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    Method of producing cured coating films
    91.
    发明授权
    Method of producing cured coating films 有权
    生产固化涂膜的方法

    公开(公告)号：US06344244B1

    公开(公告)日：2002-02-05

    申请号：US09433547

    申请日：1999-11-04

    Applicant: Wolfgang Schrof ,  Reinhold Schwalm ,  Erich Beck ,  Uwe Meisenburg

    Inventor： Wolfgang Schrof ,  Reinhold Schwalm ,  Erich Beck ,  Uwe Meisenburg

    IPC: C08F248

    CPC classification number: B05D3/061

    Abstract: The present invention relates to a method of producing at cast one coating film on at least one area of a substrate surface, which comprises at least the following steps in the following order: a) initiating at least one crosslinking reaction in at least one reactive coating formulation; b) applying said at least one reactive coating formulation before the onset of said at least one crosslinking reaction on said at least one area of said substrate surface. The present invention additionally relates to a corresponding means of producing at least one coating film on at least one area of a substrate surface, having at least the following elements: a) at least one storage container for at least one reactive coating formulation, b) at least one exposure unit, preferably a UV exposure unit, more preferably a UV laser, and c) at least one application unit having a nozzle, in particular a spraying head, and/or d) a bell for electrostatic application (ESTA bell), wherein said at least one exposure unit is designed so that the radiation generated in said at least one exposure unit is brought into contact with said at least one reactive coating formulation in said at least one application unit. Also claimed, finally, is a coating film which can be produced by the method of the invention.

    Abstract translation: 本发明涉及一种在基材表面的至少一个区域上生产浇铸的一个涂膜的方法，该方法至少包括以下顺序的以下步骤：a）在至少一种反应性涂料中引发至少一种交联反应 制剂; b）在所述至少一个交联反应开始之前，在所述基材表面的所述至少一个区域上施用所述至少一种反应性涂料制剂。 本发明还涉及在衬底表面的至少一个区域上产生至少一个涂膜的相应方法，其至少具有以下元素：a）至少一个用于至少一种反应性涂料配方的储存容器，b） 至少一个曝光单元，优选UV曝光单元，更优选UV激光，以及c）至少一个具有喷嘴，特别是喷头的应用单元和/或用于静电应用的钟（ESTA钟）），其中 所述至少一个曝光单元被设计成使得在所述至少一个曝光单元中产生的辐射与所述至少一个应用单元中的所述至少一个反应性涂料配方接触。 最后还要求的是可以通过本发明的方法生产的涂膜。

    Positive-working radiation-sensitive mixture and production of relief structures
    92.
    发明授权
    Positive-working radiation-sensitive mixture and production of relief structures 失效
    积极工作的辐射敏感混合物和浮雕结构的生产

    公开(公告)号：US5846689A

    公开(公告)日：1998-12-08

    申请号：US708818

    申请日：1996-09-09

    Applicant: Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    Inventor： Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC classification number: G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    Abstract: A positive-working radiation-sensitive mixture essentially consists of (a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid, (b) at least one organic compound which produces an acid under the action of actinic radiation and (c) at least one further organic compound differing from (b), where the polymer (a) contains incorporated units of the formulae (I), (II) and (III) ##STR1## and the organic compound (b) is a sulfonium salt of the formula (IV) ##STR2## The radiation-sensitive mixture is suitable for the production of relief structures having improved contrast.

    Abstract translation: 正面工作的辐射敏感混合物基本上由（a）至少一种含有酸不稳定基团并且不溶于水但由于酸的作用而变得可溶于碱性水溶液的聚合物，（b）至少 一种在光化辐射作用下产生酸的有机化合物和（c）至少一种与（b）不同的另外的有机化合物，其中聚合物（a）含有式（I），（II）和（ III）和有机化合物（b）是式（IV）的锍盐。（IV）辐射敏感性混合物适用于生产具有改善的对比度的浮雕结构。

    Positive-working radiation-sensitive mixture
    93.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号：US5783354A

    公开(公告)日：1998-07-21

    申请号：US711016

    申请日：1996-09-09

    Applicant: Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    Inventor： Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC classification number: G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

    Abstract: A positive-working radiation-sensitive mixture essentially consists of (a.sub.1) at least one water-insoluble, organic polymeric binder which contains acid-labile groups and becomes soluble in aqueous alkaline solutions as a result of the action of acid, or (a.sub.2.1) a polymeric binder which is insoluble in water and soluble in aqueous alkaline solutions and (a.sub.2.2) a low molecular weight organic compound whose solubility and aqueous alkaline developer is increased as a result of the action of acid, and (b) at least one organic compound which produces an acid under the action of actinic radiation, and, if required, (c) one or more further organic compounds which differ from (b), at least one of the components (a.sub.1), (a.sub.2.1), (a.sub.2.2), (b) and (c) containing a bonded group of the general formula (I) --O.sup..crclbar. N.sup..sym. R.sub.4, or component (c) being of the formula (II) ##STR1## The radiation-sensitive mixture is suitable for the production of relief structures.

    Abstract translation: 正面工作的辐射敏感混合物基本上由（a1）至少一种含有酸不稳定基团的水不溶性有机聚合物粘合剂组成，并且由于酸的作用而变得可溶于碱性水溶液，或（a2）。 1）聚合物粘合剂，其不溶于水并且可溶于碱性水溶液，和（a2.2）由于酸的作用，其溶解度和含水碱性显影剂增加的低分子量有机化合物，和（b）在 至少一种在光化辐射的作用下产生酸的有机化合物，如果需要，（c）一种或多种与（b），至少一种组分（a1），（a2.1）不同的其它有机化合物 ）（a）-O（ - ）N（+）R 4，或（c）成分为式（II）的键合基团的化合物（a2.2），（b）和（c） （II）辐射敏感混合物适用于浮雕结构的生产。

    Radiation-curable acrylates with built-in photoinitiators
    94.
    发明授权
    Radiation-curable acrylates with built-in photoinitiators 失效
    具有内置光引发剂的可辐射固化的丙烯酸酯

    公开(公告)号：US5741829A

    公开(公告)日：1998-04-21

    申请号：US674832

    申请日：1996-07-03

    Applicant: Wolfgang Reich ,  Erich Beck ,  Ulrich Jager ,  Reinhold Schwalm

    Inventor： Wolfgang Reich ,  Erich Beck ,  Ulrich Jager ,  Reinhold Schwalm

    IPC: C07C68/02 ,  C07C69/96 ,  C08F2/48 ,  C08F2/50 ,  C08F20/26 ,  C08F20/28 ,  C08G00/00 ,  C08F18/24

    CPC classification number: C07C69/96 ,  Y10S522/905

    Abstract: Radiation-curable (meth)acrylates obtainable by reacting compounds of the formula ##STR1## in which R is C.sub.1 -C.sub.4 -alkyl, aryl or R.sup.1 and R.sup.1 is ##STR2## in which R.sup.2 to R.sup.6 independently of one another are H, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy, OH, phenyl, SH, SCH.sub.3, SC.sub.2 H.sub.5, F, Cl, Br, CN, COOH, COO--(C.sub.1 -C.sub.17 -alkyl), COO--(C.sub.5 -C.sub.10 -aryl), CF.sub.3, N(alkyl).sub.2, N(alkyl)(aryl), N(aryl).sub.2, N.sup..sym. (alkyl).sub.3 A.sup..crclbar., N.sup..sym. H(alkyl).sub.2 A.sup..crclbar., A.sup..crclbar. is the anion of an acid, and alkyl or aryl, unless indicated otherwise, is C.sub.1 -C.sub.10 -alkyl or C.sub.5 -C.sub.10 -aryl, respectively, and at least one but not more than 3 of R.sup.2 to R.sup.6 are ##STR3## with hydroxy(meth)acrylates containing at least 1 free hydroxyl group and at least 2 (meth)acrylic groups in the molecule.

    Abstract translation: 其中R为C 1 -C 4 - 烷基，芳基或R 1和R 1的式Ⅰ'化合物是其中R 2至R 6彼此独立地为H的可辐射固化（甲基）丙烯酸酯， C 1 -C 4烷基，C 1 -C 4 - 烷氧基，OH，苯基，SH，SCH 3，SC 2 H 5，F，Cl，Br，CN，COOH，COO-（C 1 -C 17 - 烷基） ），CF 3，N（烷基）2，N（烷基）（芳基），N（芳基）2，N（+）（烷基）3A（ - ），N（+）H （ - ）是酸的阴离子，除非另有说明，烷基或芳基分别为C 1 -C 10 - 烷基或C 5 -C 10 - 芳基，并且至少一个但不多于3个R 2至R 6为

    Positive-working radiation-sensitive mixture and the production of relief patterns
    95.
    发明授权
    Positive-working radiation-sensitive mixture and the production of relief patterns 失效
    正面工作的辐射敏感混合物和浮雕图案的制作

    公开(公告)号：US5563022A

    公开(公告)日：1996-10-08

    申请号：US968408

    申请日：1992-10-29

    Applicant: Horst Binder ,  Reinhold Schwalm ,  Dirk Funhoff

    Inventor： Horst Binder ,  Reinhold Schwalm ,  Dirk Funhoff

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/492 ,  G03F7/30 ,  G03F7/38

    CPC classification number: G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122

    Abstract: A positive-working UV-sensitive mixture containing(a1) an organic binder containing acid-labile ether, ester or carbonate groups or(a2) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, or(a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a group which forms an acid under the action of radiation, or a mixture of the organic compounds (a2.1) and (a2.2) and(b) an arylsulfonic ester, is suitable for the production of relief patterns.

    Abstract translation: 含有（a1）含酸不稳定醚，酯或碳酸酯基团的有机粘合剂或（a2）不溶于水但可溶于碱性水溶液的聚合物粘合剂的正性UV敏感性混合物，（a2.1） 在水性碱性显影剂中的溶解度由酸的作用而增加的有机化合物，或（a2.2）其在碱性显影液中的溶解度在酸的作用下增加并且含有一种或多种酸 - 可裂解基团，另外还有在辐射作用下形成酸的基团，或有机化合物（a2.1）和（a2.2）和（b）芳基磺酸酯的混合物，适于生产浮雕 模式。

    Sulfonium salts and use thereof
    97.
    发明授权
    Sulfonium salts and use thereof 失效
    锍盐及其用途

    公开(公告)号：US5220037A

    公开(公告)日：1993-06-15

    申请号：US825752

    申请日：1992-01-27

    Applicant: Reinhold Schwalm ,  Andreas Boettcher

    Inventor： Reinhold Schwalm ,  Andreas Boettcher

    IPC: C07C381/12 ,  G03F7/029

    CPC classification number: C07C381/12 ,  G03F7/029

    Abstract: Novel sulfonium salts useful as photoinitiators for cationic polymerization and for producing relief patterns and relief images have the general formula (I) ##STR1## where A.sup..crclbar. is a non-nucleophilic counterion,x is 1, 2 or 3,R is a hydrocarbon radicalR' is arylene or substituted arylene, andR" is ##STR2## where R.sup.1, R.sup.2 and R.sup.3 are each alkyl or monohalogenated or polyhalogenated alkyl orR.sup.1 and R.sup.2 are each hydrogen or alkyl, and R.sup.3 is phenyl, alkenyl or cycloalkenyl, orR.sup.1 is hydrogen, and R.sup.2 and R.sup.3 form ethylenically unsaturated ring, orR.sup.1 and R.sup.2 are each hydrogen, alkyl, cycloalkyl or aryl, and R.sup.3 is alkoxy orR.sup.1 is hydrogen or alkyl and R.sup.2 and R.sup.3 are each alkoxy, aryloxy or substituted aryloxy.

    Abstract translation: 用作阳离子聚合和产生浮雕图案和浮雕图像的光引发剂的新型锍​​盐具有通式（I）其中A（ - ）是非亲核抗衡离子，x为1,2或3， R是烃基，R'是亚芳基或取代的亚芳基，R“是其中R 1，R 2和R 3各自是烷基或单卤代或多卤代烷基或R 1和R 2各自是氢或烷基，R 3是苯基， 烯基或环烯基，或R 1为氢，R 2和R 3为烯键式不饱和环，或者R 1和R 2各自为氢，烷基，环烷基或芳基，R 3为烷氧基或R 1为氢或烷基，R 2和R 3为烷氧基， 芳氧基或取代的芳氧基。

    Photosensitive recording material of enhanced flexibility
    98.
    发明授权
    Photosensitive recording material of enhanced flexibility 失效
    增强灵敏度的感光记录材料

    公开(公告)号：US5061602A

    公开(公告)日：1991-10-29

    申请号：US384909

    申请日：1989-07-25

    Applicant: Horst Koch ,  Hans Schupp ,  Reinhold Schwalm

    Inventor： Horst Koch ,  Hans Schupp ,  Reinhold Schwalm

    IPC: G03F7/032 ,  G03F7/033

    CPC classification number: G03F7/033 ,  Y10S430/108 ,  Y10S430/11 ,  Y10S430/111

    Abstract: In a photosensitive recording material suitable for producing plates or resist patterns, the photopolymerizable recording layer contains as polymeric binder a film-forming copolymer which has a multiphase morphology, one phase having a glass transistion temperature below room temperature and a further phase having a glass transition temperature above room temperature and this copolymer having been obtained by free radical copolymerization of one or more macromers with one or more further olefinically unsaturated copolymerizable organic compounds.

    Abstract translation: 在适于制造板或抗蚀剂图案的光敏记录材料中，可光聚合记录层含有作为聚合物粘合剂的成膜共聚物，其具有多相形态，一相玻璃化转变温度低于室温，另一相具有玻璃化转变 该共聚物是通过一种或多种大分子单体与一种或多种其它烯属不饱和可共聚合的有机化合物的自由基共聚获得的。

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