Method of performing aging for a process chamber

    公开(公告)号:US10133264B2

    公开(公告)日:2018-11-20

    申请号:US14921605

    申请日:2015-10-23

    Inventor: Sung Min Lim

    Abstract: A method of aging a substrate-processing apparatus according to the inventive concepts may include receiving advance information of a scheduled substrate-receiving container to be loaded on a load port of the substrate-processing apparatus from a host computer, and loading a test substrate into a process chamber to perform an inspection process by means of the advance information.

    Apparatus and method for controlling process

    公开(公告)号:US11967514B2

    公开(公告)日:2024-04-23

    申请号:US17151744

    申请日:2021-01-19

    Abstract: An apparatus and a method for controlling a process are provided. An apparatus for controlling a process includes a processor, and a memory for storing a plurality of instructions executed by the processor, in which the plurality of instructions include an instruction for determining deviation tendency of a seating point of a substrate with respect to a seating center point of a substrate support based on a seating point data created by accumulating the seating points of the substrate seated on the substrate support, an instruction for determining an alarm level according to the determined deviation tendency, and an instruction for performing post-processing according to the determined alarm level, in which the seating point data includes a change of the seating point over time.

    APPARATUS AND METHOD FOR CONTROLLING PROCESS

    公开(公告)号:US20210233786A1

    公开(公告)日:2021-07-29

    申请号:US17151744

    申请日:2021-01-19

    Abstract: An apparatus and a method for controlling a process are provided. An apparatus for controlling a process includes a processor, and a memory for storing a plurality of instructions executed by the processor, in which the plurality of instructions include an instruction for determining deviation tendency of a seating point of a substrate with respect to a seating center point of a substrate support based on a seating point data created by accumulating the seating points of the substrate seated on the substrate support, an instruction for determining an alarm level according to the determined deviation tendency, and an instruction for performing post-processing according to the determined alarm level, in which the seating point data includes a change of the seating point over time.

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