Abstract:
A zoom lens and a photographing apparatus including the zoom lens are provided. The zoom lens includes a first lens group having a positive refractive power, a second lens group having a negative refractive power, a third lens group having a positive refractive power, and a fourth lens group having a positive refractive power, all of which are arranged sequentially from an object side to an image side. The second lens group may include a first negative lens, a second negative lens, and a first positive lens. The second lens group may also satisfy 5.6≦|fG2n2/fw|≦10.0, where fG2n2 is a focal length of the second negative lens therein and fw is an overall focal length of the zoom lens at a wide-angle position.
Abstract:
A field effect transistor having at least one Ge nanorod and a method of manufacturing the field effect transistor are provided. The field effect transistor may include a gate insulation layer formed on a silicon substrate, at least one nanorod embedded in the gate insulation layer having both ends thereof exposed, a source electrode and a drain electrode connected to opposite sides of the at least one Ge nanorod, and a gate electrode formed on the gate insulation layer between the source electrode and the drain electrode.
Abstract:
A zoom lens and a photographing apparatus including the zoom lens are provided. The zoom lens includes a first lens group having a positive refractive power, a second lens group having a negative refractive power, a third lens group having a positive refractive power, and a fourth lens group having a positive refractive power, all of which are arranged sequentially from an object side to an image side. The second lens group may include a first negative lens, a second negative lens, and a first positive lens. The second lens group may also satisfy 5.6≦|fG2n2/fw|≦10.0, where fG2n2 is a focal length of the second negative lens therein and fw is an overall focal length of the zoom lens at a wide-angle position.