公开(公告)号：US10133264B2

公开(公告)日：2018-11-20

申请号：US14921605

申请日：2015-10-23

Applicant: Semes Co., Ltd.

Inventor： Sung Min Lim

IPC: G05B19/418 ,  H01L21/67

Abstract: A method of aging a substrate-processing apparatus according to the inventive concepts may include receiving advance information of a scheduled substrate-receiving container to be loaded on a load port of the substrate-processing apparatus from a host computer, and loading a test substrate into a process chamber to perform an inspection process by means of the advance information.

公开(公告)号：US11967514B2

公开(公告)日：2024-04-23

申请号：US17151744

申请日：2021-01-19

Applicant: SEMES CO., LTD.

Inventor： Sung Min Lim ,  Han Soo Cho

IPC: G05B19/418 ,  H01L21/67 ,  H01L21/677 ,  H01L21/687

CPC classification number: H01L21/67253 ,  G05B19/41875 ,  H01L21/67742 ,  H01L21/68707 ,  G05B2219/31437 ,  G05B2219/32368

Abstract: An apparatus and a method for controlling a process are provided. An apparatus for controlling a process includes a processor, and a memory for storing a plurality of instructions executed by the processor, in which the plurality of instructions include an instruction for determining deviation tendency of a seating point of a substrate with respect to a seating center point of a substrate support based on a seating point data created by accumulating the seating points of the substrate seated on the substrate support, an instruction for determining an alarm level according to the determined deviation tendency, and an instruction for performing post-processing according to the determined alarm level, in which the seating point data includes a change of the seating point over time.

公开(公告)号：US20210233786A1

公开(公告)日：2021-07-29

申请号：US17151744

申请日：2021-01-19

Applicant: SEMES CO., LTD.

Inventor： Sung Min Lim ,  Han Soo Cho

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  G05B19/418

Abstract: An apparatus and a method for controlling a process are provided. An apparatus for controlling a process includes a processor, and a memory for storing a plurality of instructions executed by the processor, in which the plurality of instructions include an instruction for determining deviation tendency of a seating point of a substrate with respect to a seating center point of a substrate support based on a seating point data created by accumulating the seating points of the substrate seated on the substrate support, an instruction for determining an alarm level according to the determined deviation tendency, and an instruction for performing post-processing according to the determined alarm level, in which the seating point data includes a change of the seating point over time.