-
1.发明申请METHOD OF OPTICAL PROXIMITY CORRECTION FOR MODIFYING LINE PATTERNS AND INTEGRATED CIRCUITS WITH LINE PATTERNS MODIFIED BY THE SAME 有权用于修改线条图案和整体电路的光学近似校正方法与其修改的线条图案公开(公告)号：US20150137369A1
公开(公告)日：2015-05-21
申请号：US14607051
申请日：2015-01-27
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Kuan-Wen Fang , Chin-Lung Lin , Kuo-Chang Tien , Yi-Hsiu Lee , Chien-Hsiung Wang
IPC: H01L23/528 , G03F1/36 , H01L23/532 , G06F17/50 , H01L23/522
CPC classification number: H01L23/528 , G03F1/144 , G03F1/36 , G06F17/5068 , G06F17/5077 , G06T2207/30148 , H01L23/5226 , H01L23/53271 , H01L2924/0002 , H01L2924/00
Abstract: A method of optical proximity correction executed by a computer system for modifying line patterns includes the following steps. First, providing an integrated circuit layout with parallel line patterns and interconnect patterns disposed corresponding to the parallel line patterns. Then, using the computer to modify the integrated circuit layout based on a position of the interconnect patterns so as to generate a convex portion and a concave portion respectively on two sides of each of the parallel line patterns. Portions of the line pattern in front of and behind the convex portion and the concave portion are straight lines and have an identical critical dimension.
Abstract translation: 由计算机系统执行的用于修改线路图案的光学邻近校正的方法包括以下步骤。 首先，提供具有与平行线图案相对布置的平行线图案和互连图案的集成电路布局。 然后，使用计算机基于互连图案的位置来修改集成电路布局，以便分别在每个平行线图案的两侧上产生凸部和凹部。 在凸部和凹部之前和之后的线图案的部分是直线并且具有相同的临界尺寸。
-
2.发明授权Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same 有权用于修改线图案的光学邻近校正方法和由其修改的线图案的集成电路的方法公开(公告)号：US09530731B2
公开(公告)日：2016-12-27
申请号：US14607051
申请日：2015-01-27
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Kuan-Wen Fang , Chin-Lung Lin , Kuo-Chang Tien , Yi-Hsiu Lee , Chien-Hsiung Wang
IPC: G03F1/00 , G06F17/50 , H01L23/528 , G03F1/36 , H01L23/522 , H01L23/532
CPC classification number: H01L23/528 , G03F1/144 , G03F1/36 , G06F17/5068 , G06F17/5077 , G06T2207/30148 , H01L23/5226 , H01L23/53271 , H01L2924/0002 , H01L2924/00
Abstract: A method of optical proximity correction executed by a computer system for modifying line patterns includes the following steps. First, providing an integrated circuit layout with parallel line patterns and interconnect patterns disposed corresponding to the parallel line patterns. Then, using the computer to modify the integrated circuit layout based on a position of the interconnect patterns so as to generate a convex portion and a concave portion respectively on two sides of each of the parallel line patterns. Portions of the line pattern in front of and behind the convex portion and the concave portion are straight lines and have an identical critical dimension.
Abstract translation: 由计算机系统执行的用于修改线路图案的光学邻近校正的方法包括以下步骤。 首先，提供具有与平行线图案相对布置的平行线图案和互连图案的集成电路布局。 然后，使用计算机基于互连图案的位置来修改集成电路布局，以便分别在每个平行线图案的两侧上产生凸部和凹部。 在凸部和凹部之前和之后的线图案的部分是直线并且具有相同的临界尺寸。
-
3.发明授权Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same 有权用于修改线图案的光学邻近校正方法和由其修改的线图案的集成电路的方法公开(公告)号：US08977988B2
公开(公告)日：2015-03-10
申请号：US13859718
申请日：2013-04-09
Applicant: United Microelectronics Corp.
Inventor： Kuan-Wen Fang , Chin-Lung Lin , Kuo-Chang Tien , Yi-Hsiu Lee , Chien-Hsiung Wang
CPC classification number: H01L23/528 , G03F1/144 , G03F1/36 , G06F17/5068 , G06F17/5077 , G06T2207/30148 , H01L23/5226 , H01L23/53271 , H01L2924/0002 , H01L2924/00
Abstract: A method of optical proximity correction executed by a computer system and integrated circuit layout formed by the same, the step of optical proximity correction comprises: providing an integrated circuit layout with a plurality of parallel line patterns, wherein one side of at least one line pattern is provided with a convex portion; and modifying the integrated circuit layout by forming a concave portion corresponding to the convex portion at the other side of the line pattern.
Abstract translation: 由计算机系统执行的光学邻近校正方法和由其形成的集成电路布局的方法，光学邻近校正步骤包括：提供具有多条平行线图案的集成电路布局，其中至少一条线图案的一侧 设置有凸部; 以及通过在所述线图案的另一侧形成与所述凸部对应的凹部来修改所述集成电路布局。
-
4.发明申请公开(公告)号：US20140304666A1
公开(公告)日：2014-10-09
申请号：US13859718
申请日：2013-04-09
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Kuan-Wen Fang , Chin-Lung Lin , Kuo-Chang Tien , Yi-Hsiu Lee , Chien-Hsiung Wang
IPC: G06F17/50
CPC classification number: H01L23/528 , G03F1/144 , G03F1/36 , G06F17/5068 , G06F17/5077 , G06T2207/30148 , H01L23/5226 , H01L23/53271 , H01L2924/0002 , H01L2924/00
Abstract: A method of optical proximity correction executed by a computer system and integrated circuit layout formed by the same, the step of optical proximity correction comprises: providing an integrated circuit layout with a plurality of parallel line patterns, wherein one side of at least one line pattern is provided with a convex portion; and modifying the integrated circuit layout by forming a concave portion corresponding to the convex portion at the other side of the line pattern.
Abstract translation: 由计算机系统执行的光学邻近校正方法和由其形成的集成电路布局的方法，光学邻近校正步骤包括：提供具有多条平行线图案的集成电路布局，其中至少一条线图案的一侧 设置有凸部; 以及通过在所述线图案的另一侧形成与所述凸部对应的凹部来修改所述集成电路布局。
-
-
-
Search Results
4
records
(took 0.014 seconds)
