公开(公告)号：US06723168B2

公开(公告)日：2004-04-20

申请号：US09885715

申请日：2001-06-20

申请人： Yao-Hwan Kao ,  Yi-Chuan Lo

发明人： Yao-Hwan Kao ,  Yi-Chuan Lo

IPC分类号： B05C500

CPC分类号： H01L21/6715 ,  G03F7/162

摘要： A spin-coater for coating a liquid material on a wafer that is equipped with a self-cleaning coating cup and a method for self-cleaning a spin-coater are described. The spin-coater is constructed of a coating cup of circular shape, a wafer pedestal situated in the cup, a coating material dispensing nozzle over the pedestal, a motor means for rotating the pedestal, and a solvent dispensing means that is mounted juxtaposed to an upper rim of the sidewall of the cup for dispensing a cleaning solvent onto an interior surface of the sidewall to dissolve and rinse off any liquid coating material splattered thereon and to prevent the formation of solid contamination from the solidified coating material.

摘要翻译： 描述了用于在配备有自清洁涂层杯的晶片上涂覆液体材料的旋涂机和自清洁旋转涂布机的方法。 旋转涂布机由圆形的涂层杯，位于杯中的晶片基座，基座上的涂料分配喷嘴，用于旋转基座的马达装置，以及溶解剂分配装置构成，其与 杯的侧壁的上边缘，用于将清洁溶剂分配到侧壁的内表面上，以溶解和冲洗喷溅在其上的任何液体涂料并防止固化的涂层材料形成固体污染物。

公开(公告)号：US20050211695A1

公开(公告)日：2005-09-29

申请号：US10810978

申请日：2004-03-26

申请人： Yao-Hwan Kao ,  Jia-Sheng Lee ,  De-Yuan Lu ,  Ming-Fa Chen

发明人： Yao-Hwan Kao ,  Jia-Sheng Lee ,  De-Yuan Lu ,  Ming-Fa Chen

IPC分类号： F27B17/00 ,  F27D11/00 ,  F27D19/00 ,  H01L21/00

CPC分类号： H01L21/67017 ,  F27B17/0025 ,  F27D19/00 ,  H01L21/67109

摘要： A method and apparatus for adjusting exhaust flow, and the apparatus has a programmable exhaust control regulator generating a first input signal to a motor control circuit, an exhaust flow meter generating a second input signal to the motor control circuit and a motor driven control valve moved to different positions according to the first and second input signals, the control valve being installed in an exhaust portion of the hot plate apparatus.

摘要翻译： 一种用于调节排气流量的方法和装置，并且该装置具有可编程排气控制调节器，其产生到马达控制电路的第一输入信号，产生到马达控制电路的第二输入信号的排气流量计和马达驱动的控制阀移动 根据第一和第二输入信号到不同的位置，控制阀安装在热板装置的排气部分中。

公开(公告)号：US07026580B2

公开(公告)日：2006-04-11

申请号：US10810978

申请日：2004-03-26

申请人： Yao-Hwan Kao ,  Jia-Sheng Lee ,  De-Yuan Lu ,  Ming-Fa Chen

发明人： Yao-Hwan Kao ,  Jia-Sheng Lee ,  De-Yuan Lu ,  Ming-Fa Chen

IPC分类号： F27B5/14

CPC分类号： H01L21/67017 ,  F27B17/0025 ,  F27D19/00 ,  H01L21/67109

摘要： A method and apparatus for adjusting exhaust flow, and the apparatus has a programmable exhaust control regulator generating a first input signal to a motor control circuit, an exhaust flow meter generating a second input signal to the motor control circuit and a motor driven control valve moved to different positions according to the first and second input signals, the control valve being installed in an exhaust portion of the hot plate apparatus.

摘要翻译： 一种用于调节排气流量的方法和装置，并且该装置具有可编程排气控制调节器，其产生到马达控制电路的第一输入信号，产生到马达控制电路的第二输入信号的排气流量计和马达驱动的控制阀移动 根据第一和第二输入信号到不同的位置，控制阀安装在热板装置的排气部分中。

公开(公告)号：US5857590A

公开(公告)日：1999-01-12

申请号：US826717

申请日：1997-04-07

申请人： Yao-Hwan Kao ,  Chi-Ren Hsieh

发明人： Yao-Hwan Kao ,  Chi-Ren Hsieh

IPC分类号： B05B9/03 ,  B05B12/04 ,  G01F11/28 ,  G01F11/00

CPC分类号： G01F11/28 ,  B05B12/04 ,  B05B9/035

摘要： A flow system that is suitable for controlled dispensing of liquids such as anti-reflection coatings is described. The system is driven by a gas at high pressure from a single dispensing bottle. On emerging from the dispensing bottle the fluid is directed into one of two branches, each such branch being terminated by its own nozzle. By inserting a needle valve in each branch of the flow system, between the branch point and the nozzle, control of the amount of liquid dispensed by each nozzle is separately achieved and a change in flow through one nozzle does not affect the flow through the other nozzle.

摘要翻译： 描述了适于液体控制分配的流动系统，例如防反射涂层。 该系统由来自单个分配瓶的高压气体驱动。 在从分配瓶出来时，流体被引导到两个分支中的一个，每个这样的分支由其自己的喷嘴端接。 通过在流动系统的每个分支中插入针阀，在分支点和喷嘴之间，分别实现了每个喷嘴分配的液体量的控制，并且通过一个喷嘴的流量变化不影响通过另一个喷嘴的流量 喷嘴。

公开(公告)号：US08580117B2

公开(公告)日：2013-11-12

申请号：US11688530

申请日：2007-03-20

申请人： Yao-Hwan Kao ,  Po-Chang Huang

发明人： Yao-Hwan Kao ,  Po-Chang Huang

IPC分类号： B01D29/96 ,  B01D35/157

CPC分类号： B01D35/02 ,  G03F7/162 ,  G03F7/3092

摘要： System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.

摘要翻译： 描述了以减少滤波器引起的晶片缺陷的方式替换抗蚀剂滤光器的系统和方法。 在一个实施例中，系统包括连接到分配器的过滤系统，该过滤系统包括过滤器; 以及连接到过滤器的开关，用于将过滤系统选择性地连接到第一化学溶液和第二化学溶液中的一种。

公开(公告)号：US20080241760A1

公开(公告)日：2008-10-02

申请号：US11740129

申请日：2007-04-25

申请人： Feng-Ning Lee ,  Yung-Cheng Chen ,  Yao-Hwan Kao ,  Li-Jen Ko ,  Chin-Hsiang Lin

发明人： Feng-Ning Lee ,  Yung-Cheng Chen ,  Yao-Hwan Kao ,  Li-Jen Ko ,  Chin-Hsiang Lin

IPC分类号： G03C5/00

CPC分类号： G03F7/70991 ,  H01L21/67225 ,  H01L21/67748

摘要： The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed for post exposure baking (PEB); and a control module designed to control the exposure module and the baking module.

摘要翻译： 本公开提供一种光刻设备。 该装置包括设计用于曝光处理的曝光模块; 嵌入曝光模块中的烘烤模块，用于后曝光烘烤（PEB）; 以及设计用于控制曝光模块和烘焙模块的控制模块。

公开(公告)号：US20050048208A1

公开(公告)日：2005-03-03

申请号：US10653298

申请日：2003-09-02

申请人： Yao-Hwan Kao ,  Ko-Bin Kao

发明人： Yao-Hwan Kao ,  Ko-Bin Kao

IPC分类号： B05C5/00 ,  B05C11/00 ,  B05D3/12 ,  G03F7/16

CPC分类号： G03F7/162

摘要： A system for resist recycling includes a supply tank for storing a resist, a supply line connecting the supply tank with a pump therein for transferring the resist, a nozzle connected to the supply line for dispensing a predetermined dosage of the resist, and a recycle tank for receiving the predetermined dosage of dummy resist dispensed by the nozzle. The dummy resist is dispensed to prevent crystallized resist at the nozzle. A recycle line is disposed between the recycle tank and the supply tank for recycling the resist received by the recycle tank to the supply tank. The system can further include a coating system working in cooperation with the resist recycling system. Other systems and methods are also provided.

摘要翻译： 抗蚀剂回收系统包括用于储存抗蚀剂的供应罐，将供应罐与其中的泵连接用于传送抗蚀剂的供应管线，连接到用于分配预定剂量的抗蚀剂的供应管线的喷嘴和再循环罐 用于接收由喷嘴分配的预定剂量的假抗蚀剂。 分配假抗蚀剂以防止喷嘴处的结晶抗蚀剂。 再循环管线设置在再循环罐和供水箱之间，用于将由循环罐接收的抗蚀剂再循环到供应罐。 该系统还可以包括与抗蚀剂再循环系统配合工作的涂层系统。 还提供了其他系统和方法。

公开(公告)号：US07789576B2

公开(公告)日：2010-09-07

申请号：US11740129

申请日：2007-04-25

申请人： Feng-Ning Lee ,  Yung-Cheng Chen ,  Yao-Hwan Kao ,  Li-Jen Ko ,  Chin-Hsiang Lin

发明人： Feng-Ning Lee ,  Yung-Cheng Chen ,  Yao-Hwan Kao ,  Li-Jen Ko ,  Chin-Hsiang Lin

IPC分类号： G03D5/00 ,  G03B27/32 ,  G03F1/00

CPC分类号： G03F7/70991 ,  H01L21/67225 ,  H01L21/67748

摘要： The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed for post exposure baking (PEB); and a control module designed to control the exposure module and the baking module.

摘要翻译： 本公开提供一种光刻设备。 该装置包括设计用于曝光处理的曝光模块; 嵌入曝光模块中的烘烤模块，用于后曝光烘烤（PEB）; 以及设计用于控制曝光模块和烘焙模块的控制模块。

公开(公告)号：US20050229976A1

公开(公告)日：2005-10-20

申请号：US10826054

申请日：2004-04-16

申请人： Yao-Hwan Kao ,  Huei-Yi Chang

发明人： Yao-Hwan Kao ,  Huei-Yi Chang

IPC分类号： F16K31/365 ,  G05D7/01 ,  G05D16/06

CPC分类号： G05D7/0113 ,  G05D16/0663 ,  Y10T137/7788

摘要： In the manufacture of semiconductor devices, a system and method for delivering gas at a predetermined rate of flow is disclosed, which includes: a flow controller having a diaphragm forming upstream and downstream chambers; a regulator for delivering gas to the upstream chamber of the flow controller at a substantially constant pressure, the controller having an outlet from the downstream chamber which is opened and closed by the diaphragm; an urging means for urging the diaphragm toward its closed position; and a valve for selectively adjusting the spring force to achieve the predetermined rate of flow without having to use a gas flow measurement device to monitor the flow rate.

摘要翻译： 在半导体装置的制造中，公开了一种以预定流量传送气体的系统和方法，其包括：具有形成上游和下游室的隔膜的流量控制器; 用于以基本上恒定的压力将气体输送到流量控制器的上游室的调节器，所述控制器具有来自下游室的出口，所述出口由隔膜打开和关闭; 用于将隔膜推向其关闭位置的推动装置; 以及用于选择性地调节弹簧力以实现预定流量的阀，而不必使用气体流量测量装置来监测流量。

公开(公告)号：US06927363B1

公开(公告)日：2005-08-09

申请号：US10197048

申请日：2002-07-17

申请人： Yao-Hwan Kao ,  Hsun-Peng Lin ,  Wen-Hwo Liu ,  Yuan-Ting Huang

发明人： Yao-Hwan Kao ,  Hsun-Peng Lin ,  Wen-Hwo Liu ,  Yuan-Ting Huang

IPC分类号： F27B5/14 ,  F27B17/00 ,  H01L21/00

CPC分类号： H01L21/67017 ,  F27B17/0025

摘要： An exhaust apparatus for evacuating vapor during baking of liquid chemicals deposited on substrates including a heating chamber containing a hot plate for horizontally supporting and heating a substrate. A cover plate is suspended horizontally over the hot plate; the cover plate has a plurality of exhaust ports extending from the top to its bottom surfaces. The ports are radially and evenly disposed midway between the periphery and a centered port with a manifold mounted to the top of the cover plate. The manifold has tubular conduits connected underneath to each exhaust port. Each conduit has an adjustable damper disposed at its front opening for regulating the vapor being exhausted. The tubular conduits converge from each exhaust port towards a common enclosure with an exhaust pipe coupled to its top for exhausting vapor to an external recovery facility.

摘要翻译： 一种排气装置，用于在沉积在基板上的液体化学品的烘烤过程中排出蒸汽，该排气装置包括一个含有用于水平支撑和加热基板的热板的加热室。 盖板水平悬挂在热板上; 盖板具有从顶部延伸到其底表面的多个排气口。 端口径向均匀地设置在周边和中心端口之间的中间，并具有安装到盖板顶部的歧管。 歧管具有连接到每个排气口下方的管状导管。 每个管道具有设置在其前开口处的可调节阻尼器，用于调节被排出的蒸汽。 管状导管从每个排气口朝向共同的外壳会聚，排气管与顶部连接，以将蒸气排放到外部回收设施。