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    Alignment for imprint lithography
    3.
    发明申请
    Alignment for imprint lithography 失效
    刻印光刻对准

    公开(公告)号：US20070145643A1

    公开(公告)日：2007-06-28

    申请号：US11316361

    申请日：2005-12-23

    申请人： Johan Dijksman ,  Raymond Knaapen ,  Krassimir Krastev ,  Sander Wuister ,  Yvonne Kruijt-Stegeman ,  Ivar Schram

    发明人： Johan Dijksman ,  Raymond Knaapen ,  Krassimir Krastev ,  Sander Wuister ,  Yvonne Kruijt-Stegeman ,  Ivar Schram

    IPC分类号： B29C35/08

    CPC分类号： G03F9/7053 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7042 ,  Y10S977/877 ,  Y10S977/888

    摘要： A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.

    摘要翻译： 公开了一种将压印模板相对于衬底的目标区域对准的方法，该方法包括在目标区域内沉积一定量的可压印介质; 将压印模板接触到可压印介质，使得可压印介质被压缩并且允许压印模板，目标区域或两者在目标区域和压印模板之间的界面张力下相对于彼此横向移动，其中 提供了比衬底少润湿的材料，其形式至少部分地围绕衬底的目标区域。

    Imprint lithography
    4.
    发明申请
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US20070264591A1

    公开(公告)日：2007-11-15

    申请号：US11433765

    申请日：2006-05-15

    申请人： Sander Wuister ,  Johan Dijksman ,  Yvonne Kruijt-Stegeman ,  Ivar Schram

    发明人： Sander Wuister ,  Johan Dijksman ,  Yvonne Kruijt-Stegeman ,  Ivar Schram

    IPC分类号： C03C15/00 ,  G03C5/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.

    摘要翻译： 制作印模模板的方法包括在基底上提供转移层并在转印层上提供可压印介质层，使用主印模模板将图案压印到可压印介质中，通过将可印迹介质暴露于光化反应中来聚合可印迹介质 辐射，然后蚀刻所得聚合物层，转印层和基底，使得印记图案转印到基底上，基底由此变成具有与母版印模板上提供的图案相反的图案的印模模板。

    Imprint lithography
    6.
    发明申请
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US20070238037A1

    公开(公告)日：2007-10-11

    申请号：US11392950

    申请日：2006-03-30

    申请人： Sander Wuister ,  Johan Dijksman ,  Yvonne Kruijt-Stegeman ,  Ivar Schram

    发明人： Sander Wuister ,  Johan Dijksman ,  Yvonne Kruijt-Stegeman ,  Ivar Schram

    IPC分类号： G03F9/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0017

    摘要： A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a second pattern, the second pattern being the substantial inverse of the first pattern, filling recesses of the second pattern with a photo-curable medium, curing the photo-curable medium by illuminating it with radiation, and removing the cured medium from the second imprint template to form a third imprint template which bears a pattern that is a substantial replica of the first pattern.

    摘要翻译： 公开了制作承载第一图案的第一印模模板的实质复制品的方法。 该方法包括用第一材料填充第一图案的凹部，从第一印模模板移除第一材料以形成承载第二图案的第二印模模板，第二图案是第一图案的实质倒数， 所述第二图案具有可光固化介质，通过用辐射照射光固化介质来固化光固化介质，以及从第二压印模板中除去固化介质以形成第三印模模板，该模板具有第一印模模板， 模式。

    Structured polmer substrate for ink-jet printing of an oled matrix
    9.
    发明申请
    Structured polmer substrate for ink-jet printing of an oled matrix 审中-公开
    用于喷墨打印的结构化聚合物基质

    公开(公告)号：US20050190253A1

    公开(公告)日：2005-09-01

    申请号：US10502961

    申请日：2003-01-29

    申请人： Paulus Duineveld ,  Johan Dijksman

    发明人： Paulus Duineveld ,  Johan Dijksman

    IPC分类号： H05B33/10 ,  H01L27/32 ,  H01L51/00 ,  H01L51/40 ,  H01L51/50 ,  H01L51/52 ,  H05B33/02 ,  H05B33/12 ,  H05B33/22 ,  B41J3/407 ,  G03C5/00 ,  G03F9/00 ,  H01J1/62 ,  H01J63/04

    CPC分类号： H01L51/0005 ,  H01L27/3246 ,  H01L27/3283 ,  H01L51/0014 ,  H01L51/52

    摘要： The present invention provides a matrix substrate for controlling liquids printed on the substrate and a method of fabrication of such. According to the invention, a substrate holding a matrix of pixels for receiving and holding printed liquids is fabricated in a deformable and flexible polymeric material which allows for raised structures (barriers) separating the pixels to be formed in the substrate material itself. This renders possible a number of new methods of fabrication for the fabrication of matrix substrates, e.g. for use in polyLED displays. The materials and methods of fabrication according to the invention further remove a number of limitations in the freedom of design known from materials and methods of fabrication according to the prior art. This leads to the possibility of barrier profiles with overhanging structures, improved resolution and new dimension ranges.

    摘要翻译： 本发明提供了一种用于控制印刷在基板上的液体的矩阵基板及其制造方法。 根据本发明，保持用于接收和保持印刷液体的像素矩阵的基板被制造成可变形和柔性的聚合材料，其允许将衬底材料本身中要形成的像素分离的凸起结构（阻挡层）。 这使得许多新的制造方法用于制造矩阵衬底，例如， 用于polyLED显示屏。 根据本发明的材料和制造方法进一步消除了根据现有技术的材料和制造方法已知的设计自由度的许多限制。 这导致具有悬垂结构的屏障轮廓的可能性，改进的分辨率和新的尺寸范围。