公开(公告)号：US20190134974A1

公开(公告)日：2019-05-09

申请号：US15982146

申请日：2018-05-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho YU ,  Dong Wook KIM ,  Byeong Sang KIM ,  Kyung Bin PARK ,  Ki Ju SOHN ,  Ju Hyun LEE

IPC: B41F23/04 ,  F26B3/28 ,  B41M7/00

Abstract: An ultraviolet curing apparatus includes a housing, a plurality of ultraviolet light emitting diodes (LEDs) arranged in a length direction of the housing, and at least one shutter part coupled to the housing to be movable in the length direction, to cover at least a portion of the plurality of ultraviolet LEDs to limit an irradiation region of ultraviolet light emitted by the plurality of ultraviolet LEDs.

公开(公告)号：US20190099938A1

公开(公告)日：2019-04-04

申请号：US15946790

申请日：2018-04-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho YU ,  Byeong Sang KIM ,  Jung Wook KIM ,  Kyung Bin PARK ,  Ki Ju SOHN ,  Eun Soo HWANG

IPC: B29C59/04 ,  G03F7/00 ,  B41L47/46

Abstract: An imprinting apparatus includes a first frame, a pressure roller rotatably supported on a first end of the first frame, a second frame including a support portion coupled to a second end of the first frame, and at least one guide portion coupled to the support portion to be laterally movable, and at least one load roller supported by the at least one guide portion, the at least one load roller being movable in a vertical direction while being rotatable and contacting a surface of the pressure roller on an upper portion of the pressure roller according to a lateral movement of the guide portion, the at least one load roller to press the pressure roller by force exerted by a load of the at least one load roller.

公开(公告)号：US20190131164A1

公开(公告)日：2019-05-02

申请号：US15996848

申请日：2018-06-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byeong Sang KIM ,  Ki Ju SOHN ,  Ju Hyun LEE ,  Dong Wook KIM ,  Kyung Bin PARK ,  Woo Sub SHIM ,  Jung Wook KIM ,  Ho YU ,  Myoung Soo CHOI ,  Eun Soo HWANG

IPC: H01L21/687 ,  H01J37/32 ,  H01L21/67

Abstract: A substrate processing apparatus includes an exhaust unit including a lower surface in which an outlet is formed and four side walls extended from the lower surface, the exhaust unit having exhaust wings protruding from two opposing side walls, a shower head located in the exhaust unit and having distribution holes, and an adjuster disposed on each of side walls of the exhaust unit between the exhaust wings.

公开(公告)号：US20240184216A1

公开(公告)日：2024-06-06

申请号：US18242407

申请日：2023-09-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yoon Sang LEE ,  Eun Hee JEANG ,  Dong Hyeong KIM ,  Teun BOEREN ,  Jeong-Gil KIM ,  Kyung Bin PARK ,  Hyuck SHIN

IPC: G03F7/00

CPC classification number: G03F7/7055

Abstract: A monitoring unit for measuring, in real time, the power of an EUV beam transmitted to a substrate and a substrate treating apparatus including the monitoring unit. The substrate treating apparatus comprising a source which generates an EUV beam, a scanner which transfers a mask pattern to a substrate by using the EUV beam, and a monitoring unit which comprises a detector for detecting the EUV beam and monitoring the power of the EUV beam in real time, wherein the detector is disposed on a path along which the EUV beam passes through a first mirror assembly provided in the scanner and moves to a reticle on which the mask pattern is formed.