Abstract:
A photoresist composition for manufacturing a color filter, the photoresist composition includes a first red colorant and a yellow colorant represented by Chemical Formula 1, wherein R1 and R2 each independently represent a C1 to C10 alkyl group, wherein A1, A2, A3, and A4 each independently represent a C1 to C10 alkyl group, —CN, —PO3H2, —C(O)OH, or a hydrogen atom, m is an integer of 1 to 10, and optionally wherein at least one —CH2— of R1 and R2 if present is independently replaced with —O—, —C(O)—, —C(O)O—, or —OC(O)—.
Abstract:
A method of driving a display panel includes sequentially driving a first gate line and a second gate line of a display panel during an N-th frame to charge data signals to first row pixels electrically connected to the first gate line and the second gate line, sequentially driving a third gate line and a fourth gate line of the display panel during the N-th frame to charge the data signals to second row pixels electrically connected to the third gate line and the fourth gate line, sequentially driving the second gate line and the first gate line during an (N+1)-th frame to charge the data signals to the first row pixels, and sequentially driving the fourth gate line and the third gate line during the (N+1)-th frame to charge the data signals to the second row pixels. Thus, display quality of a display apparatus may be improved.
Abstract:
A display substrate includes a substrate on which a first pixel area including a first light-blocking region, and a second pixel area adjacent to the first pixel area and including a second light-blocking region are defined, an insulating layer in the first and second light-blocking regions, a black matrix pattern layer on the insulating layer, a first column spacer in the first light-blocking region and protruding from the black matrix pattern layer, and a second column spacer in the second light-blocking region and protruding from the black matrix pattern layer. A height of a top surface of the first column spacer is different from a height of a top surface of the second column spacer, where the heights are taken with respect to the substrate.