THIN FILM DEPOSITION APPARATUS
    3.
    发明申请
    THIN FILM DEPOSITION APPARATUS 审中-公开
    薄膜沉积装置

    公开(公告)号:US20160244872A1

    公开(公告)日:2016-08-25

    申请号:US15145689

    申请日:2016-05-03

    CPC classification number: C23C14/24 C23C14/042 H01L51/001

    Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

    Abstract translation: 一种薄膜沉积装置,其可以简单地应用于大规模生产大尺寸显示装置并且提高制造产量。 薄膜沉积装置包括:放电沉积材料的沉积源; 沉积源喷嘴单元,设置在沉积源的一侧,并且包括沿第一方向布置的多个沉积源喷嘴; 以及与沉积源喷嘴单元相对设置并包括沿垂直于第一方向的第二方向布置的多个图案化狭缝的图案化缝隙片。 当基板或薄膜沉积装置在第一方向上相对移动时进行沉积,并且沉积源,沉积源喷嘴单元和图案化缝隙片彼此一体地形成。

    THIN FILM DEPOSITION APPARATUS
    5.
    发明申请

    公开(公告)号:US20190226078A1

    公开(公告)日:2019-07-25

    申请号:US16368748

    申请日:2019-03-28

    Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

    Thin film deposition apparatus
    8.
    发明授权

    公开(公告)号:US10287671B2

    公开(公告)日:2019-05-14

    申请号:US15145689

    申请日:2016-05-03

    Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

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