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    Radiation-sensitive mixture containing acid-labile groups and production of relief patterns
    3.
    发明授权
    Radiation-sensitive mixture containing acid-labile groups and production of relief patterns 失效
    含有酸不稳定组的辐射敏感混合物和浮雕图案的生成

    公开(公告)号：US5318876A

    公开(公告)日：1994-06-07

    申请号：US862949

    申请日：1992-04-03

    Applicant: Reinhold Schwalm ,  Horst Binder ,  Dirk Funhoff

    Inventor： Reinhold Schwalm ,  Horst Binder ,  Dirk Funhoff

    IPC: C08K5/42 ,  C08K5/51 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03G1/73 ,  G03G5/56

    CPC classification number: G03F7/0045 ,  Y10S430/115 ,  Y10S430/122

    Abstract: A radiation-sensitive mixture which contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more groups cleavable by an acid and in addition a group which forms a strong acid under the action of radiation, and additionally(c) an alkyl- or arylsulfonate of a hydroxyaromatic, is suitable for the production of relief patterns.

    Abstract translation: 一种辐射敏感性混合物，其包含（a）不溶于水但可溶于碱性水溶液的聚合物粘合剂，和（b）通过酸的作用使其在碱性显影剂中的溶解度增加的有机化合物，并含有一种 或更多的基团，并且另外在辐射作用下形成强酸的基团，另外（c）羟基芳族化合物的烷基或芳基磺酸盐适用于产生浮雕图案。

    Work-up of the mother liquor obtained in the preparation of high-purity triethylenediamine
    6.
    发明授权
    Work-up of the mother liquor obtained in the preparation of high-purity triethylenediamine 有权
    在制备高纯三乙二胺时得到的母液的处理

    公开(公告)号：US07345173B2

    公开(公告)日：2008-03-18

    申请号：US10138337

    申请日：2002-05-06

    Applicant: Ortmund Lang ,  Bernd Rumpf ,  Matthias Frauenkron ,  Dirk Funhoff ,  Thomas Manderbach ,  Bernd Stein

    Inventor： Ortmund Lang ,  Bernd Rumpf ,  Matthias Frauenkron ,  Dirk Funhoff ,  Thomas Manderbach ,  Bernd Stein

    IPC: C07D487/00

    CPC classification number: C07D487/08

    Abstract: In a process for the purification of triethylenediamine (TEDA) in which TEDA is vaporized and the gaseous TEDA is passed into a liquid solvent and is subsequently crystallized from this, the mother liquor obtained after the TEDA has been crystallized is extracted with an extractant which is immiscible or only slightly miscible with the solvent of the mother liquor and in which TEDA is readily soluble, and the TEDA-depleted mother liquor obtained after extraction and/or the TEDA-enriched extractant which has been used for the extraction are/is returned to the process.

    Abstract translation: 在其中TEDA蒸发并将气态TEDA进入液体溶剂并随后从其中结晶的三亚乙基二胺（TEDA）的纯化方法中，在TEDA结晶后获得的母液用萃取剂萃取，萃取剂为 不混溶或仅与母液的溶剂轻微混溶，其中TEDA易溶，并且在萃取后获得的TEDA贫化母液和/或用于萃取的富含TEDA的萃取剂返回至 的过程。

    Radiation-sensitive mixture
    8.
    发明授权
    Radiation-sensitive mixture 失效
    辐射敏感混合物

    公开(公告)号：US5759750A

    公开(公告)日：1998-06-02

    申请号：US839938

    申请日：1997-04-18

    Applicant: Horst Binder ,  Reinhold Schwalm ,  Dirk Funhoff

    Inventor： Horst Binder ,  Reinhold Schwalm ,  Dirk Funhoff

    IPC: G03F7/004 ,  C08L61/10 ,  G03F7/039 ,  H01L21/027 ,  G03F7/30 ,  G03F7/40

    CPC classification number: G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/115 ,  Y10S430/122

    Abstract: A radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture and (b) a compound which forms a strong acid on exposure to radiation, component (a) being a phenolic resin in which some or all of the phenolic hydroxyl groups have been replaced with groups (IA) or (IB) ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each alkyl or R.sup.1 together with R.sup.2 forms a ring and X is CH.sub.2, O, S, SO.sub.2 or NR.sup.4, is suitable for the production of relief structures.

    Abstract translation: 辐射敏感性混合物，主要由（a）水不溶性粘合剂或粘合剂混合物组成，和（b）在暴露于辐射时形成强酸的化合物，组分（a）是酚醛树脂，其中部分或全部 酚羟基已被基团（IA）或（IB）替代，其中R 1，R 2和R 3各自为烷基或R 1与R 2一起形成环，X为CH 2，O ，S，SO2或NR4，适用于生产浮雕结构。

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