公开(公告)号：US20090141269A1

公开(公告)日：2009-06-04

申请号：US12366956

申请日：2009-02-06

Applicant: Sachio UTO ,  Hiroyuki NAKANO ,  Yukihiro SHIBATA ,  Akira HAMAMATSU ,  Yuta URANO

Inventor： Sachio UTO ,  Hiroyuki NAKANO ,  Yukihiro SHIBATA ,  Akira HAMAMATSU ,  Yuta URANO

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

Abstract: An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.

Abstract translation: 检查系统包括：使用具有不同波长的宽带照明光和单波长光的设备，在具有透明膜的表面上的多个照明中对被检查对象进行暗场照明 多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。 因此，能够稳定地检测出更微细的缺陷。

公开(公告)号：US07492452B2

公开(公告)日：2009-02-17

申请号：US11626925

申请日：2007-01-25

Applicant: Sachio Uto ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

Inventor： Sachio Uto ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

IPC: G01N21/00 ,  G01N21/88 ,  H01L27/00

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

Abstract: An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.

Abstract translation: 检查系统包括：使用具有不同波长的宽带照明光和单波长光的设备，在具有透明膜的表面上的多个照明中对被检查对象进行暗场照明 多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。 因此，能够稳定地检测出更微细的缺陷。

公开(公告)号：US07465935B2

公开(公告)日：2008-12-16

申请号：US11325550

申请日：2006-01-05

Applicant: Yuta Urano ,  Hiroyuki Nakano ,  Shunji Maeda ,  Sachio Uto

Inventor： Yuta Urano ,  Hiroyuki Nakano ,  Shunji Maeda ,  Sachio Uto

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

Abstract: When using a CCD sensor as a photo-detector in a device for inspecting foreign matters and defects, it has a problem of causing electric noise while converting the signal charge, produced inside by photoelectric conversion, into voltage and reading it. Therefore, the weak detected signal obtained by detecting reflected and scattered light from small foreign matters and defects is buried in the electric noise, which has been an obstacle in detecting small foreign matters and defects. In order to solve the above problem, according to the present invention, an electron multiplying CCD sensor is used as a photo-detector. The electron multiplying CCD sensor is capable of enlarging signals brought about by inputted light relatively to the electric noise by multiplying the electrons produced through photoelectric conversion and reading them. Accordingly, compared to a conventional CCD sensor, it can detect weaker light and, therefore, smaller foreign matters and defects.

Abstract translation: 当在用于检查异物和缺陷的装置中使用CCD传感器作为光检测器时，存在在将由光电转换产生的信号电荷转换成电压并读取的同时将电噪声引起的问题。 因此，通过检测来自小异物和缺陷的反射和散射光获得的弱检测信号被埋在电噪声中，这是检测小异物和缺陷的障碍。 为了解决上述问题，根据本发明，使用电子倍增CCD传感器作为光检测器。 电子倍增CCD传感器能够通过将通过光电转换产生的电子与其进行读取而相对于电噪声放大由输入光产生的信号。 因此，与常规CCD传感器相比，它可以检测较弱的光，因此可以检测较小的异物和缺陷。

公开(公告)号：US20080297783A1

公开(公告)日：2008-12-04

申请号：US12109363

申请日：2008-04-25

Applicant: Yuta URANO ,  Kaoru Sakai ,  Shunji Maeda

Inventor： Yuta URANO ,  Kaoru Sakai ,  Shunji Maeda

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8896

Abstract: In an inspection subject substrate, there is a problem that a defect signal is overlooked due to scattered light from a pattern and sensitivity decreases in an irregular circuit pattern part. The inventors propose a defect inspection method, characterized by comprising: an illumination step of guiding light emitted from a light source to a predetermined area on an inspection subject substrate under a plurality of predetermined optical conditions; a detection step of obtaining an electric signal by guiding scattered light components propagating in a predetermined range of azimuthal angle and in a predetermined range of elevation angle to a detector for each of a plurality of scattered light distributions occurred correspondingly to the plurality of optical conditions in the predetermined area; and a defect determination step of determining a defect based on the plurality of electric signals obtained in the detection step.

Abstract translation: 在检查对象衬底中，存在由于来自图案的散射光而忽略缺陷信号的问题，并且在不规则电路图形部分中灵敏度降低。 发明人提出了一种缺陷检查方法，其特征在于包括：在多个预定光学条件下将从光源发射的光引导到检查对象基板上的预定区域的照明步骤; 检测步骤，通过将对于多个散射光分布中的每一个散射光分布中的每一个引导到以预定的方位角范围传播的散射光分量和与预定的仰角范围相对应的检测器来获得电信号， 预定区域; 以及基于在所述检测步骤中获得的所述多个电信号来确定缺陷的缺陷确定步骤。

公开(公告)号：US20080144024A1

公开(公告)日：2008-06-19

申请号：US12029660

申请日：2008-02-12

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/88

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.

Abstract translation: 缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。 在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已经被定向的光束 作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。

公开(公告)号：US20070206184A1

公开(公告)日：2007-09-06

申请号：US11626925

申请日：2007-01-25

Applicant: Sachio Uto ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

Inventor： Sachio Uto ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

Abstract: An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.

Abstract translation: 检查系统包括：使用具有不同波长的宽带照明光和单波长光的设备，在具有透明膜的表面上的多个照明中对被检查对象进行暗场照明 多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。 因此，能够稳定地检测出更微细的缺陷。