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    PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT DEVICE
    1.
    发明申请
    PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT DEVICE 有权
    用于具有测量装置的微观计算的投影曝光系统

    公开(公告)号：US20110013171A1

    公开(公告)日：2011-01-20

    申请号：US12838393

    申请日：2010-07-16

    申请人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

    发明人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70775 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/70891

    摘要： A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26. An evaluation device (54) is configured to establish a lateral position of the image of the measurement structure (48) in the area of the detector (52) during the exposure process.

    摘要翻译： 一种用于微光刻的投影曝光系统（10），包括：保持掩模（18）的掩模保持装置（14），掩模结构（20）设置在掩模上;保持基板（30）的基板保持装置（36） 投影光学器件（26）在曝光过程期间将掩模结构（20）成像到衬底（30）上;以及测量结构（48），其相对于投影曝光系统的参考元件（16）设置在限定位置 10），所述限定位置与所述掩模保持装置（14）的位置机械地脱离。 投影曝光系统（10）还包括检测器（52），其被布置成记录由投影光学器件（26）成像的测量结构（48）的图像。 投影曝光系统（10）被配置为使得在投影曝光系统（10）的操作期间，掩模结构（20）的成像和测量结构（48）的成像同时由投影光学器件 （26）评估装置（54）被配置为在曝光处理期间在检测器（52）的区域中建立测量结构（48）的图像的横向位置。

    Projection exposure system for microlithography with a measurement device
    2.
    发明授权
    Projection exposure system for microlithography with a measurement device 有权
    具有测量装置的微光刻投影曝光系统

    公开(公告)号：US09001304B2

    公开(公告)日：2015-04-07

    申请号：US12838393

    申请日：2010-07-16

    申请人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

    发明人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70775 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/70891

    摘要： A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26. An evaluation device (54) is configured to establish a lateral position of the image of the measurement structure (48) in the area of the detector (52) during the exposure process.

    摘要翻译： 一种用于微光刻的投影曝光系统（10），包括：保持掩模（18）的掩模保持装置（14），掩模结构（20）设置在掩模上;保持基板（30）的基板保持装置（36） 投影光学器件（26）在曝光过程期间将掩模结构（20）成像到衬底（30）上;以及测量结构（48），其相对于投影曝光系统的参考元件（16）设置在限定位置 10），所述限定位置与所述掩模保持装置（14）的位置机械地脱离。 投影曝光系统（10）还包括检测器（52），其被布置成记录由投影光学器件（26）成像的测量结构（48）的图像。 投影曝光系统（10）被配置为使得在投影曝光系统（10）的操作期间，掩模结构（20）的成像和测量结构（48）的成像同时由投影光学器件 （26）评估装置（54）被配置为在曝光处理期间在检测器（52）的区域中建立测量结构（48）的图像的横向位置。

    DATA STORAGE AND DISPLAY DEVICE
    3.
    发明申请
    DATA STORAGE AND DISPLAY DEVICE 审中-公开
    数据存储和显示设备

    公开(公告)号：US20080250346A1

    公开(公告)日：2008-10-09

    申请号：US12049453

    申请日：2008-03-17

    申请人： Paul Kaufmann

    发明人： Paul Kaufmann

    IPC分类号： G06F3/048

    CPC分类号： G16H10/65 ,  G16H40/63

    摘要： A process for providing information related to an individual or an animal in a portable display and storage device that allows other individuals to access the personal and medical information quickly. The process includes entering the information in formatted screens of data in a computer, transferring the formatted screens of data to the portable display and storage device, storing the formatted screens of data in the portable display and storage device, and displaying the formatted screens of data in the portable display and storage device. In some embodiments, the formatted screens of data in the display and storage device are transferred to a computer, modified, and transferred back to the display and storage device.

    摘要翻译： 用于在便携式显示和存储设备中提供与个人或动物相关的信息的过程，其允许其他个人快速访问个人和医疗信息。 该过程包括在计算机中以格式化的数据化屏幕输入信息，将格式化的数据屏幕传送到便携式显示和存储设备，将格式化的数据屏幕存储在便携式显示和存储设备中，并且显示格式化的数据屏幕 在便携式显示和存储设备中。 在一些实施例中，将显示和存储设备中的格式化数据的屏幕传送到计算机，修改并传送回显示和存储设备。

    Optical bench
    5.
    发明授权
    Optical bench 失效
    光学台

    公开(公告)号：US06788476B2

    公开(公告)日：2004-09-07

    申请号：US10097898

    申请日：2002-03-13

    申请人： Armin Schöppach ,  Paul Kaufmann ,  Hartmut Münker

    发明人： Armin Schöppach ,  Paul Kaufmann ,  Hartmut Münker

    IPC分类号： G02B702

    CPC分类号： G01M11/04

    摘要： The invention relates to an optical bench that has a base plate and can be permanently connected to an associated component. A receiving element for other optical elements that is arranged in such a way in relation to the base plate with connecting elements that it is deformable in its entirety in relation to said base plate, is allocated to the same.

    摘要翻译： 本发明涉及一种具有基板并且可以永久地连接到相关部件的光学台。 用于其它光学元件的接收元件被分配给与其相对于基板相对于基板布置的连接元件，该连接元件可相对于所述基板整体变形。

    Electrically Powered Rail Propulsion Vehicle and Method
    6.
    发明申请
    Electrically Powered Rail Propulsion Vehicle and Method 审中-公开
    电动轨道推进车辆和方法

    公开(公告)号：US20080021602A1

    公开(公告)日：2008-01-24

    申请号：US11849190

    申请日：2007-08-31

    申请人： John Kingham ,  Thomas Bartley ,  Paul Kaufmann

    发明人： John Kingham ,  Thomas Bartley ,  Paul Kaufmann

    IPC分类号： G05D1/00 ,  B61C3/00 ,  H02J7/00 ,  H02K7/02

    CPC分类号： B60L9/00 ,  B60L7/06 ,  B60L7/14 ,  B60L7/22 ,  B60L50/30 ,  B60L50/40 ,  B60L50/51 ,  B60L2200/26 ,  Y02T10/7005 ,  Y02T10/7022

    摘要： A method of bridging a gap in an external electrical power supply line without stalling using an electrically powered rail propulsion vehicle includes using an electrically powered rail propulsion vehicle to propel a consist, the electrically powered rail propulsion vehicle configured to run as an emission-free pure electric unit from the external electrical power supply line; determining if a gap in the external electrical power supply line condition occurs; and supplying electric power from one or more ultracapacitor packs to run the electrically powered rail propulsion vehicle if a gap condition is determined to occur.

    摘要翻译： 使用电动轨道推进车辆桥接外部电力供应线路中的间隙而不停止的方法包括使用电动轨道推进车辆推动组合，电动轨道推进车辆被配置为作为无排放纯的 电气单元来自外部电源线; 确定是否发生外部电源线条件的间隙; 并且如果确定发生间隙条件，则从一个或多个超级电容器组件提供电力以运行电动轨道推进车辆。