公开(公告)号：US06800862B2

公开(公告)日：2004-10-05

申请号：US10314117

申请日：2002-12-09

申请人： Takao Matsumoto ,  Kohichi Orihira ,  Kazuhiro Nakao ,  Mitsunori Nakamura

发明人： Takao Matsumoto ,  Kohichi Orihira ,  Kazuhiro Nakao ,  Mitsunori Nakamura

IPC分类号： B01D5444

CPC分类号： H01J37/3171 ,  H01J2237/304

摘要： The ion implanting apparatus is provided with a control device which controls the operating state thereof in a period during which ion implantation is not carried out for a substrate in the state in any mode selected from the above (a) twilight mode in which the flow rate of the raw gas supplied to an ion source and the power supplied from a plasma producing power source are reduced to values capable of keeping plasma production in the ion source, (b) magnet-off mode in which in addition to the state in the twilight mode, the outputs from an energy separating magnet power source, scanning magnet power source and beam paralleling magnet power source are stopped, and (c) shut-down mode in which the supply of the raw gas is stopped and the outputs from the power sources are stopped.

摘要翻译： 离子注入装置设置有控制装置，该控制装置在从上述（a）暮光模式中选择的任何模式的状态下对基板进行离子注入的时间段期间控制其操作状态，其中流量 提供给离子源的原料气体和从等离子体产生电源供给的功率被降低到能够在离子源中保持等离子体生成的值，（b）除了暮色状态之外的磁体断开模式 停止从能量分离磁体电源，扫描磁体电源和光束平行磁体电源的输出，以及（c）原料气体的供给停止的停止模式和电源的输出 被停止

公开(公告)号：US08143595B2

公开(公告)日：2012-03-27

申请号：US12547195

申请日：2009-08-25

申请人： Junichi Tatemichi ,  Masatoshi Onoda ,  Kohichi Orihira

发明人： Junichi Tatemichi ,  Masatoshi Onoda ,  Kohichi Orihira

IPC分类号： C23C14/50

CPC分类号： H01L21/67213 ,  H01J37/20 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204 ,  H01J2237/31701 ,  H01L21/68764 ,  H01L21/68771

摘要： An ion implanter includes an implantation chamber into which an ion beam is introduced, a holder for holding substrates on two columns of a first column and a second column in an X-direction, and a holder driving unit having a function of setting the holder in a horizontal state and then positioning the holder in a substrate exchange position and a function of setting the holder in a standing state and then driving reciprocally and linearly the holder along the X-direction in an irradiation area of the ion beam. Also, the ion implanter includes two load lock mechanisms, and two substrate carrying units equipped with arms, which carry the substrates between the load lock mechanisms and a substrate exchange position respectively, every two arms.

摘要翻译： 离子注入机包括：入射离子束的注入室，用于将基板保持在X方向上的第一列和第二列的两列的保持器，以及具有将所述保持器设置为的功能的保持器驱动单元 水平状态，然后将保持器定位在基板更换位置中，并且具有将支架设置在立起状态，然后在离子束的照射区域沿X方向往复并直线地驱动保持器的功能。 此外，离子注入机还包括两个装载锁定机构，以及两个装有臂的基板承载单元，每个臂分别在两个载荷锁定机构和基板更换位置之间承载基板。

公开(公告)号：US20100314552A1

公开(公告)日：2010-12-16

申请号：US12547195

申请日：2009-08-25

申请人： Junichi Tatemichi ,  Masatoshi Onoda ,  Kohichi Orihira

发明人： Junichi Tatemichi ,  Masatoshi Onoda ,  Kohichi Orihira

IPC分类号： C23C14/50

CPC分类号： H01L21/67213 ,  H01J37/20 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204 ,  H01J2237/31701 ,  H01L21/68764 ,  H01L21/68771

摘要： An ion implanter includes an implantation chamber into which an ion beam is introduced, a holder for holding substrates on two columns of a first column and a second column in an X-direction, and a holder driving unit having a function of setting the holder in a horizontal state and then positioning the holder in a substrate exchange position and a function of setting the holder in a standing state and then driving reciprocally and linearly the holder along the X-direction in an irradiation area of the ion beam. Also, the ion implanter includes two load lock mechanisms, and two substrate carrying units equipped with arms, which carry the substrates between the load lock mechanisms and a substrate exchange position respectively, every two arms.

摘要翻译： 离子注入机包括：入射离子束的注入室，用于将基板保持在X方向上的第一列和第二列的两列的保持器，以及具有将所述保持器设置为的功能的保持器驱动单元 水平状态，然后将保持器定位在基板更换位置中，并且具有将支架设置在立起状态，然后在离子束的照射区域沿X方向往复并直线地驱动保持器的功能。 此外，离子注入机还包括两个装载锁定机构，以及两个装有臂的基板承载单元，每个臂分别在两个载荷锁定机构和基板更换位置之间承载基板。