摘要:
The present invention provides a stent that allows a simple surgical operation for affected parts of a lumen in a human body, and particularly reduces a medical side effect by contact or friction between the inside of the lumen and the outside of the stent when the stent is removed from the lumen. The stent includes a cylindrical wire structure having an internal passage and wires that are bent along the internal passage to have peaks and valleys, and a cover film that covers the wire structure. In particular, the cover film covers the wires such that the wires are embedded at the outside of the wire structure and exposed at the inside.
摘要:
A stent for securing a passageway of a body lumen in a constricted portion of the body lumen is disclosed. The stent includes a first cylindrical band body formed in a zigzag shape having a plurality of straight sections interconnected by first peaks and first valleys and having opposite ends that are integrally formed, a second cylindrical band body having a same structure as the first cylindrical band body, the second cylindrical band body being disposed such that second valleys of the second cylindrical band body face the respective first peaks of the first cylindrical band body and second peaks of the second cylindrical band body face the respective first valleys of the first cylindrical band body with a plurality of predetermined gaps of a first row, thereby defining a plurality of rhombus spaces of a first row, at least one first link member that is provided in at least one rhombus spaces of the first row to interconnect the first and second band bodies, at least one second link members that are provided in at least one rhombus spaces of the second row to interconnect the second and third band bodies.
摘要:
A chemically amplified positive resist composition excellent in sensitivity and resolution as well as other resist performance characteristics comprising a resin (X) which has a polymeric unit represented by the following formula (I): wherein R1 represents hydrogen or methyl, R2 and R3 represent alkyl having 1 to 4 carbon atoms, and R4 and R5 represent hydrogen, hydroxyl or alkyl, polymeric unit represented by the following formula (II): and a polymeric unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride; and an acid generating agent (Y).
摘要:
A photoresist composition includes an alkali-soluble resin, a dissolution inhibitor including a quinone diazide compound, a first additive including a benzenol compound represented by the following Chemical Formula 1, a second additive including an acrylic copolymer represented by the following Chemical Formula 2 and an organic solvent. Accordingly, heat resistance of a photoresist pattern may be improved, and the photoresist pattern may be readily stripped. As a result, crack formation in the photoresist pattern may be reduced and/or prevented.
摘要:
A chemically amplified positive resist composition is provided which is excellent in sensitivity and resolution; and comprises a resin (X) which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali by the action of acid, and has a polymeric unit (a) derived from an alicyclic unsaturated carboxylic acid ester in which a carboxylic acid ester group represented by the formula (I): wherein R1 represents an alkyl having 1 to 4 carbon atoms, R represents an alicyclic hydrocarbon residue which may be optionally substituted with a group selected from hydroxyl and oxo, and R2 represents an alkyl having 1 to 4 carbon atoms, or R and R2, together with carbon atoms to which R2 and R are bonded, form a ring, is bonded to an alicyclic hydrocarbon having a polymerizable carbon-carbon double bond in its ring; and a polymeric unit (b) derived from maleic anhydride; and an acid-generating agent (Y).