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    Defect Inspection Method and System
    1.
    发明申请
    Defect Inspection Method and System 审中-公开
    缺陷检查方法和系统

    公开(公告)号：US20110075134A1

    公开(公告)日：2011-03-31

    申请号：US12964176

    申请日：2010-12-09

    申请人： Sachio UTO ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

    发明人： Sachio UTO ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

    摘要： An apparatus for inspecting a specimen includes a first illumination unit having a laser light source and a first optical component for illuminating a specimen on which patterns are formed with a laser from a first elevation angle direction, a second illuminating unit having a light source and a second optical component for illuminating the specimen from a second elevation angle direction which is greater than the first elevation angle, a first detection optical unit which detects light from the specimen illuminated by the first illumination unit, a second detection optical unit which detects light from the specimen illuminated by the second illumination unit, and a signal processing unit which processes signals output from the first detector to detect defects in a first area on the specimen and processes signals output from the second detector to detect defects in a second area on the specimen.

    摘要翻译： 一种用于检查试样的装置包括具有激光光源的第一照明单元和用于照射具有来自第一仰角方向的激光形成图案的样本的第一光学部件，具有光源的第二照明单元和 第二光学部件，用于从大于所述第一仰角的第二仰角方向照射所述试样;第一检测光学单元，其检测来自所述第一照明单元照射的样本的光;第二检测光学单元， 由第二照明单元照射的样本，以及信号处理单元，处理从第一检测器输出的信号，以检测样本上的第一区域中的缺陷，并处理从第二检测器输出的信号，以检测样本上的第二区域中的缺陷。

    Defect Inspection Method And System
    2.
    发明申请
    Defect Inspection Method And System 有权
    缺陷检查方法和系统

    公开(公告)号：US20090141269A1

    公开(公告)日：2009-06-04

    申请号：US12366956

    申请日：2009-02-06

    申请人： Sachio UTO ,  Hiroyuki NAKANO ,  Yukihiro SHIBATA ,  Akira HAMAMATSU ,  Yuta URANO

    发明人： Sachio UTO ,  Hiroyuki NAKANO ,  Yukihiro SHIBATA ,  Akira HAMAMATSU ,  Yuta URANO

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

    摘要： An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.

    摘要翻译： 检查系统包括：使用具有不同波长的宽带照明光和单波长光的设备，在具有透明膜的表面上的多个照明中对被检查对象进行暗场照明 多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。 因此，能够稳定地检测出更微细的缺陷。

    METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN
    3.
    发明申请
    METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN 有权
    检测样品中颗粒物的方法

    公开(公告)号：US20110228258A1

    公开(公告)日：2011-09-22

    申请号：US13118004

    申请日：2011-05-27

    申请人： Akira HAMAMATSU ,  Minori NOGUCHI ,  Yoshimasa OHSHIMA ,  Sachio UTO ,  Taketo UENO ,  Hiroyuki NAKANO ,  Takahiro JINGU ,  Hisashi HATANO ,  Yukihisa MOHARA ,  Seiji OTANI ,  Takahiro TOGASHI

    发明人： Akira HAMAMATSU ,  Minori NOGUCHI ,  Yoshimasa OHSHIMA ,  Sachio UTO ,  Taketo UENO ,  Hiroyuki NAKANO ,  Takahiro JINGU ,  Hisashi HATANO ,  Yukihisa MOHARA ,  Seiji OTANI ,  Takahiro TOGASHI

    IPC分类号： G01N21/88

    CPC分类号： G01N21/956

    摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

    摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

    METHOD AND APPARATUS FOR INSPECTING FOREIGN PARTICLE DEFECTS
    8.
    发明申请
    METHOD AND APPARATUS FOR INSPECTING FOREIGN PARTICLE DEFECTS 有权
    检查外来颗粒缺陷的方法和装置

    公开(公告)号：US20090079973A1

    公开(公告)日：2009-03-26

    申请号：US12273174

    申请日：2008-11-18

    申请人： Sachio UTO ,  Hiroyuki Nakano

    发明人： Sachio UTO ,  Hiroyuki Nakano

    IPC分类号： G01N21/00

    CPC分类号： G01N21/94 ,  G01N21/47 ,  G01N21/9501

    摘要： The invention relates to a device production process for forming a circuit pattern on a substrate such as semiconductor device. To enable a stable inspection of a minute foreign particle and a pattern defect occurring in manufacture of a device at a high speed and with a high sensitivity, an object to be inspected on which a transparent film is formed, is irradiated with a beam which is emitted from an illuminator whose illumination direction and illumination angle are selected from a plurality of choices to be optimum, so that scattered reflected light from a minute foreign particle defect on the object or the transparent film is effectively detected by eliminating a noise from the pattern formed on the object, and a detection optical system is optimized by evaluating and adjusting, with an image forming performance checker, an image forming performance of the detection optical system included in an inspecting apparatus.

    摘要翻译： 本发明涉及用于在诸如半导体器件的衬底上形成电路图案的器件制造工艺。 为了能够在高速，高灵敏度的装置的制造中能够稳定地检查微小的外来粒子和图案缺陷，对要形成透明膜的检查对象进行照射， 从照明方向和照明角度从多个选择中选择为最佳的发光体发射，从而通过从形成的图案中消除噪声来有效地检测来自物体或透明膜上的微小异物缺陷的散射反射光 并且通过利用图像形成性能检查器评估和调整包括在检查装置中的检测光学系统的图像形成性能来优化检测光学系统。

    APPARATUS AND METHOD FOR INSPECTING PATTERN
    9.
    发明申请
    APPARATUS AND METHOD FOR INSPECTING PATTERN 有权
    用于检查图案的装置和方法

    公开(公告)号：US20120176602A1

    公开(公告)日：2012-07-12

    申请号：US13423862

    申请日：2012-03-19

    申请人： Sachio UTO ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

    发明人： Sachio UTO ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

    IPC分类号： G01N21/88

    CPC分类号： G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/151 ,  G01N2021/95615 ,  G01N2201/06113 ,  G01N2201/1035

    摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

    摘要翻译： 用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。 紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

    METHOD AND APPARATUS FOR REVIEWING DEFECTS
    10.
    发明申请
    METHOD AND APPARATUS FOR REVIEWING DEFECTS 有权
    评估缺陷的方法和装置

    公开(公告)号：US20120074319A1

    公开(公告)日：2012-03-29

    申请号：US13311734

    申请日：2011-12-06

    申请人： Hidetoshi NISHIYAMA ,  Toshifumi HONDA ,  Sachio UTO

    发明人： Hidetoshi NISHIYAMA ,  Toshifumi HONDA ,  Sachio UTO

    IPC分类号： H01J37/26

    CPC分类号： G01N23/225 ,  G02B15/14 ,  G02B21/0016 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/2482 ,  H01J2237/2817 ,  H01K3/02

    摘要： A method of inspecting defects of a sample on a movable table includes a first step for, on a basis of position information of the defects which is previously detected by an other inspection system, driving the table so that the defects come into a viewing field of an optical microscope having a focus which is adjusted, a second step for re-detecting the defects to obtain a first detection result, a third step for correcting the position information of defects on a basis of position information of the re-detected defects, and a fourth step for reviewing the defects whose position information is corrected to obtain a second detection result. At the second step, re-detecting is performed using reflection light or scattered light from the sample which passes an optical filter which includes a light shielding portion and a light transmitting portion.

    摘要翻译： 一种在可移动台上检查样本的缺陷的方法包括：第一步骤，用于基于先前由另一检查系统检测到的缺陷的位置信息来驱动该表，使得缺陷进入到 具有调整焦点的光学显微镜，用于重新检测缺陷以获得第一检测结果的第二步骤，基于重新检测到的缺陷的位置信息来校正缺陷的位置信息的第三步骤，以及 检查位置信息被校正以获得第二检测结果的缺陷的第四步骤。 在第二步骤中，使用来自通过包括遮光部分和透光部分的滤光器的样品的反射光或散射光进行再检测。