source electrode and a drain electrode disposed on the gate electrode and overlapping the wire grid pattern.
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公开(公告)号:US20170082922A1
公开(公告)日:2017-03-23
申请号:US15139037
申请日:2016-04-26
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hoon KANG , Bum Soo KAM , Se Yoon OH , Chong Sup CHANG
CPC classification number: G03F7/0007 , C23F1/02 , G02F1/133512 , G02F1/13439 , G03F7/2002 , G03F7/32 , H01L21/32134 , H01L21/467 , H01L29/413 , H01L31/1884 , H01L31/1888 , H01L51/442
Abstract: A method for manufacturing a display device includes forming a plurality of light blocking patterns on a first surface of a transparent substrate, wherein a first light blocking pattern of the plurality of light blocking patterns has a different line width than a second light blocking pattern of the plurality of light blocking patterns. An insulating layer is formed on the first surface of the transparent substrate and the light blocking patterns. A conductive layer is formed on the insulating layer. A photo-resist layer is formed on the conductive layer. The photo-resist layer is exposed with ultraviolet rays through a second surface of the transparent substrate, wherein the first and second surfaces of the transparent substrate are opposite to each other. The photo-resist layer is developed. The conductive layer is etched using the photo-resist layer as a mask. The photo-resist layer is removed.
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