公开(公告)号：US09491529B2

公开(公告)日：2016-11-08

申请号：US14200334

申请日：2014-03-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seung-chan Lee ,  Ki-soo Kim

IPC: H04R29/00 ,  H04R1/00 ,  H04R1/02

CPC classification number: H04R1/00 ,  H04R1/025 ,  H04R2201/021

Abstract: A built-in audio apparatus includes a speaker unit, a mode setting unit configured to selectively set the speaker unit to one of a first position and a second position, and a controller configured to control the speaker unit depending on the setting of one of the first position and the second position. The mode setting unit is configured to be disposed in a surface of a structure, and includes an opening for emitting sound outputted from the speaker unit.

Abstract translation: 内置音频装置包括扬声器单元，模式设置单元，被配置为将扬声器单元选择性地设置为第一位置和第二位置之一;以及控制器，被配置为根据所述扬声器单元的设置来控制扬声器单元 第一职位和第二职位。 模式设置单元被配置为设置在结构的表面中，并且包括用于发射从扬声器单元输出的声音的开口。

公开(公告)号：US20130290890A1

公开(公告)日：2013-10-31

申请号：US13665017

申请日：2012-10-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Chi-young Ahn ,  Jong-chan Kwon ,  Ki-soo Kim ,  Jung-hoon Kim ,  Sang-min Hyun

IPC: G06F3/048

CPC classification number: G06F3/04886 ,  A61B8/461 ,  A61B8/467 ,  G01S7/52084

Abstract: A method of displaying a function of a button of an ultrasound apparatus on the button includes displaying information about one or more functions provided by the ultrasound apparatus, selecting one from among the one or more functions which have been displayed, determining a button in which the selected function is to be set based on an external input signal for matching the selected function to the button in which the selected function is to be set; and displaying information about the selected function on the determined button.

Abstract translation: 在按钮上显示超声波装置的按钮的功能的方法包括显示关于由超声波装置提供的一个或多个功能的信息，从已经显示的一个或多个功能中选择一个，确定其中 所选择的功能将根据外部输入信号进行设置，以将所选择的功能与要设置所选功能的按钮相匹配; 并在确定的按钮上显示关于所选功能的信息。

公开(公告)号：US10031666B2

公开(公告)日：2018-07-24

申请号：US13665017

申请日：2012-10-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Chi-young Ahn ,  Jong-chan Kwon ,  Ki-soo Kim ,  Jung-hoon Kim ,  Sang-min Hyun

IPC: G06F3/048 ,  G06F3/0488 ,  A61B8/00 ,  G01S7/52

CPC classification number: G06F3/04886 ,  A61B8/461 ,  A61B8/467 ,  G01S7/52084

Abstract: A method of displaying a function of a button of an ultrasound apparatus on the button includes displaying information about one or more functions provided by the ultrasound apparatus, selecting one from among the one or more functions which have been displayed, determining a button in which the selected function is to be set based on an external input signal for matching the selected function to the button in which the selected function is to be set; and displaying information about the selected function on the determined button.

公开(公告)号：US11086513B2

公开(公告)日：2021-08-10

申请号：US16025381

申请日：2018-07-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chi-young Ahn ,  Jong-chan Kwon ,  Ki-soo Kim ,  Jung-hoon Kim ,  Sang-min Hyun

IPC: G06F3/048 ,  G06F3/0488 ,  A61B8/00 ,  G01S7/52

Abstract: A method of displaying a function of a button of an ultrasound apparatus on the button includes displaying information about one or more functions provided by the ultrasound apparatus, selecting one from among the one or more functions which have been displayed, determining a button in which the selected function is to be set based on an external input signal for matching the selected function to the button in which the selected function is to be set; and displaying information about the selected function on the determined button.

公开(公告)号：US10962874B2

公开(公告)日：2021-03-30

申请号：US16382351

申请日：2019-04-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Akio Misaka ,  No-young Chung ,  Ki-soo Kim

IPC: G03F1/36 ,  G03F7/20

Abstract: A method of manufacturing a semiconductor device includes performing extreme ultraviolet (EUV) lithography that uses a mask for the EUV lithography manufactured by using a design layout on which optical proximity correction (OPC) is performed, and performing the OPC includes dividing respective patterns included in the design layout into partial patterns, classifying the partial patterns into a plurality of partial pattern groups, performing a first OPC on the design layout, and performing a second OPC that is different from the first OPC on the design layout on which the first OPC is performed, wherein performing the first OPC is performed on representative patterns selected from the plurality of partial pattern groups.

公开(公告)号：US10908498B2

公开(公告)日：2021-02-02

申请号：US15869457

申请日：2018-01-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ki-soo Kim ,  No-young Chung

IPC: G03F1/84 ,  G03F7/20 ,  G03F1/70 ,  G03F1/36

Abstract: An optical proximity correction (OPC) method includes preparing basic data for OPC, measuring with a scanning electron microscope (SEM) an after development inspection (ADI) critical dimension (CD) of a photoresist (PR) pattern with respect to a sample, measuring with the SEM an after cleaning inspection (ACI) CD of a wafer pattern formed using the PR pattern, generating CD data of the sample reflecting PR shrinking caused by the SEM measurement by using the measured ADI CD of the PR pattern and the measured ACI CD of the wafer pattern; and generating an OPC model based on the basic data and the CD data of the sample.