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公开(公告)号：US20070145643A1
公开(公告)日：2007-06-28
申请号：US11316361
申请日：2005-12-23
申请人： Johan Dijksman , Raymond Knaapen , Krassimir Krastev , Sander Wuister , Yvonne Kruijt-Stegeman , Ivar Schram
发明人： Johan Dijksman , Raymond Knaapen , Krassimir Krastev , Sander Wuister , Yvonne Kruijt-Stegeman , Ivar Schram
IPC分类号： B29C35/08
CPC分类号： G03F9/7053 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , Y10S977/877 , Y10S977/888
摘要： A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.
摘要翻译： 公开了一种将压印模板相对于衬底的目标区域对准的方法，该方法包括在目标区域内沉积一定量的可压印介质; 将压印模板接触到可压印介质，使得可压印介质被压缩并且允许压印模板，目标区域或两者在目标区域和压印模板之间的界面张力下相对于彼此横向移动，其中 提供了比衬底少润湿的材料，其形式至少部分地围绕衬底的目标区域。
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公开(公告)号：US20070141191A1
公开(公告)日：2007-06-21
申请号：US11312659
申请日：2005-12-21
申请人： Yvonne Kruijt-Stegeman , Raymond Knaapen , Johan Dijksman , Krassimir Krastev , Sander Wuister , Aleksey Kolesnychenko , Karel Van Der Mast , Klaus Simon
发明人： Yvonne Kruijt-Stegeman , Raymond Knaapen , Johan Dijksman , Krassimir Krastev , Sander Wuister , Aleksey Kolesnychenko , Karel Van Der Mast , Klaus Simon
IPC分类号： B29C35/08
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。
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公开(公告)号：US20070264591A1
公开(公告)日：2007-11-15
申请号：US11433765
申请日：2006-05-15
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.
摘要翻译： 制作印模模板的方法包括在基底上提供转移层并在转印层上提供可压印介质层，使用主印模模板将图案压印到可压印介质中，通过将可印迹介质暴露于光化反应中来聚合可印迹介质 辐射，然后蚀刻所得聚合物层，转印层和基底，使得印记图案转印到基底上，基底由此变成具有与母版印模板上提供的图案相反的图案的印模模板。
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公开(公告)号：US20070238037A1
公开(公告)日：2007-10-11
申请号：US11392950
申请日：2006-03-30
IPC分类号： G03F9/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a second pattern, the second pattern being the substantial inverse of the first pattern, filling recesses of the second pattern with a photo-curable medium, curing the photo-curable medium by illuminating it with radiation, and removing the cured medium from the second imprint template to form a third imprint template which bears a pattern that is a substantial replica of the first pattern.
摘要翻译： 公开了制作承载第一图案的第一印模模板的实质复制品的方法。 该方法包括用第一材料填充第一图案的凹部，从第一印模模板移除第一材料以形成承载第二图案的第二印模模板，第二图案是第一图案的实质倒数， 所述第二图案具有可光固化介质，通过用辐射照射光固化介质来固化光固化介质，以及从第二压印模板中除去固化介质以形成第三印模模板，该模板具有第一印模模板， 模式。
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公开(公告)号：US20070104813A1
公开(公告)日：2007-05-10
申请号：US11592335
申请日：2006-11-03
IPC分类号： B29C35/08
CPC分类号： B29C59/022 , B29C35/0888 , B29C2035/0827 , B29C2035/0838 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A lithographic apparatus is disclosed that includes an imprint template and a radiation source configured to cure photosensitive material, the radiation source including a laser or a light emitting diode. An imprint template is also disclosed.
摘要翻译： 公开了一种光刻设备，其包括压印模板和被配置为固化感光材料的辐射源，所述辐射源包括激光器或发光二极管。 还公开了印记模板。
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公开(公告)号：US20070138699A1
公开(公告)日：2007-06-21
申请号：US11312658
申请日：2005-12-21
IPC分类号： B29C43/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/11 , G03F7/201
摘要： A lithographic apparatus is disclosed that comprises a template holder configured to hold a plurality of imprint templates, and a substrate holder configured to hold a substrate, the template holder being located beneath the substrate holder.
摘要翻译： 公开了一种光刻设备，其包括被配置为保持多个印模模板的模板保持器，以及被配置为保持基板的基板保持器，所述模板保持器位于所述基板保持器下方。
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公开(公告)号：US20070237886A1
公开(公告)日：2007-10-11
申请号：US11394334
申请日：2006-03-31
申请人： Johan Dijksman , Antonius Wismans , Anke Pierik , Martin Vernhout , Sander Wuister , Yvonne Kruijt-Stegeman
发明人： Johan Dijksman , Antonius Wismans , Anke Pierik , Martin Vernhout , Sander Wuister , Yvonne Kruijt-Stegeman
CPC分类号： G03F7/0002 , B41J3/4071 , B41J3/543 , B41M3/006 , B82Y10/00 , B82Y40/00 , G03F7/16
摘要： An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.
摘要翻译： 公开了压印光刻设备。 所述设备具有被配置为支撑平版印刷基板和布置成将流体喷射到所述平版印刷基板上的多个喷嘴的所述基板台，所述多个喷嘴在基本上等于或大于所述基板的宽度的距离上延伸，其中， 喷嘴，平版印刷基板或两者都可相对于另一个移动。
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公开(公告)号：US20060280829A1
公开(公告)日：2006-12-14
申请号：US11150465
申请日：2005-06-13
申请人： Yvonne Kruijt-Stegeman , Aleksey Kolesnychenko , Erik Loopstra , Johan Dijksman , Helmar Santen , Sander Wuister
发明人： Yvonne Kruijt-Stegeman , Aleksey Kolesnychenko , Erik Loopstra , Johan Dijksman , Helmar Santen , Sander Wuister
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
摘要翻译： 公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁 被构造成形成从周围区域基本密封的封闭空间。
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