公开(公告)号：US20220240368A1

公开(公告)日：2022-07-28

申请号：US17455918

申请日：2021-11-21

Applicant: Unimicron Technology Corp.

Inventor： Pei-Wei WANG ,  Heng-Ming NIEN ,  Ching-Sheng CHEN ,  Yi-Pin LIN ,  Shih-Liang CHENG

IPC: H05K1/02

Abstract: A co-axial structure includes a substrate, a first conductive structure, a second conductive structure, and an insulating layer. The substrate includes a first surface. The first conductive structure includes a first circuit deposited on the first surface and a first via penetrating the substrate. The second conductive structure includes a second circuit deposited on the first surface and a second via penetrating the substrate. The first via and the second via extend along a first direction. The first circuit and the second circuit extend along a second direction, and the second direction is perpendicular to the first direction. The insulating layer is located between the first via and the second via. The insulating layer includes a filler. The first conductive structure and the second conductive structure are electrically insulated. The first circuit and the second circuit are coplanar.

公开(公告)号：US20220240375A1

公开(公告)日：2022-07-28

申请号：US17452771

申请日：2021-10-28

Applicant: Unimicron Technology Corp.

Inventor： Ching-Sheng CHEN ,  Chi-Min CHANG ,  Yi-Pin LIN ,  Jun-Rui HUANG

IPC: H05K1/02 ,  H05K3/42 ,  H05K3/02 ,  H05K3/00

Abstract: A co-axial structure includes a substrate, a first conductive structure, a second conductive structure, and an insulating layer. The substrate includes a first surface. The first conductive structure includes a first circuit deposited on the first surface and a first via penetrating the substrate. The second conductive structure includes a second circuit deposited on the first surface and a second via penetrating the substrate. The first via and the second via extend along a first direction. The first circuit and the second circuit extend along a second direction, and the second direction is perpendicular to the first direction. The insulating layer is located between the first via and the second via. The first conductive structure and the second conductive structure are electrically insulated. The first circuit and the second circuit are coplanar.

公开(公告)号：US20220386460A1

公开(公告)日：2022-12-01

申请号：US17377280

申请日：2021-07-15

Applicant: Unimicron Technology Corp.

Inventor： Chi-Min CHANG ,  Ching-Sheng CHEN ,  Jun-Rui HUANG ,  Wei-Yu LIAO ,  Yi-Pin LIN

IPC: H05K1/11 ,  H05K1/18 ,  H05K3/42

Abstract: An interlayer connective structure is suitable for being formed in a wiring board, in which the wiring board includes two traces and an insulation part between the traces. The insulation part has a through hole. The interlayer connective structure located in the through hole is connected to the traces. The interlayer connective structure includes a column and a pair of protuberant parts. The protuberant parts are located at two ends of the through hole respectively and connected to the column and the traces. The protuberant parts stick out from the outer surfaces of the traces respectively. Each of the protuberant parts has a convex curved surface, in which the distance between the convex curved surface and the axis of the through hole is less than the radius of the through hole.