VACUUM TREATMENT APPARATUS AND VACUUM TREATMENT METHOD

    公开(公告)号:US20240067480A1

    公开(公告)日:2024-02-29

    申请号:US18361293

    申请日:2023-07-28

    Applicant: ULVAC, INC.

    CPC classification number: B65H18/20 B65H23/038 B65H2404/1362 B65H2553/27

    Abstract: In a present vacuum treatment apparatus, a controller controls an auxiliary roller, a thermometer, a power source, and a temperature control mechanism, in which the controller detects a temperature of a base material wound and conveyed by a main roller, starts film deposition to form a film deposition material on the base material when the temperature of the base material is in a film deposition temperature range, adjusts, when the temperature of the base material is out of a threshold range after starting film deposition on the base material, the temperature of the main roller so that the temperature of the base material falls within the threshold range and adjusts an adhesion force between the main roller and the base material, and continues the film deposition of the film deposition material on the base material with the temperature of the base material in the film deposition temperature range.

    VACUUM TREATMENT APPARATUS AND VACUUM TREATMENT METHOD

    公开(公告)号:US20240058839A1

    公开(公告)日:2024-02-22

    申请号:US18360950

    申请日:2023-07-28

    Applicant: ULVAC, INC.

    CPC classification number: B05D1/28

    Abstract: A vacuum treatment apparatus including: a first wind-off roller paying out a first base material; a first wind roller winding the first base material; a main roller having an outer circumferential surface in contact with a non-film deposition surface, and winding and conveying the first base material, at least a part of the outer circumferential surface, which is uncovered with the first base material, being coated with an insulating material; a deposition source facing the outer circumferential surface of the main roller; a second wind-off roller paying out a second base material that is wound and conveyed by the main roller and covers a part of a film deposition surface of the first base material on the outer circumferential surface of the main roller; a second wind roller winding the second base material; and a power source applying a bias potential to the main roller.

    SPUTTERING APPARATUS
    3.
    发明申请

    公开(公告)号:US20210222289A1

    公开(公告)日:2021-07-22

    申请号:US15734889

    申请日:2019-07-04

    Applicant: ULVAC, INC.

    Abstract: A sputtering apparatus includes a plate-shaped regulator that is provided between a target and a substrate, has an opening corresponding to a magnetic circuit, and covers a portion not corresponding to the magnetic circuit. The regulator covers at least a surface area that is greater than or equal to a half of a surface area of the substrate. The opening has a substantially fan-shaped outline. The opening is arranged so as to substantially coincide with the magnetic circuit when viewed in a direction of a rotation axis line of the target, and the rotation axis line of the target and a rotation axis line of the substrate are arranged substantially parallel to each other.

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