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13 条记录 (耗时 0.022 秒)

    Adjustable exhaust flow for thermal uniformity
    1.
    发明申请
    Adjustable exhaust flow for thermal uniformity 失效
    可调排气流量，以保持热均匀性

    公开(公告)号：US20050211695A1

    公开(公告)日：2005-09-29

    申请号：US10810978

    申请日：2004-03-26

    申请人： Yao-Hwan Kao ,  Jia-Sheng Lee ,  De-Yuan Lu ,  Ming-Fa Chen

    发明人： Yao-Hwan Kao ,  Jia-Sheng Lee ,  De-Yuan Lu ,  Ming-Fa Chen

    IPC分类号： F27B17/00 ,  F27D11/00 ,  F27D19/00 ,  H01L21/00

    CPC分类号： H01L21/67017 ,  F27B17/0025 ,  F27D19/00 ,  H01L21/67109

    摘要： A method and apparatus for adjusting exhaust flow, and the apparatus has a programmable exhaust control regulator generating a first input signal to a motor control circuit, an exhaust flow meter generating a second input signal to the motor control circuit and a motor driven control valve moved to different positions according to the first and second input signals, the control valve being installed in an exhaust portion of the hot plate apparatus.

    摘要翻译： 一种用于调节排气流量的方法和装置，并且该装置具有可编程排气控制调节器，其产生到马达控制电路的第一输入信号，产生到马达控制电路的第二输入信号的排气流量计和马达驱动的控制阀移动 根据第一和第二输入信号到不同的位置，控制阀安装在热板装置的排气部分中。

    Adjustable exhaust flow for thermal uniformity
    2.
    发明授权
    Adjustable exhaust flow for thermal uniformity 失效
    可调排气流量，以保持热均匀性

    公开(公告)号：US07026580B2

    公开(公告)日：2006-04-11

    申请号：US10810978

    申请日：2004-03-26

    申请人： Yao-Hwan Kao ,  Jia-Sheng Lee ,  De-Yuan Lu ,  Ming-Fa Chen

    发明人： Yao-Hwan Kao ,  Jia-Sheng Lee ,  De-Yuan Lu ,  Ming-Fa Chen

    IPC分类号： F27B5/14

    CPC分类号： H01L21/67017 ,  F27B17/0025 ,  F27D19/00 ,  H01L21/67109

    摘要： A method and apparatus for adjusting exhaust flow, and the apparatus has a programmable exhaust control regulator generating a first input signal to a motor control circuit, an exhaust flow meter generating a second input signal to the motor control circuit and a motor driven control valve moved to different positions according to the first and second input signals, the control valve being installed in an exhaust portion of the hot plate apparatus.

    摘要翻译： 一种用于调节排气流量的方法和装置，并且该装置具有可编程排气控制调节器，其产生到马达控制电路的第一输入信号，产生到马达控制电路的第二输入信号的排气流量计和马达驱动的控制阀移动 根据第一和第二输入信号到不同的位置，控制阀安装在热板装置的排气部分中。

    Controlled multi-nozzle liquid dispensing system
    3.
    发明授权
    Controlled multi-nozzle liquid dispensing system 失效
    可控多喷嘴液体分配系统

    公开(公告)号：US5857590A

    公开(公告)日：1999-01-12

    申请号：US826717

    申请日：1997-04-07

    申请人： Yao-Hwan Kao ,  Chi-Ren Hsieh

    发明人： Yao-Hwan Kao ,  Chi-Ren Hsieh

    IPC分类号： B05B9/03 ,  B05B12/04 ,  G01F11/28 ,  G01F11/00

    CPC分类号： G01F11/28 ,  B05B12/04 ,  B05B9/035

    摘要： A flow system that is suitable for controlled dispensing of liquids such as anti-reflection coatings is described. The system is driven by a gas at high pressure from a single dispensing bottle. On emerging from the dispensing bottle the fluid is directed into one of two branches, each such branch being terminated by its own nozzle. By inserting a needle valve in each branch of the flow system, between the branch point and the nozzle, control of the amount of liquid dispensed by each nozzle is separately achieved and a change in flow through one nozzle does not affect the flow through the other nozzle.

    摘要翻译： 描述了适于液体控制分配的流动系统，例如防反射涂层。 该系统由来自单个分配瓶的高压气体驱动。 在从分配瓶出来时，流体被引导到两个分支中的一个，每个这样的分支由其自己的喷嘴端接。 通过在流动系统的每个分支中插入针阀，在分支点和喷嘴之间，分别实现了每个喷嘴分配的液体量的控制，并且通过一个喷嘴的流量变化不影响通过另一个喷嘴的流量 喷嘴。

    System and Method for Replacing Resist Filter to Reduce Resist Filter-Induced Wafer Defects
    4.
    发明申请
    System and Method for Replacing Resist Filter to Reduce Resist Filter-Induced Wafer Defects 有权
    用于替代抗蚀剂过滤器的系统和方法，以减少抵抗过滤器引起的晶片缺陷

    公开(公告)号：US20080230492A1

    公开(公告)日：2008-09-25

    申请号：US11688530

    申请日：2007-03-20

    申请人： Yao-Hwan Kao ,  Po-Chang Huang

    发明人： Yao-Hwan Kao ,  Po-Chang Huang

    IPC分类号： B01D35/157

    CPC分类号： B01D35/02 ,  G03F7/162 ,  G03F7/3092

    摘要： System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.

    摘要翻译： 描述了以减少滤波器引起的晶片缺陷的方式替换抗蚀剂滤光器的系统和方法。 在一个实施例中，系统包括连接到分配器的过滤系统，该过滤系统包括过滤器; 以及连接到过滤器的开关，用于将过滤系统选择性地连接到第一化学溶液和第二化学溶液中的一种。

    Rinse nozzle and method
    5.
    发明申请
    Rinse nozzle and method 审中-公开
    冲洗喷嘴和方法

    公开(公告)号：US20050211267A1

    公开(公告)日：2005-09-29

    申请号：US10810384

    申请日：2004-03-26

    申请人： Yao-Hwan Kao ,  Po-Chang Huang ,  Ming-Yeon Hung ,  Chi-Che Huang

    发明人： Yao-Hwan Kao ,  Po-Chang Huang ,  Ming-Yeon Hung ,  Chi-Che Huang

    IPC分类号： B08B3/02 ,  C23G1/00 ,  F26B3/02 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306

    CPC分类号： H01L21/02052 ,  B08B3/02 ,  H01L21/67028 ,  H01L21/67051

    摘要： A method and apparatus for rinsing and drying a substrate (100) of a semiconductor wafer (102), has a first nozzle (110) dispensing rinsing fluid against the substrate (100); and a second nozzle (114) dispensing dry gas under pressure against the substrate (100) during a drying cycle to dry the substrate (100) completely. The second nozzle (114) can point to the substrate (100) while the substrate (100) spins. The nozzles (110) and (114) can be positioned by a robot arm (112).

    摘要翻译： 一种用于冲洗和干燥半导体晶片（102）的衬底（100）的方法和装置，具有将冲洗流体分配到衬底（100）上的第一喷嘴（110）; 以及第二喷嘴（114），其在干燥循环期间将干燥气体在压力下分配到所述基板（100）以完全干燥所述基板（100）。 当衬底（100）旋转时，第二喷嘴（114）可指向衬底（100）。 喷嘴（110）和（114）可以由机器人臂（112）定位。

    System and method for replacing resist filter to reduce resist filter-induced wafer defects
    6.
    发明授权
    System and method for replacing resist filter to reduce resist filter-induced wafer defects 有权
    用于替代抗蚀剂滤光片的系统和方法，以减少抗蚀剂过滤器引起的晶片缺陷

    公开(公告)号：US08580117B2

    公开(公告)日：2013-11-12

    申请号：US11688530

    申请日：2007-03-20

    申请人： Yao-Hwan Kao ,  Po-Chang Huang

    发明人： Yao-Hwan Kao ,  Po-Chang Huang

    IPC分类号： B01D29/96 ,  B01D35/157

    CPC分类号： B01D35/02 ,  G03F7/162 ,  G03F7/3092

    摘要： System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.

    摘要翻译： 描述了以减少滤波器引起的晶片缺陷的方式替换抗蚀剂滤光器的系统和方法。 在一个实施例中，系统包括连接到分配器的过滤系统，该过滤系统包括过滤器; 以及连接到过滤器的开关，用于将过滤系统选择性地连接到第一化学溶液和第二化学溶液中的一种。

    Resist supply apparatus with resist recycling function, coating system having the same and method of resist recycling
    8.
    发明申请
    Resist supply apparatus with resist recycling function, coating system having the same and method of resist recycling 审中-公开
    具有抗蚀剂回收功能的抗蚀剂供给装置，具有相同的涂布体系和抗蚀剂回收方法

    公开(公告)号：US20050048208A1

    公开(公告)日：2005-03-03

    申请号：US10653298

    申请日：2003-09-02

    申请人： Yao-Hwan Kao ,  Ko-Bin Kao

    发明人： Yao-Hwan Kao ,  Ko-Bin Kao

    IPC分类号： B05C5/00 ,  B05C11/00 ,  B05D3/12 ,  G03F7/16

    CPC分类号： G03F7/162

    摘要： A system for resist recycling includes a supply tank for storing a resist, a supply line connecting the supply tank with a pump therein for transferring the resist, a nozzle connected to the supply line for dispensing a predetermined dosage of the resist, and a recycle tank for receiving the predetermined dosage of dummy resist dispensed by the nozzle. The dummy resist is dispensed to prevent crystallized resist at the nozzle. A recycle line is disposed between the recycle tank and the supply tank for recycling the resist received by the recycle tank to the supply tank. The system can further include a coating system working in cooperation with the resist recycling system. Other systems and methods are also provided.

    摘要翻译： 抗蚀剂回收系统包括用于储存抗蚀剂的供应罐，将供应罐与其中的泵连接用于传送抗蚀剂的供应管线，连接到用于分配预定剂量的抗蚀剂的供应管线的喷嘴和再循环罐 用于接收由喷嘴分配的预定剂量的假抗蚀剂。 分配假抗蚀剂以防止喷嘴处的结晶抗蚀剂。 再循环管线设置在再循环罐和供水箱之间，用于将由循环罐接收的抗蚀剂再循环到供应罐。 该系统还可以包括与抗蚀剂再循环系统配合工作的涂层系统。 还提供了其他系统和方法。

    Spin-coater with self-cleaning cup and method of using
    9.
    发明授权
    Spin-coater with self-cleaning cup and method of using 失效
    带自清洁杯的旋涂机及使用方法

    公开(公告)号：US06723168B2

    公开(公告)日：2004-04-20

    申请号：US09885715

    申请日：2001-06-20

    申请人： Yao-Hwan Kao ,  Yi-Chuan Lo

    发明人： Yao-Hwan Kao ,  Yi-Chuan Lo

    IPC分类号： B05C500

    CPC分类号： H01L21/6715 ,  G03F7/162

    摘要： A spin-coater for coating a liquid material on a wafer that is equipped with a self-cleaning coating cup and a method for self-cleaning a spin-coater are described. The spin-coater is constructed of a coating cup of circular shape, a wafer pedestal situated in the cup, a coating material dispensing nozzle over the pedestal, a motor means for rotating the pedestal, and a solvent dispensing means that is mounted juxtaposed to an upper rim of the sidewall of the cup for dispensing a cleaning solvent onto an interior surface of the sidewall to dissolve and rinse off any liquid coating material splattered thereon and to prevent the formation of solid contamination from the solidified coating material.

    摘要翻译： 描述了用于在配备有自清洁涂层杯的晶片上涂覆液体材料的旋涂机和自清洁旋转涂布机的方法。 旋转涂布机由圆形的涂层杯，位于杯中的晶片基座，基座上的涂料分配喷嘴，用于旋转基座的马达装置，以及溶解剂分配装置构成，其与 杯的侧壁的上边缘，用于将清洁溶剂分配到侧壁的内表面上，以溶解和冲洗喷溅在其上的任何液体涂料并防止固化的涂层材料形成固体污染物。