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公开(公告)号：US20060280829A1
公开(公告)日：2006-12-14
申请号：US11150465
申请日：2005-06-13
申请人： Yvonne Kruijt-Stegeman , Aleksey Kolesnychenko , Erik Loopstra , Johan Dijksman , Helmar Santen , Sander Wuister
发明人： Yvonne Kruijt-Stegeman , Aleksey Kolesnychenko , Erik Loopstra , Johan Dijksman , Helmar Santen , Sander Wuister
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
摘要翻译： 公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁 被构造成形成从周围区域基本密封的封闭空间。
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公开(公告)号：US20060144274A1
公开(公告)日：2006-07-06
申请号：US11025600
申请日：2004-12-30
IPC分类号： B41F33/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed, in which an embodiment involves subjecting an imprintable medium on a substrate to conditions such that the medium is at a first temperature so that it is in a flowable state, the imprintable medium comprising an imprint material selected from a group consisting of: a crystalline material and a polycrystalline material, pressing a template into the medium to form an imprint in the medium, cooling the medium to a second temperature such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while in the substantially non-flowable state.
摘要翻译： 公开了一种压印方法，其中一个实施例涉及使基材上的可压印介质经受使得介质处于第一温度使其处于可流动状态的状态，所述可压印介质包括压印材料，所述压印材料选自 的结晶材料和多晶材料，将模板压入介质以在介质中形成印迹，将介质冷却至第二温度，使得介质处于基本上不可流动状态，同时介质与 模板，并且在基本上不可流动的状态下将模板与介质分离。
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公开(公告)号：US20060180952A1
公开(公告)日：2006-08-17
申请号：US11155941
申请日：2005-02-17
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/02 , Y10S977/887
摘要： An imprinting method is disclosed that includes applying an imprinting force to a template to cause the template to contact an imprintable medium on a target region of a first surface of a substrate to form an imprint in the medium, during application of the imprinting force, applying a compensating force to a second surface of the substrate which is opposite to the first surface so as to reduce deformation of the substrate caused by the application of the imprinting force, and separating the template from the imprinted medium.
摘要翻译： 公开了一种压印方法，其包括对模板施加压印力，以使得模板在施加压印力的同时在介质的第一表面的目标区域上接触可压印的介质以形成印记， 对基板的与第一表面相对的第二表面的补偿力，以减少由施加压印力引起的基板的变形，以及将模板与压印介质分离。
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公开(公告)号：US20060268256A1
公开(公告)日：2006-11-30
申请号：US11138899
申请日：2005-05-27
IPC分类号： G03B27/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
摘要翻译： 公开了一种光刻设备，其具有被配置为保持压印模板的模板保持器，布置成接收衬底的衬底台，布置成照射压印模板的一部分的辐射输出;以及被配置为检测从界面散射的辐射的检测器 在压印模板和设置在基板上的可压印材料之间。
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公开(公告)号：US20060144814A1
公开(公告)日：2006-07-06
申请号：US11025606
申请日：2004-12-30
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed, which in an embodiment, involves contacting an imprintable medium on a substrate with a template to form an imprint in the medium comprising a pattern feature and an area of reduced thickness, separating the template from the imprinted medium, and, after separating the template from the imprinted medium, providing a layer of an etch resistant material on the pattern feature.
摘要翻译： 公开了一种压印方法，其在一个实施例中涉及使基板上的可压印介质与模板接触以在介质中形成压印，所述压印包括图案特征和厚度减小的区域，将模板与压印介质分离， 在从压印介质分离模板之后，在图案特征上提供耐蚀刻材料层。
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公开(公告)号：US20070018360A1
公开(公告)日：2007-01-25
申请号：US11185971
申请日：2005-07-21
CPC分类号： B29C43/021 , B29C35/0888 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
摘要翻译： 公开了一种光刻设备，其具有被配置为保持压印模板的模板保持器，布置成接收衬底的衬底台，布置成照射压印模板的一部分的辐射输出;以及被配置为检测从界面散射的辐射的检测器 在压印模板和设置在基板上的可压印材料之间。
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公开(公告)号：US20060275524A1
公开(公告)日：2006-12-07
申请号：US11440439
申请日：2006-05-25
IPC分类号： B28B11/08
CPC分类号： B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
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公开(公告)号：US20060266244A1
公开(公告)日：2006-11-30
申请号：US11139991
申请日：2005-05-31
IPC分类号： B41F1/34
CPC分类号： B41F1/34 , B41F1/18 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , G03F9/7042 , G03F9/7084 , H05K1/0269 , H05K3/0008 , H05K2201/09918 , H05K2203/0108
摘要： An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.
摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记 基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。
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公开(公告)号：US20060232756A1
公开(公告)日：2006-10-19
申请号：US11239480
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen , Sjoerd Nicolaas Donders
发明人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen , Sjoerd Nicolaas Donders
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。
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公开(公告)号：US20060196377A1
公开(公告)日：2006-09-07
申请号：US11072686
申请日：2005-03-07
IPC分类号： B41F33/00
CPC分类号： G03F7/0002 , B41M3/003 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.
摘要翻译： 公开了一种压印方法，其包括在一个实施例中，将可流动状态的可压印介质的体积重新分布在衬底的表面的目标部分上的不同体积的区域对应于不同图案密度的区域 模板，在可流动状态下与模板接触以在培养基中形成压印图案，使培养基经受条件以将培养基改变为基本上不可流动的状态，并将模板与培养基分离，同时基本上 不可流动状态。
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